Patents by Inventor Niels LAMMERS

Niels LAMMERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment modeling and a lithographic apparatus and exposure method using the same
    Patent number: 10095131
    Abstract: A method including determining a position of a first pattern in each of a plurality of target portions on a substrate, based on a fitted mathematical model, wherein the first pattern includes at least one alignment mark, wherein the mathematical model is fitted to a plurality of alignment mark displacements (dx, dy) for the alignment marks in the target portions, and wherein the alignment mark displacements are a difference between a respective nominal position of the alignment mark and measured position of the alignment mark; and transferring a second pattern onto each of the target portions, using the determined position of the first pattern in each of the plurality of target portions, wherein the mathematical model includes polynomials Z1 and Z2: Z1=r2 cos(2?) and Z2=r2 sin(2?) in polar coordinates (r, ?) or Z1=x2?y2 and Z2=xy in Cartesian coordinates (x, y).
    Type: Grant
    Filed: May 13, 2015
    Date of Patent: October 9, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Jacob Kramer, Rogier Sebastiaan Gilijamse, Niels Lammers, Daan Maurits Slotboom
  • LITHOGRAPHIC APPARATUS AND EXPOSURE METHOD
    Publication number: 20170108783
    Abstract: A method including determining a position of a first pattern in each of a plurality of target portions on a substrate, based on a fitted mathematical model, wherein the first pattern includes at least one alignment mark, wherein the mathematical model is fitted to a plurality of alignment mark displacements (dx, dy) for the alignment marks in the target portions, and wherein the alignment mark displacements are a difference between a respective nominal position of the alignment mark and measured position of the alignment mark; and transferring a second pattern onto each of the target portions, using the determined position of the first pattern in each of the plurality of target portions, wherein the mathematical model includes polynomials Z1 and Z2: Z1=r2 cos(2?) and Z2=r2 sin(2?) in polar coordinates (r, ?) or Z1=x2?y2 and Z2=xy in Cartesian coordinates (x, y).
    Type: Application
    Filed: May 13, 2015
    Publication date: April 20, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Jacob KRAMER, Rogier Sebastiaan GILIJAMSE, Niels LAMMERS, Daan Maurits SLOTBOOM