Patents by Inventor Niek Antonius Jacobus Maria KLEEMANS

Niek Antonius Jacobus Maria KLEEMANS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10588211
    Abstract: A radiation system to generate a radiation emitting plasma, the radiation system include a fuel emitter to provide a fuel target at a plasma formation region, a first laser arranged to provide a first laser beam at the plasma formation region incident on the fuel target to generate a radiation emitting plasma, an imaging device arranged to obtain a first image of the radiation emitting plasma at the plasma formation region, the first image indicating at least one image property of the radiation emitting plasma, and a controller. The controller is arranged to receive the first image, and to generate at least one instruction based on the at least one image property of the radiation emitting plasma to modify operation of at least one component of the radiation system to reduce a detrimental effect of debris.
    Type: Grant
    Filed: October 23, 2014
    Date of Patent: March 10, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Rolf Theodorus Nicolaas Beijsens, Kornelis Frits Feenstra, Arjen Teake De Jong, Reinier Theodorus Martinus Jilisen, Niek Antonius Jacobus Maria Kleemans, Andrey Nikipelov, Pavel Seroglazov, Nicolaas Antonius Allegondus Johannes Van Asten, Harald Ernest Verbraak
  • Patent number: 9964852
    Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: May 8, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Niek Antonius Jacobus Maria Kleemans, Denis Alexandrovich Glushkov, Ronald Johannes Hultermans, Benedictus Mathijs Renkens, Gerardus Hubertus Petrus Maria Swinkels, Christiaan Johannes Petrus Verspeek
  • Publication number: 20180120711
    Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.
    Type: Application
    Filed: November 3, 2017
    Publication date: May 3, 2018
    Inventors: Niek Antonius Jacobus Maria KLEEMANS, Denis Alexandrovich GLUSHKOV, Ronald Johannes HULTERMANS, Benedictus Mathijs RENKENS, Gerardus Hubertus Petrus Maria SWINKELS, Christiaan Johannes Petrus VERSPEEK
  • Patent number: 9841680
    Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.
    Type: Grant
    Filed: March 5, 2014
    Date of Patent: December 12, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Niek Antonius Jacobus Maria Kleemans, Denis Alexandrovich Glushkov, Ronald Johannes Hultermans, Benedictus Mathijs Renkens, Gerardus Hubertus Petrus Maria Swinkels, Christiaan Johannes Petrus Verspeek
  • Patent number: 9835950
    Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: December 5, 2017
    Assignee: ASML Netherland B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Niek Antonius Jacobus Maria Kleemans, Antonius Johannes Josephus Van Dijsseldonk, Ramon Mark Hofstra, Oscar Franciscus Jozephus Noordman, Tien Nang Pham, Jan Bernard Plechelmus Van Schoot, Jiun-Cheng Wang, Kevin Weimin Zhang
  • Publication number: 20160334711
    Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.
    Type: Application
    Filed: December 19, 2014
    Publication date: November 17, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Markus Franciscus Antonius EURLINGS, Niek Antonius Jacobus Maria KLEEMANS, Antonius Johannes Josephus VAN DIJSSELDONK, Ramon Mark HOFSTRA, Oscar Franciscus Jozephus NOORDMAN, Tien Nang PHAM, Jan Bernard Plechelmus VAN SCHOOT, Jiun-Cheng WANG, Kevin Weimin ZHANG
  • Publication number: 20160278196
    Abstract: A radiation system to generate a radiation emitting plasma, the radiation system include a fuel emitter to provide a fuel target at a plasma formation region, a first laser arranged to provide a first laser beam at the plasma formation region incident on the fuel target to generate a radiation emitting plasma, an imaging device arranged to obtain a first image of the radiation emitting plasma at the plasma formation region, the first image indicating at least one image property of the radiation emitting plasma, and a controller. The controller is arranged to receive the first image, and to generate at least one instruction based on the at least one image property of the radiation emitting plasma to modify operation of at least one component of the radiation system to reduce a detrimental effect of debris.
    Type: Application
    Filed: October 23, 2014
    Publication date: September 22, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Rolf Theodorus Nicolaas BEIJSENS, Kornelis Frits FEENSTRA, Arjen Teake DE JONG, Reinier Theodorus Martinus JILISEN, Niek Antonius Jacobus Maria KLEEMANS, Andrey NIKIPELOV, Pavel SEROGLAZOV, Nicolaas Antonius Allegondus Johannes VAN ASTEN, Harald Ernest VERBRAAK
  • Publication number: 20160054663
    Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.
    Type: Application
    Filed: March 5, 2014
    Publication date: February 25, 2016
    Inventors: Niek Antonius Jacobus Maria KLEEMANS, Denis Alexandrovich GLUSHKOV, Ronald Johannes HULTERMANS, Benedictus Mathijs RENKENS, Gerardus Hubertus Petrus Maria SWINKELS, Christiaan Johannes Petrus VERSPEEK