Abstract: A method of forming a product using additive layer manufacture is provided. The method comprises forming the product as a series of layers, each layer being formed by fusing powder deposited as a powder bed by scanning the powder bed using a charged particle beam to form a desired layer shape. For each layer, the powder is fused by melting successive areas of the powder bed by scanning the charged particle beam using a combination of a relatively long-range deflector and a relatively short-range deflector, wherein the relatively long-range deflector deflects the charged particle beam over a larger deflection angle than the short-range deflector. Also provided are a corresponding charged particle optical assembly, and an additive layer manufacturing apparatus.

Abstract: A method of forming a product using additive layer manufacture is provided. The method comprises forming the product as a series of layers, each layer being formed by fusing powder deposited as a powder bed by scanning the powder bed using a charged particle beam to form a desired layer shape. For each layer, the powder is fused by melting successive areas of the powder bed by scanning the charged particle beam using a combination of a relatively long-range deflector and a relatively short-range deflector, wherein the relatively long-range deflector deflects the charged particle beam over a larger deflection angle than the short-range deflector. Also provided are a corresponding charged particle optical assembly, and an additive layer manufacturing apparatus.

Abstract: A dual-mode electron beam lithography machine (10) comprises an electron beam column (11) for generating an electron beam (12) for writing a pattern on a surface of a substrate 14) by way of a writing current, the substrate being supported on a stage (13) movable to displace the substrate relative to the beam. The column (10) includes beam deflecting plates (16) for deflecting the beam to scan the substrate surface in accordance with the pattern to be written and beam blanking plates (15) for blanking the beam to interrupt writing. The machine further comprises control means (17 to 20) for changing each of writing current, stage movement, beam deflection and beam blanking between a predetermined first mode optimised for pattern-writing accuracy, thus resolution, and a predetermined second mode different from the first mode and optimised for pattern-writing speed, thus throughput.

Abstract: A device for influencing an electron beam, especially a deflector unit for an electron beam lithography machine, comprises a plurality of coil formers (12b) each with a bore (16) defining a passage for the beam and each carrying coils (18, 19) operable to generate magnetic fields for deflecting the path of the beam when passing through the passage. Each former is made of a high-strength ceramic material having a high thermal conductivity and low coefficient of thermal expansion so that, with respect to a given output of heat by the associated coils during quasi-continuous operation for repeated beam deflection during pattern writing, the heat is dissipated at such a rate as to preclude thermal expansion of the coils and thus avoid distortion of the magnetic fields generated by the coils.

Abstract: A dual-mode electron beam lithography machine (10) comprises an electron beam column (11) for generating an electron beam (12) for writing a pattern on a surface of a substrate 14) by way of a writing current, the substrate being supported on a stage (13) movable to displace the substrate relative to the beam. The column (10) includes beam deflecting plates (16) for deflecting the beam to scan the substrate surface in accordance with the pattern to be written and beam blanking plates (15) for blanking the beam to interrupt writing. The machine further comprises control means (17 to 20) for changing each of writing current, stage movement, beam deflection and beam blanking between a predetermined first mode optimised for pattern-writing accuracy, thus resolution, and a predetermined second mode different from the first mode and optimised for pattern-writing speed, thus throughput.

Abstract: A device for influencing an electron beam, especially a deflector unit for an electron beam lithography machine, comprises a plurality of coil formers (12b) each with a bore (16) defining a passage for the beam and each carrying coils (18, 19) operable to generate magnetic fields for deflecting the path of the beam when passing through the passage. Each former is made of a high-strength ceramic material having a high thermal conductivity and low coefficient of thermal expansion so that, with respect to a given output of heat by the associated coils during quasi-continuous operation for repeated beam deflection during pattern writing, the heat is dissipated at such a rate as to preclude thermal expansion of the coils and thus avoid distortion of the magnetic fields generated by the coils.