Abstract: This application sets forth techniques for variant testing at scale. In particular, the embodiments set forth provide systems and methods for testing, on a large-scale software application store, visual aspects of one or more variants of representative data associated with an application available through the software application store. According to some embodiments, a method may include using a subset of conversion data associated with a control object and a subset of the conversion data associated with at least one variant object to compute at least one conversion metric for the control object and at least one conversion metric for the at least one variant object. The method may also include generating a performance measurement by applying at least one statistical hypothesis testing function to the at least one conversion metric for the control object and the at least one conversion metric for the at least one variant object.

Abstract: The disclosed method for recovering optical properties of transparent substrates may include performing a post-etching annealing process on a transparent substrate. The method may also include applying a plasma treatment to the transparent substrate, performing an atomic layer etching treatment on the transparent substrate, and/or performing a cleaning process. Various other methods, devices, and systems are also disclosed.

Abstract: Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.

Abstract: An optical assembly is configured to receive visible scene light at the backside of the optical assembly and to direct the visible scene light on an optical path toward the eyeward side. The optical assembly includes a dimming element disposed on the optical path, where the dimming element includes a photochromic material that is configured to darken in response to exposure to a range of light wavelengths. A display layer is disposed on the optical path between the eyeward side of the optical assembly and the dimming element. The display layer is configured to direct visible display light toward the eyeward side and also to direct activation light to the dimming element, where the activation light is within the range of light wavelengths to activate a darkening of the photochromic material to dim the visible scene light.

Abstract: An optical assembly is configured to receive visible scene light at the backside of the optical assembly and to direct the visible scene light on an optical path toward the eyeward side. The optical assembly includes a dimming element disposed on the optical path, wherein the dimming element includes a photochromic material that is configured to darken in response to exposure to a range of light wavelengths. An illuminator, coupled to an edge of the dimming element, is configured to selectively emit an activation light within the range of light wavelengths to activate a darkening of the photochromic material to dim the visible scene light.

Abstract: An optical assembly is configured to receive visible scene light at the backside of the optical assembly and to direct the visible scene light on an optical path toward the eyeward side. The optical assembly includes a dimming layer disposed on the optical path and includes a photochromic material that is configured to darken in response to exposure to a range of light wavelengths. An illumination layer is also disposed on the optical path and is configured to propagate an evanescent activation light within the illumination layer. The illumination layer is also configured to leak the evanescent activation light towards the dimming layer to activate a darkening of the photochromic material of the dimming layer to dim the visible scene light.

Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.

Abstract: Techniques related to reclamation of energy leaking from waveguides are disclosed. One or more photovoltaic cells may receive light leaking from a waveguide at a first surface of the wave guide. The first surface may be opposite to a second surface at which an in-coupling element is located. The light leaking from the waveguide results from inefficiency in redirecting incoming light for propagation within the waveguide. The one or more photovoltaic cells may generate electric power from the light leaking from the waveguide.

Abstract: An optical device includes a substrate, a first surface-relief grating including grooves and ridges formed on or in the substrate, a first overcoat layer in the grooves of the first surface-relief grating, and a first antireflective layer on the first overcoat layer. The ridges of the first surface-relief grating include high-refractive index, photoactive metal oxide nanoparticles and a material of the first overcoat layer in regions between the metal oxide nanoparticles, or the first overcoat layer includes the metal oxide nanoparticles and a material of the first antireflective layer in regions between the metal oxide nanoparticles. Methods of fabricating the optical device are also described.

Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.

Abstract: A multilayer architecture includes an amorphous optical layer, a crystalline optical layer overlying the amorphous optical layer, and a barrier layer located between the amorphous optical layer and the crystalline optical layer. The barrier layer may be configured to mediate the structure of the later-formed amorphous optical layer. For instance, a low absorption barrier layer may be formed over the crystalline optical layer within the multilayer architecture and accordingly inhibit crystallization within a subsequently formed optical layer, thus providing phase separation between the neighboring optical layers and a desired refractive index gradient within the multilayer architecture without adversely affecting the optical path length therethrough. Such a multilayer structure may be configured as a light retention layer, antireflective coating, bandpass filter, etc.

Abstract: Disclosed herein are techniques for eye illumination for eye position tracking. An illuminator for eye tracking includes a substrate configured to be placed in front of an eye of a user and a light source positioned on a surface of the substrate. The light source is configured to be positioned within a field of view of the eye of the user. A maximum dimension of the light source in a plane parallel to an emission surface of the light source is less than 500 ?m.

Abstract: A pupil replication waveguide for a projector display includes a slab of transparent material for propagating display light in the slab via total internal reflection. A diffraction grating is supported by the slab. The diffraction grating includes a plurality of tapered slanted fringes in a substrate for out-coupling the display light from the slab by diffraction into a blazed diffraction order. A greater portion of the display light is out-coupled into the blazed diffraction order, and a smaller portion of the display light is out-coupled into a non-blazed diffraction order. The tapered fringes result in the duty cycle of the diffraction grating varying along the thickness direction of the diffraction grating, to facilitate suppressing the portion of the display light out-coupled into the non-blazed diffraction order.

Abstract: A method is described for utilizing NIL materials with switchable mechanical properties. The method comprises applying an imprint mask to a nano-imprint lithography (NIL) material layer. The NIL material layer is comprised of a NIL material with a modulus level below a flexibility threshold. The NIL material layer has an internal property, that when changed, causes a change in the modulus level of the NIL material. The method further comprises detaching the imprinted NIL material layer from the imprint mask, with the low modulus level of the NIL material causing a shape of the imprinted NIL material layer to remain unchanged after detachment. A modulus level of the NIL material is increased by changing an internal property of the NIL material, with the modulus level increased beyond a strength threshold to create a first imprint layer that has a structure that remains unaffected by a subsequent process.

Abstract: Techniques for producing an overcoat layer on slanted surface-relief structures and devices obtained using the techniques are disclosed. In some embodiments, a method of planarizing an overcoat layer over a surface-relief structure includes removing a portion of the overcoat layer using an ion beam at a glancing angle. The overcoat layer includes planar surface portions and non-planar surface portions. Each of the non-planar surface portions includes a first sloped side and a second sloped side facing the first sloped side. The glancing angle is selected such that the first sloped side of each non-planar surface portion is shadowed from the ion beam by an adjacent planar surface portion such that the ion beam does not reach at least the first sloped side of each non-planar surface portion but reaches the second sloped side of each non-planar surface portion.

Abstract: A high performing low viscosity tire sealant includes about 15% to about 75% by weight of a biobased aliphatic diol, about 5% to about 50% by weight natural rubber latex, and about 2% to about 50% by weight synthetic rubber latex. The tire sealant exhibits excellent performance at temperatures of ?40 degrees Celsius and lower.

Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.

Abstract: The problem of ever-increasing huge volume of unstructured data, mainly documents, and within that the scanned documents, needs to have a solution to expedite the overall turnaround time in document centric business processing. Majority of these documents often do not strictly follow a specific format or a template, and creating a generic OCR solution, which would work on any kind of document format is needed to enhance overall efficacy of processes. Embodiments of the present disclosure provide system and method that extract tabular and text information from scanned documents. More specifically, method and system are provided to extract user filled tabular data, textual information, selected radio-buttons and checked checkboxes, stamps, barcodes from scanned copies of any filled form with or without any template being pre-defined or without any prior knowledge about format of input forms. The system converts extracted information in a structured form for further for analytics and reporting.

Abstract: A multi-layer waveguide display includes a base waveguide layer, one or more grating couplers on one or two surfaces of the base waveguide layer, an overcoat layer on each grating coupler of the one or more grating couplers and filling grating grooves of the grating coupler, and a first waveguide layer stack on a first side of the base waveguide layer. The first waveguide layer stack includes one or more polymer layers. Each of the one or more polymer layers is characterized by a respective refractive index lower than the refractive index of the base waveguide layer. Each polymer layer is formed in a plurality of process cycles, where each process cycle includes dispensing a two-dimensional array of droplets of a resin material to form a thin layer and cross-linking the thin layer to form a sublayer of the polymer layer.

Abstract: A method is described for modifying the mechanical properties of NIL materials. The method includes applying an imprint mask to a nano-imprint lithography (NIL) material layer to create an imprinted NIL material layer, with the NIL material layer comprised of a NIL material. The method further includes detaching the imprinted NIL material layer from the imprint mask, with the modulus level of the NIL material below a flexibility threshold to cause a shape of the imprinted NIL material layer to remain unchanged after detachment. The modulus level of the NIL material of the imprinted NIL material layer is increased beyond a strength threshold to create a first imprint layer, with the imprint layer having a structure that remains unaffected by a subsequent process to form a second imprint layer matching a master mold pattern.