Abstract: A method for compensating for critical dimension (CD) variations of pattern lines of a wafer, by the correcting the CD of the corresponding photomask. The photomask comprises a transparent substrate having two substantially opposite surfaces, a first back surface and a second front surface on which front surface an absorbing coating is provided, on which the pattern lines were formed by removing the coating at the pattern lines. The method comprises: determining CD variations across regions of a wafer exposure field relating to the photomask; and providing Shading Elements (SE) within the substrate of the photomask in regions which correlates to regions of the wafer exposure field where CD variations greater than a predetermined target value were determined, whereby the shading elements attenuate light passing through the regions, so as to compensate for the CD variations on the wafer and hence provide and improved CD tolerance wafer.

Abstract: A method and apparatus for manufacturing patterns on a reticle blank comprising a substrate made from material transparent to UV irradiation and having a first surface and a second opposite surface, the first surface coated with a chrome layer. The method comprises providing ultra-short pulsed laser beams, focusing means, relative displacement facilitator for facilitating relative displacement of the reticle blank relative to said at least one of a plurality of target locations, and a controller for controlling the synchronization and operation of the laser beam source, the focusing means and the relative displacement facilitator. Ultra-short pulsed laser beam is irradiated in a predetermined pattern directed at the second surface and passing through the substrate, focused on the chrome layer or on its proximity.

Abstract: A method of producing in a solid transparent material, a diffractive optical element for the transformation of an incident wave in a predefined manner, by developing a mathematical model of the element in terms of the required transformation, then using that model for determining a set of points which form the desired diffractie optical element, and then focusing a pulsed laser beam sequentially onto the points in the set, such that it causes optical breakdown damage at those points. Numerical solutions for determining the positions of the set of points from the mathematical model are presented. The production of number of elements for specific applications is described. Complete laser systems capable of monitoring the production of the points in real time according to the results obtained by diffraction of the incident wave by the element under production.

Abstract: A method and apparatus for generating colored images of at least one color within a light-sensitive glass sample. The glass sample contains light-sensitive chemical components that acquire at least one of a multiplicity of colors in response to actinic radiation and subsequent heating to a temperature that causes color to appear. The method comprises focusing a pulsed laser beam to a target location within the glass, irradiating a plurality of pulses focused in the target location within the glass sample, thus generating a zone of increased opacity to the visible light at the target location and a resultant localized actinic radiation at that zone, displacing the focus point of the laser beam and the glass sample relative to each other by the displacing device in a predetermined manner so as to produce a plurality of zones of increased opacity that form an image, and heating of the sample to a temperature that causes color to appear at the zones of increased opacity.

Abstract: A method and apparatus for generating colored images of at least one color within a light-sensitive glass sample. The glass sample contains light-sensitive chemical components that acquire at least one of a multiplicity of colors in response to actinic radiation and subsequent heating to a temperature that causes color to appear. The method comprises focusing a pulsed laser beam to a target location within the glass, irradiating a plurality of pulses focused in the target location within the glass sample, thus generating a zone of increased opacity to the visible light at the target location and a resultant localized actinic radiation at that zone, displacing the focus point of the laser beam and the glass sample relative to each other by the displacing device in a predetermined manner so as to produce a plurality of zones of increased opacity that form an image, and heating of the sample to a temperature that causes color to appear at the zones of increased opacity.

Abstract: A method and apparatus for manufacturing patterns on a reticle blank comprising a substrate made from material transparent to UV irradiation and having a first surface and a second opposite surface, the first surface coated with a chrome layer. The method comprises providing ultra-short pulsed laser beams, focusing means, relative displacement facilitator for facilitating relative displacement of the reticle blank relative to said at least one of a plurality of target locations, and a controller for controlling the synchronization and operation of the laser beam source, the focusing means and the relative displacement facilitator. Ultra-short pulsed laser beam is irradiated in a predetermined pattern directed at the second surface and passing through the substrate, focused on the chrome layer or on its proximity.