Abstract: The invention relates to a low cost photovoltaic cell, using a minimum thickness layer of semiconductor compounds able to provide the photovoltaic effect and specifically in polycrystalline form. On a molybdenum sheet an auxiliary polycrystalline germanium layer is deposited in order to facilitate subsequent depositions. This is followed by an intermediate polycrystalline layer of gallium aluminum arsenide and an active layer of polycrystalline gallium arsenide. The presence of the intermediate layer with a wider forbidden band than that of the active layer compensates the effect on the efficiency of the limited thickness of the active layer.

Abstract: Process for producing layers of silicon or one of its alloys in pure or doped form and able to absorb optical radiation, the layers being of limited thickness, it comprising a first stage of depositing the layer by chemical decomposition of a gaseous mixture containing silane at a temperature close to the crystallization temperature and a second stage of treating in a hydrogen plasma at a lower temperature.