Patents by Inventor Nicolas Wyrsch

Nicolas Wyrsch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microchannel plate and its manufacturing method
    Patent number: 8729447
    Abstract: A microchannel plate (1) having an array of channels (5),includes a substrate (2) and, deposited on the substrate, a hydrogenated amorphous silicon film (3) having a thickness ranging between 50 ?m and 200 ?m, preferably between 80 ?m and 120 ?m, the film including the array of channels (5). Preferably, the substrate (2) is an integrated circuit having an internal electronic readout circuit and pixilated collection electrodes (8), and the film (3) is integrated on the substrate (2). The channels (5) may be formed by a Deep Reactive Ion Etching (DRIE) process.
    Type: Grant
    Filed: July 8, 2010
    Date of Patent: May 20, 2014
    Assignee: Ecole Polytechnique Federale de Lausanne (EPFL)
    Inventors: Pierre Jarron, Nicolas Wyrsch
  • MICROCHANNEL PLATE AND ITS MANUFACTURING METHOD
    Publication number: 20120187278
    Abstract: A microchannel plate (1) having an array of channels (5),includes a substrate (2) and, deposited on the substrate, a hydrogenated amorphous silicon film (3) having a thickness ranging between 50 ?m and 200 ?m, preferably between 80 ?m and 120 ?m, the film including the array of channels (5). Preferably, the substrate (2) is an integrated circuit having an internal electronic readout circuit and pixilated collection electrodes (8), and the film (3) is integrated on the substrate (2). The channels (5) may be formed by a Deep Reactive Ion Etching (DRIE) process.
    Type: Application
    Filed: July 8, 2010
    Publication date: July 26, 2012
    Applicant: ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)
    Inventors: Pierre Jarron, Nicolas Wyrsch