Patents by Inventor Niels Machiel Driessen

Niels Machiel Driessen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation system and lithographic apparatus comprising the same
    Patent number: 7863591
    Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: January 4, 2011
    Assignees: ASML Netherlands B.V., Koninklijke Philips Electronics N.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen
  • Device arranged to measure a quantity relating to radiation and lithographic apparatus
    Patent number: 7724349
    Abstract: A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.
    Type: Grant
    Filed: May 2, 2007
    Date of Patent: May 25, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen, Niels Machiel Driessen, Vadim Yevgenyevich Banine, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Derek Jan Wilfred Klunder
  • Radiation System and Lithographic Apparatus Comprising the Same
    Publication number: 20090309048
    Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
    Type: Application
    Filed: May 13, 2009
    Publication date: December 17, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus VAN HERPEN, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardu Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen
  • Radiation system and lithographic apparatus comprising the same
    Patent number: 7541603
    Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: June 2, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen
  • Device arranged to measure a quantity relating to radiation and lithographic apparatus
    Publication number: 20080273188
    Abstract: A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.
    Type: Application
    Filed: May 2, 2007
    Publication date: November 6, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen, Niels Machiel Driessen, Vadim Yevgenyevich Banine, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Derk Jan Wilfred Klunder
  • Radiation system and lithographic apparatus
    Patent number: 7397538
    Abstract: The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.
    Type: Grant
    Filed: November 21, 2006
    Date of Patent: July 8, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Wilhelmus Josephus Box, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen, Niels Machiel Driessen, Hendrikus Gijsbertus Schimmel
  • Radiation system and lithographic apparatus comprising the same
    Publication number: 20080074655
    Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
    Type: Application
    Filed: September 27, 2006
    Publication date: March 27, 2008
    Applicants: ASML Netherlands B.V., Koninklijke Philips Electronics N.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen