Patents by Inventor Nilay Saha

Nilay Saha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process
    Patent number: 8345231
    Abstract: Method of determining defects in a substrate, the method comprising: scanning a scan range of the substrate with a sensor, the sensor projecting a beam of radiation on the substrate; measuring the fraction of the intensity of the radiation reflected from different substrate areas along the scan range; determining the variations of the measured fraction across the scan range; determining from the variations whether any defects are present in the substrate.
    Type: Grant
    Filed: May 22, 2009
    Date of Patent: January 1, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Nilay Saha, Hermen Folken Pen
  • METHOD OF DETERMINING DEFECTS IN A SUBSTRATE AND APPARATUS FOR EXPOSING A SUBSTRATE IN A LITHOGRAPHIC PROCESS
    Publication number: 20090296090
    Abstract: Method of determining defects in a substrate, the method comprising: scanning a scan range of the substrate with a sensor, the sensor projecting a beam of radiation on the substrate; measuring the fraction of the intensity of the radiation reflected from different substrate areas along the scan range; determining the variations of the measured fraction across the scan range; determining from the variations whether any defects are present in the substrate.
    Type: Application
    Filed: May 22, 2009
    Publication date: December 3, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nilay SAHA, Hermen Folken PEN