Patents by Inventor Nilabh K. Roy

Nilabh K. Roy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11327409
    Abstract: Methods and systems that include the generation of a map of modulation values for a spatial light modulator. In which a map representative of a desired curing region is received. Receiving, for each pixel of a spatial light modulator, spatial information representative of an intensity distribution of actinic radiation at a plane of formable material under a template that is guided from the spatial light modulator to the plane of the formable material for curing the formable material under the template. Receiving a dose threshold for the formable material. Generating a map of modulation values for each pixel in the spatial light modulator based on: the dose threshold; the spatial information for all of the pixels; and the map representative of the desired curing region.
    Type: Grant
    Filed: October 23, 2019
    Date of Patent: May 10, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nilabh K. Roy, Anshuman Cherala
  • Publication number: 20220128901
    Abstract: A system and method of shaping a film with a template on a substrate. Generating a first series of parameters from tests performed on a first series of films formed with: a set of shaping conditions; a calibration measurement parameter determined for each substrate prior to shaping; and a first scaling parameter. Generating a second series of parameters from the tests performed on a second series of films produced formed with the set of shaping conditions. The second series of films produced with the calibration measurement parameter determined for each substrate; and a second scaling parameter; or without the calibration measurement parameter. Generating a scaling parameter from: the first series of the parameters; and the second series of parameters. Generating the calibration measurement parameter prior to forming the film. Forming the film using the set of shaping conditions, the calibration measurement parameter, and the scaling parameter.
    Type: Application
    Filed: October 28, 2020
    Publication date: April 28, 2022
    Inventors: Nilabh K. Roy, Mario Johannes Meissl, Xiaoming Lu
  • Publication number: 20210407797
    Abstract: A system and method of forming a planarization layer on a substrate is disclosed. The method can include holding a superstrate with a superstrate chuck, the superstrate chuck positioned relative to a diffusing element, where the diffusing element includes a pattern and the superstrate chuck includes one or more geometric features, and where the pattern of the diffusing element aligns with the one or more geometric features of the superstrate chuck. The method can also include dispensing a formable material over the substrate, contacting the formable material over the substrate with a superstrate, providing a set of beams that pass through the diffusing element to cure the formable material over the substrate and form a layer over the substrate while the superstrate is contacting the formable material.
    Type: Application
    Filed: June 24, 2020
    Publication date: December 30, 2021
    Inventors: Nilabh K. Roy, Mario Johannes Meissl, Masaki Saito
  • Patent number: 11199774
    Abstract: A frame cure apparatus includes a position actuator and a controller. The position actuator is attached to a digital spatial modulator (DSM) having a plurality of spatial elements with a pitch, and configured to move the DSM with a step size less than the pixel pitch to provide a pattern for curing a photo-curable material in a desired curing region on a substrate. The controller moves the DSM with the step size in a predefined sequence that covers a first curing region and a second curing region such that a first curing dose accumulated at the first curing region exceeds a curing threshold while a second curing dose accumulated at the second curing region does not exceed the curing threshold. The predefined sequence provides the set of curing patterns. The first curing region matches the desired region. The second curing region does not match the desired curing region.
    Type: Grant
    Filed: March 30, 2020
    Date of Patent: December 14, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Nilabh K. Roy, Anshuman Cherala
  • Publication number: 20210302829
    Abstract: A frame cure apparatus includes a position actuator and a controller. The position actuator is attached to a digital spatial modulator (DSM) having a plurality of spatial elements with a pitch, and configured to move the DSM with a step size less than the pixel pitch to provide a pattern for curing a photo-curable material in a desired curing region on a substrate. The controller moves the DSM with the step size in a predefined sequence that covers a first curing region and a second curing region such that a first curing dose accumulated at the first curing region exceeds a curing threshold while a second curing dose accumulated at the second curing region does not exceed the curing threshold. The predefined sequence provides the set of curing patterns. The first curing region matches the desired region. The second curing region does not match the desired curing region.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Inventors: Nilabh K. Roy, Anshuman Cherala
  • Publication number: 20210299921
    Abstract: An imprint apparatus is provided. The imprint apparatus includes an imprint head, at least one cable assembly configured to supply a signal to the imprint head, and a cable assembly sensor configured to detect a state of the at least one cable assembly. The signal may include one or more of a voltage signal, a current signal, and a pneumatic signal. The cable assembly sensor may include a strain gauge configured to measure a strain of the at least one cable assembly or a load cell configured to measure a force on the at least one cable assembly. For example, the cable assembly may include an electric wire and/or a gas supply tube.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Inventors: Nilabh K. Roy, Mario Johannes Meissl
  • Publication number: 20210271161
    Abstract: A method of forming a planarization layer on a substrate is disclosed. The method can include aligning a superstrate with the substrate, where aligning the superstrate with the substrate comprises tuning a diffusing element to a first operational state, dispensing a formable material over the substrate, contacting the formable material over the substrate with the superstrate, tuning the diffusing element to a second operational state, where the first operational state is different from the second operational state, and curing the formable material over the substrate to form a layer over the substrate while the superstrate is contacting the formable material, where curing the formable material can include directing a set of actinic radiation beams to enter the diffusing element at an entering state and exit the diffusing element at an exiting state, and where the entering state is different from the exiting state.
    Type: Application
    Filed: February 27, 2020
    Publication date: September 2, 2021
    Inventors: Nilabh K. ROY, Mario Johannes MEISSL, Masaki SAITO
  • Publication number: 20210191256
    Abstract: Methods and systems for imprinting, including receiving template slippage data about a change in a position of a template relative to a reference position. Also, a desired actinic radiation pattern to expose formable material in an imprinting field under a template border region of the template may be received. In addition, a new actinic radiation pattern to expose the template border region that compensates for the template slippage may be determined. The formable material in the imprinting field on the substrate may be contacted with the template. The template border region may be exposed to the new actinic radiation pattern while the template is in contact with the formable material.
    Type: Application
    Filed: December 18, 2019
    Publication date: June 24, 2021
    Inventors: Anshuman Cherala, Nilabh K. Roy
  • Publication number: 20210181621
    Abstract: Imprinting methods and imprinting systems configured to cure formable material between a substrate and a template. With a first spatial light modulator with a first set of modulation elements configured to expose the formable material between the substrate and the template to a first pattern of actinic radiation; and a second spatial light modulator with a second set of modulation elements configured to expose the formable material between the substrate and the template to a second pattern of actinic radiation. At a plane of the formable material, a first set of centers of the first pattern associated with centers of the first set of modulation elements may be offset from a second set of centers of the second pattern associated with centers of the second set of modulation elements.
    Type: Application
    Filed: December 12, 2019
    Publication date: June 17, 2021
    Inventors: Edward Brian Fletcher, James W. Irving, Nilabh K. Roy
  • Publication number: 20210124274
    Abstract: Methods and systems that include the generation of a map of modulation values for a spatial light modulator. In which a map representative of a desired curing region is received. Receiving, for each pixel of a spatial light modulator, spatial information representative of an intensity distribution of actinic radiation at a plane of formable material under a template that is guided from the spatial light modulator to the plane of the formable material for curing the formable material under the template. Receiving a dose threshold for the formable material. Generating a map of modulation values for each pixel in the spatial light modulator based on: the dose threshold; the spatial information for all of the pixels; and the map representative of the desired curing region.
    Type: Application
    Filed: October 23, 2019
    Publication date: April 29, 2021
    Inventors: Nilabh K. Roy, Anshuman Cherala
  • Publication number: 20210125855
    Abstract: A chuck for retaining a superstrate or a template. The chuck comprises a geometric structure formed on a surface of the chuck. The geometric structure includes at least one of a rounded edge portion and a roughened surface portion, such that an intensity variation of light transmitting through the geometric structure and an area of the chuck adjacent to the geometric structure is reduced.
    Type: Application
    Filed: October 29, 2019
    Publication date: April 29, 2021
    Inventors: Nilabh K. Roy, Mario Johannes Meissl, Seth J. Bamesberger, Ozkan Ozturk, Byung-Jin Choi