Patents by Inventor Niek Jacobus Johannes Roset
Niek Jacobus Johannes Roset has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11846879Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: GrantFiled: November 7, 2022Date of Patent: December 19, 2023Assignee: ASML NETHERLAND B.V.Inventors: Giovanna De Simone, Marco Adrianus Peter Van Den Heuvel, Thibault Simon Mathieu Laurent, Ruud Hendrikus Martinus Johannes Bloks, Niek Jacobus Johannes Roset, Justin Johannes Hermanus Gerritzen
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Publication number: 20230360954Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: ApplicationFiled: July 18, 2023Publication date: November 9, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
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Patent number: 11749556Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: GrantFiled: September 22, 2021Date of Patent: September 5, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
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Publication number: 20230075771Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.Type: ApplicationFiled: January 25, 2021Publication date: March 9, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Coen Hubertus Matheus BALTIS, Nicolaas TEN KATE, Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN, Siegfried Alexander TROMP, Frank Pieter Albert VAN DEN BERKMORTEL, Niek Jacobus Johannes ROSET, Gijs KRAMER, Nicolaas Petrus Marcus BRANTJES, Michiel Theodorus Jacobus FONTEYN
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Publication number: 20230054421Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: ApplicationFiled: November 7, 2022Publication date: February 23, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Giovanna DE SIMONE, Marco Adrianus Peter VAN DEN HEUVEL, Thibault Simon Mathieu LAURENT, Ruud Hendrikus Martinus Johannes BLOKS, Niek Jacobus Johannes ROSET, Justin Johannes Hermanus GERRITZEN
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Patent number: 11500296Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: GrantFiled: November 5, 2021Date of Patent: November 15, 2022Assignee: ASML Netherlands B.V.Inventors: Giovanna De Simone, Marco Adrianus Peter Van Den Heuvel, Thibault Simon Mathieu Laurent, Ruud Hendrikus Martinus Johannes Bloks, Niek Jacobus Johannes Roset, Justin Johannes Hermanus Gerritzen
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Patent number: 11385547Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: May 21, 2020Date of Patent: July 12, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
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Publication number: 20220057722Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: ApplicationFiled: November 5, 2021Publication date: February 24, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Giovanna DE SIMONE, Marco Adrianus Peter VAN DEN HEUVEL, Thibault Simon Mathieu LAURENT, Ruud Hendrikus Martinus Johannes BLOKS, Niek Jacobus Johannes ROSET, Justin Johannes Hermanus GERRITZEN
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Publication number: 20220051927Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: ApplicationFiled: September 22, 2021Publication date: February 17, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
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Patent number: 11175594Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: GrantFiled: May 3, 2018Date of Patent: November 16, 2021Assignee: ASML Netherlands B.V.Inventors: Giovanna De Simone, Marco Adrianus Peter Van Den Heuvel, Thibault Simon Mathieu Laurent, Ruud Hendrikus Martinus Johannes Bloks, Niek Jacobus Johannes Roset, Justin Johannes Hermanus Gerritzen
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Patent number: 11139196Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: GrantFiled: September 19, 2018Date of Patent: October 5, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
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Publication number: 20210132510Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: ApplicationFiled: May 3, 2018Publication date: May 6, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Giovanna DE SIMONE, Marco Adrianus Peter VAN DEN HEUVEL, Thibault Simon Mathieu LAURENT, Ruud Hendrikus Martinus Johannes BLOKS, Niek Jacobus Johannes ROSET, Justin Johannes Hermanns GERRITZEN
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Patent number: 10871714Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.Type: GrantFiled: March 14, 2018Date of Patent: December 22, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes Roset, Nicolaas Ten Kate, Sergei Shulepov, Raymond Wilhelmus Louis Lafarre
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Publication number: 20200294841Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: ApplicationFiled: September 19, 2018Publication date: September 17, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
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Publication number: 20200285154Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: May 21, 2020Publication date: September 10, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
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Patent number: 10705426Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: April 5, 2017Date of Patent: July 7, 2020Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
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Patent number: 10578959Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body includes a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: March 22, 2016Date of Patent: March 3, 2020Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Simon Karel Ravensbergen, Niek Jacobus Johannes Roset, Pieter Renaat Maria Hennus
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Publication number: 20190163066Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: April 5, 2017Publication date: May 30, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
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Patent number: RE47237Abstract: A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.Type: GrantFiled: June 14, 2016Date of Patent: February 12, 2019Assignee: ASML Netherlands B.V.Inventors: Niek Jacobus Johannes Roset, Nicolaas Ten Kate, Sergei Shulepov, Raymond Wilhelmus Louis Lafarre
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Patent number: RE48676Abstract: A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.Type: GrantFiled: November 29, 2018Date of Patent: August 10, 2021Assignee: ASML Netherlands B.V.Inventors: Niek Jacobus Johannes Roset, Nicolaas Ten Kate, Sergei Shulepov, Raymond Wilhelmus Louis Lafarre