Abstract: A method for balancing pulse energies across a series of write beams in an optical data writer comprises: (a) for each write beam of the series, applying an independently controllable phase delay to the write beam, thereby changing the polarization of the write beam; and (b) for each write beam with changed polarization in the series, directing a selected plane-polarized component of the write beam through a data modulator and onto an optical substrate. In this method the data modulator modulates each write beam of the series irrespective of the tolerance across the series of write beams.

Abstract: A scanning mirror device comprises a mirror disposed on a mirror support. The scanning mirror device also includes a first pair of actuators comprising a first actuator and a second actuator. The first actuator is positioned on a first side of the mirror support. The second actuator is positioned on a second side of the mirror support opposite the first side of the mirror support. The first actuator and the second actuator are connected to the mirror support along a first axis of rotation. The scanning mirror device also includes a second pair of actuators comprising a third actuator and a fourth actuator. The third actuator is positioned on the first side of the mirror support. The fourth actuator is positioned on the second side of the mirror support. The third actuator and the fourth actuator are connected to the mirror support along a second axis of rotation.

Abstract: According to an example aspect of the present invention, there is provided a radiation window manufacturing method, comprising patterning a mask on a top surface of a bulk wafer or compound wafer, etching the bulk or compound wafer from the top surface, based on the mask, either by timed etching of the bulk wafer, or until an inner insulator layer of the compound wafer, thereby generating recesses in the bulk or compound wafer, filling the recesses, at least partly, with a filling material, polishing the top surface of the bulk or compound wafer, and providing a membrane layer on the polished top surface, and etching the bulk or compound wafer from a bottom surface, opposite the top surface, to build a supporting structure for the membrane layer in accordance with a shape defined by the mask.

Abstract: A thin film actuator having transversely oriented structural stiffeners that serve to increase actuation stroke that results from longitudinal curvature. The thin film actuator may be deployed within electromechanical devices such that an actuatable deflection of a tip of the actuator plate produces the actuation stroke. The thin film actuator may include an actuator plate affixed to a substantially rigid frame structure. The actuator plate protrudes along a longitudinal axis away from the frame structure such that the actuator plate is cantilevered from the frame structure by some distance along this longitudinal axis. The thin film actuator includes a piezoelectric film on a surface of the actuator plate. Activation of the piezoelectric film generates tensile stress or compressive stress at the surface, thereby inducing a bending moment that causes the actuator plate to undergo longitudinal curvature and some lesser degree of transverse curvature.

Abstract: According to an example aspect of the present invention, there is provided a radiation window manufacturing method, comprising patterning a mask on a top surface of a bulk wafer or compound wafer, etching the bulk or compound wafer from the top surface, based on the mask, either by timed etching of the bulk wafer, or until an inner insulator layer of the compound wafer, thereby generating recesses in the bulk or compound wafer, filling the recesses, at least partly, with a filling material, polishing the top surface of the bulk or compound wafer, and providing a membrane layer on the polished top surface, and etching the bulk or compound wafer from a bottom surface, opposite the top surface, to build a supporting structure for the membrane layer in accordance with a shape defined by the mask.

Abstract: A thin film actuator having transversely oriented structural stiffeners that serve to increase actuation stroke that results from longitudinal curvature. The thin film actuator may be deployed within electromechanical devices such that an actuatable deflection of a tip of the actuator plate produces the actuation stroke. The thin film actuator may include an actuator plate affixed to a substantially rigid frame structure. The actuator plate protrudes along a longitudinal axis away from the frame structure such that the actuator plate is cantilevered from the frame structure by some distance along this longitudinal axis. The thin film actuator includes a piezoelectric film on a surface of the actuator plate. Activation of the piezoelectric film generates tensile stress or compressive stress at the surface, thereby inducing a bending moment that causes the actuator plate to undergo longitudinal curvature and some lesser degree of transverse curvature.

Abstract: According to an example aspect of the present invention, there is provided a method comprising obtaining a first silicon wafer comprising a mask on a first side, attaching a second silicon wafer on the first side of the first silicon wafer, and etching one of the wafers to partially expose a window layer deposited on the opposite silicon wafer and to leave a structure defined by the mask supporting the window layer.

Abstract: According to an example aspect of the present invention, there is provided a method comprising obtaining a first silicon wafer comprising a mask on a first side, attaching a second silicon wafer on the first side of the first silicon wafer, and etching one of the wafers to partially expose a window layer deposited on the opposite silicon wafer and to leave a structure defined by the mask supporting the window layer.