Patents by Inventor Niladri Sen

Niladri Sen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11561480
    Abstract: A computer-implemented defect prediction method for a device manufacturing process involving processing a pattern onto a substrate. Non-correctable error is used to help predict locations where defects are likely to be present, allowing improvements in metrology throughput. In an embodiment, non-correctable error information relates to imaging error due to limitations on, for example, the lens hardware, imaging slit size, and/or other physical characteristics of the lithography system. In an embodiment, non-correctable error information relates to imaging error induced by lens heating effects.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: January 24, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Ivo Liebregts, Niladri Sen, Koen Thuijs, Ronaldus Johannes Gysbertus Goossens
  • Publication number: 20200209761
    Abstract: A computer-implemented defect prediction method for a device manufacturing process involving processing a pattern onto a substrate. Non-correctable error is used to help predict locations where defects are likely to be present, allowing improvements in metrology throughput. In an embodiment, non-correctable error information relates to imaging error due to limitations on, for example, the lens hardware, imaging slit size, and/or other physical characteristics of the lithography system. In an embodiment, non-correctable error information relates to imaging error induced by lens heating effects.
    Type: Application
    Filed: December 12, 2019
    Publication date: July 2, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ivo LIEBREGTS, Niladri Sen, Koen Thuijs, Ronaldus Johannes Gysbertus Goossens