Patents by Inventor Nicole Sandlin

Nicole Sandlin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for etching a metal layer suitable for use in photomask fabrication
    Patent number: 8202441
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Grant
    Filed: March 22, 2010
    Date of Patent: June 19, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Madhavi R. Chandrachood, Nicole Sandlin, Yung-Hee Yvette Lee, Jian Ding
  • PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FABRICATION
    Publication number: 20100178600
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Application
    Filed: March 22, 2010
    Publication date: July 15, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Madhavi R. Chandrachood, Nicole Sandlin, Yung-Hee Yvette Lee, Jian Ding
  • Process for etching a metal layer suitable for use in photomask fabrication
    Patent number: 7682518
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: March 23, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Madhavi R. Chandrachood, Nicole Sandlin, Yung-Hee Yvette Lee, Jian Ding
  • Process for etching photomasks
    Patent number: 7521000
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Grant
    Filed: August 25, 2004
    Date of Patent: April 21, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Madhavi R. Chandrachood, Nicole Sandlin, Yung-Hee Yvette Lee, Jian Ding
  • Process for etching photomasks
    Publication number: 20070184354
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Application
    Filed: August 25, 2004
    Publication date: August 9, 2007
    Inventors: Madhavi Chandrachood, Nicole Sandlin, Yung-Hee Lee, Jian Ding
  • PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FABRICATION
    Publication number: 20070105381
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Application
    Filed: December 28, 2006
    Publication date: May 10, 2007
    Inventors: Madhavi Chandrachood, Nicole Sandlin, Yung-Hee Lee, Jian Ding