Abstract: Silicon-based protective film for adhesive or self-adhesive elements, characterized in that said protective film is based on silicone and has a level of extractible silicone less than or equal to 100 ng/cm2, preferably less than or equal to 50, preferably less than or equal to 20 ng/cm2, and even more preferably less than 10 ng/cm2, the method of production thereof and uses thereof.

Abstract: A device for cold plasma endoscopy may include a cold plasma generating system, a catheter and electrically conductive means. The cold plasma generating system includes a gas source, an electrical source, a dielectric chamber, a first electrode surrounding the dielectric chamber and electrically connected to the electrical source. The catheter has a first lumen for carrying the cold plasma fluidly connected to the dielectric chamber at a proximal end and having an opening at a distal end for delivering the cold plasma. The electrically conductive means extend inside the first lumen. The electrical source is configured to apply a pulsed excitation signal to the first electrode. The device includes remotely actuated deployable confinement means for creating a confined space, wherein the opening of the first lumen is arranged in the confined space, the deployable confinement means allowing for confining the plasma substantially within the confined space.

Abstract: Silicon-based protective film for adhesive or self-adhesive elements, characterized in that said protective film is based on silicone and has a level of extractible silicone less than or equal to 100 ng/cm2, preferably less than or equal to 50, preferably less than or equal to 20 ng/cm2, and even more preferably less than 10 ng/cm2, the method of production thereof and uses thereof.

Abstract: A method for depositing a fluorinated layer on a substrate includes the injection of a gas mixture including a fluorinated compound and a carrier gas in a discharge or post-discharge area of a cold atmospheric plasma at a pressure comprised between 0.8 and 1.2 bars. The fluorinated compound has a boiling temperature at a pressure of 1 bar above 25° C.