Patents by Inventor Nihar Ranjan Mohanty
Nihar Ranjan Mohanty has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230314794Abstract: The disclosed method for recovering optical properties of transparent substrates may include performing a post-etching annealing process on a transparent substrate. The method may also include applying a plasma treatment to the transparent substrate, performing an atomic layer etching treatment on the transparent substrate, and/or performing a cleaning process. Various other methods, devices, and systems are also disclosed.Type: ApplicationFiled: January 26, 2023Publication date: October 5, 2023Inventors: Joshua Andrew Kaitz, Pasqual Rivera, Guangbi Yuan, Nihar Ranjan Mohanty, John Sporre, Vivek Gupta
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Patent number: 11709422Abstract: Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.Type: GrantFiled: September 17, 2020Date of Patent: July 25, 2023Assignee: META PLATFORMS TECHNOLOGIES, LLCInventors: Elliott Franke, Nihar Ranjan Mohanty, Ankit Vora, Austin Lane, Matthew E. Colburn
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Publication number: 20230168508Abstract: An optical assembly is configured to receive visible scene light at the backside of the optical assembly and to direct the visible scene light on an optical path toward the eyeward side. The optical assembly includes a dimming element disposed on the optical path, where the dimming element includes a photochromic material that is configured to darken in response to exposure to a range of light wavelengths. A display layer is disposed on the optical path between the eyeward side of the optical assembly and the dimming element. The display layer is configured to direct visible display light toward the eyeward side and also to direct activation light to the dimming element, where the activation light is within the range of light wavelengths to activate a darkening of the photochromic material to dim the visible scene light.Type: ApplicationFiled: April 11, 2022Publication date: June 1, 2023Inventors: Robin Sharma, Afsoon Jamali, Ming Lei, Sho Nakahara, Nihar Ranjan Mohanty, Karol Constantine Hatzilias, Carl Chancy
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Publication number: 20230168507Abstract: An optical assembly is configured to receive visible scene light at the backside of the optical assembly and to direct the visible scene light on an optical path toward the eyeward side. The optical assembly includes a dimming element disposed on the optical path, wherein the dimming element includes a photochromic material that is configured to darken in response to exposure to a range of light wavelengths. An illuminator, coupled to an edge of the dimming element, is configured to selectively emit an activation light within the range of light wavelengths to activate a darkening of the photochromic material to dim the visible scene light.Type: ApplicationFiled: April 11, 2022Publication date: June 1, 2023Inventors: Robin Sharma, Afsoon Jamali, Ming Lei, Sho Nakahara, Nihar Ranjan Mohanty, Karol Constantine Hatzilias, Carl Chancy
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Publication number: 20230168524Abstract: An optical assembly is configured to receive visible scene light at the backside of the optical assembly and to direct the visible scene light on an optical path toward the eyeward side. The optical assembly includes a dimming layer disposed on the optical path and includes a photochromic material that is configured to darken in response to exposure to a range of light wavelengths. An illumination layer is also disposed on the optical path and is configured to propagate an evanescent activation light within the illumination layer. The illumination layer is also configured to leak the evanescent activation light towards the dimming layer to activate a darkening of the photochromic material of the dimming layer to dim the visible scene light.Type: ApplicationFiled: April 11, 2022Publication date: June 1, 2023Inventors: Robin Sharma, Afsoon Jamali, Ming Lei, Sho Nakahara, Nihar Ranjan Mohanty, Karol Constantine Hatzilias, Carl Chancy
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Patent number: 11579364Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.Type: GrantFiled: June 24, 2022Date of Patent: February 14, 2023Assignee: Meta Platforms Technologies, LLCInventors: Matthew E. Colburn, Giuseppe Calafiore, Matthieu Charles Raoul Leibovici, Nihar Ranjan Mohanty
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Patent number: 11509260Abstract: Techniques related to reclamation of energy leaking from waveguides are disclosed. One or more photovoltaic cells may receive light leaking from a waveguide at a first surface of the wave guide. The first surface may be opposite to a second surface at which an in-coupling element is located. The light leaking from the waveguide results from inefficiency in redirecting incoming light for propagation within the waveguide. The one or more photovoltaic cells may generate electric power from the light leaking from the waveguide.Type: GrantFiled: October 25, 2018Date of Patent: November 22, 2022Assignee: META PLATFORMS TECHNOLOGIES, LLCInventors: Nihar Ranjan Mohanty, Ningfeng Huang
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Publication number: 20220334289Abstract: An optical device includes a substrate, a first surface-relief grating including grooves and ridges formed on or in the substrate, a first overcoat layer in the grooves of the first surface-relief grating, and a first antireflective layer on the first overcoat layer. The ridges of the first surface-relief grating include high-refractive index, photoactive metal oxide nanoparticles and a material of the first overcoat layer in regions between the metal oxide nanoparticles, or the first overcoat layer includes the metal oxide nanoparticles and a material of the first antireflective layer in regions between the metal oxide nanoparticles. Methods of fabricating the optical device are also described.Type: ApplicationFiled: April 13, 2022Publication date: October 20, 2022Inventors: Keren ZHANG, Sara AZARI, Austin LANE, Feyza DUNDAR ARISOY, Ankit VORA, Nihar Ranjan MOHANTY, Vivek GUPTA
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Publication number: 20220326436Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.Type: ApplicationFiled: June 24, 2022Publication date: October 13, 2022Inventors: Matthew E. Colburn, Giuseppe Calafiore, Matthieu Charles Raoul Leibovici, Nihar Ranjan Mohanty
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Publication number: 20220317346Abstract: A multilayer architecture includes an amorphous optical layer, a crystalline optical layer overlying the amorphous optical layer, and a barrier layer located between the amorphous optical layer and the crystalline optical layer. The barrier layer may be configured to mediate the structure of the later-formed amorphous optical layer. For instance, a low absorption barrier layer may be formed over the crystalline optical layer within the multilayer architecture and accordingly inhibit crystallization within a subsequently formed optical layer, thus providing phase separation between the neighboring optical layers and a desired refractive index gradient within the multilayer architecture without adversely affecting the optical path length therethrough. Such a multilayer structure may be configured as a light retention layer, antireflective coating, bandpass filter, etc.Type: ApplicationFiled: March 30, 2021Publication date: October 6, 2022Inventors: Elliott Franke, Nihar Ranjan Mohanty, Vivek Gupta, Geraud Jean-Michel Dubois
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Patent number: 11455031Abstract: Disclosed herein are techniques for eye illumination for eye position tracking. An illuminator for eye tracking includes a substrate configured to be placed in front of an eye of a user and a light source positioned on a surface of the substrate. The light source is configured to be positioned within a field of view of the eye of the user. A maximum dimension of the light source in a plane parallel to an emission surface of the light source is less than 500 ?m.Type: GrantFiled: June 4, 2018Date of Patent: September 27, 2022Assignee: META PLATFORMS TECHNOLOGIES, LLCInventors: Robin Sharma, Andrew John Ouderkirk, Matthew E. Colburn, Qi Zhang, Giuseppe Calafiore, John Goward, Karol Constantine Hatzilias, Matthieu Charles Raoul Leibovici, Nihar Ranjan Mohanty, Selso Luanava
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Patent number: 11422293Abstract: A pupil replication waveguide for a projector display includes a slab of transparent material for propagating display light in the slab via total internal reflection. A diffraction grating is supported by the slab. The diffraction grating includes a plurality of tapered slanted fringes in a substrate for out-coupling the display light from the slab by diffraction into a blazed diffraction order. A greater portion of the display light is out-coupled into the blazed diffraction order, and a smaller portion of the display light is out-coupled into a non-blazed diffraction order. The tapered fringes result in the duty cycle of the diffraction grating varying along the thickness direction of the diffraction grating, to facilitate suppressing the portion of the display light out-coupled into the non-blazed diffraction order.Type: GrantFiled: July 16, 2021Date of Patent: August 23, 2022Assignee: Meta Platforms Technologies LLCInventors: Hee Yoon Lee, Ningfeng Huang, Pasi Saarikko, Yu Shi, Giuseppe Calafiore, Nihar Ranjan Mohanty
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Patent number: 11415880Abstract: A method is described for utilizing NIL materials with switchable mechanical properties. The method comprises applying an imprint mask to a nano-imprint lithography (NIL) material layer. The NIL material layer is comprised of a NIL material with a modulus level below a flexibility threshold. The NIL material layer has an internal property, that when changed, causes a change in the modulus level of the NIL material. The method further comprises detaching the imprinted NIL material layer from the imprint mask, with the low modulus level of the NIL material causing a shape of the imprinted NIL material layer to remain unchanged after detachment. A modulus level of the NIL material is increased by changing an internal property of the NIL material, with the modulus level increased beyond a strength threshold to create a first imprint layer that has a structure that remains unaffected by a subsequent process.Type: GrantFiled: January 18, 2019Date of Patent: August 16, 2022Assignee: Facebook Technologies, LLCInventors: Austin Lane, Matthew E. Colburn, Giuseppe Calafiore, Nihar Ranjan Mohanty
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Patent number: 11412207Abstract: Techniques for producing an overcoat layer on slanted surface-relief structures and devices obtained using the techniques are disclosed. In some embodiments, a method of planarizing an overcoat layer over a surface-relief structure includes removing a portion of the overcoat layer using an ion beam at a glancing angle. The overcoat layer includes planar surface portions and non-planar surface portions. Each of the non-planar surface portions includes a first sloped side and a second sloped side facing the first sloped side. The glancing angle is selected such that the first sloped side of each non-planar surface portion is shadowed from the ion beam by an adjacent planar surface portion such that the ion beam does not reach at least the first sloped side of each non-planar surface portion but reaches the second sloped side of each non-planar surface portion.Type: GrantFiled: October 22, 2019Date of Patent: August 9, 2022Assignee: META PLATFORMS TECHNOLOGIES, LLCInventor: Nihar Ranjan Mohanty
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Patent number: 11402578Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.Type: GrantFiled: July 1, 2020Date of Patent: August 2, 2022Assignee: Meta Platforms Technologies, LLCInventors: Matthew E. Colburn, Giuseppe Calafiore, Matthieu Charles Raoul Leibovici, Nihar Ranjan Mohanty
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Publication number: 20220206232Abstract: A multi-layer waveguide display includes a base waveguide layer, one or more grating couplers on one or two surfaces of the base waveguide layer, an overcoat layer on each grating coupler of the one or more grating couplers and filling grating grooves of the grating coupler, and a first waveguide layer stack on a first side of the base waveguide layer. The first waveguide layer stack includes one or more polymer layers. Each of the one or more polymer layers is characterized by a respective refractive index lower than the refractive index of the base waveguide layer. Each polymer layer is formed in a plurality of process cycles, where each process cycle includes dispensing a two-dimensional array of droplets of a resin material to form a thin layer and cross-linking the thin layer to form a sublayer of the polymer layer.Type: ApplicationFiled: December 15, 2021Publication date: June 30, 2022Inventors: Keren ZHANG, Ankit VORA, Igor ABRAMSON, Nihar Ranjan MOHANTY
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Publication number: 20220128903Abstract: A method is described for modifying the mechanical properties of NIL materials. The method includes applying an imprint mask to a nano-imprint lithography (NIL) material layer to create an imprinted NIL material layer, with the NIL material layer comprised of a NIL material. The method further includes detaching the imprinted NIL material layer from the imprint mask, with the modulus level of the NIL material below a flexibility threshold to cause a shape of the imprinted NIL material layer to remain unchanged after detachment. The modulus level of the NIL material of the imprinted NIL material layer is increased beyond a strength threshold to create a first imprint layer, with the imprint layer having a structure that remains unaffected by a subsequent process to form a second imprint layer matching a master mold pattern.Type: ApplicationFiled: January 4, 2022Publication date: April 28, 2022Inventors: Austin Lane, Matthew E. Colburn, Giuseppe Calafiore, Nihar Ranjan Mohanty
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Patent number: 11307357Abstract: Techniques for overcoating slanted structures and devices obtained using the techniques are disclosed. In some embodiments, a method of forming an overcoat layer on a surface-relief structure on a substrate includes receiving the substrate with the surface-relief structure. The surface-relief structure includes a plurality of ridges slanted with respect to the substrate, and a plurality of grooves each between two adjacent ridges. The method further includes depositing, in each cycle of a plurality of cycles, a uniform layer of an overcoat material on surfaces of the plurality of ridges and bottoms of the plurality of grooves. The deposited layers of the overcoat material and the plurality of ridges collectively form a light-coupling structure on the substrate. A surface of the overcoat layer is planar.Type: GrantFiled: October 22, 2019Date of Patent: April 19, 2022Assignee: Facebook Technologies, LLCInventor: Nihar Ranjan Mohanty
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Publication number: 20220082936Abstract: Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.Type: ApplicationFiled: September 17, 2020Publication date: March 17, 2022Inventors: Elliott FRANKE, Nihar Ranjan MOHANTY, Ankit VORA, Austin LANE, Matthew E. COLBURN
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Publication number: 20220082739Abstract: A method of fabricating gratings with variable grating depths including depositing a first grating material layer with a uniform thickness profile on a substrate, forming an etch mask layer having a variable thickness profile on the first grating material layer, etching the etch mask layer and the first grating material layer to change the uniform thickness profile of the first grating material layer to a non-uniform thickness profile, forming a patterned hard mask on the first grating material layer, and etching, using the patterned hard mask, the first grating material layer to form a grating with a variable depth in the first grating material layer.Type: ApplicationFiled: September 17, 2020Publication date: March 17, 2022Inventors: Elliott FRANKE, Nihar Ranjan MOHANTY, Ankit VORA, Austin LANE, Matthew E. COLBURN