Patents by Inventor Nilesh Chimanrao Bagul
Nilesh Chimanrao Bagul has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11926903Abstract: Methods for etching alkali metal compounds are disclosed. Some embodiments of the disclosure expose an alkali metal compound to an alcohol to form a volatile metal alkoxide. Some embodiments of the disclosure expose an alkali metal compound to a ?-diketone to form a volatile alkali metal ?-diketonate compound. Some embodiments of the disclosure are performed in-situ after a deposition process. Some embodiments of the disclosure provide methods which selectively etch alkali metal compounds.Type: GrantFiled: June 9, 2022Date of Patent: March 12, 2024Assignee: Applied Materials, Inc.Inventors: Nitin Deepak, Tapash Chakraborty, Prerna Sonthalia Goradia, Visweswaren Sivaramakrishnan, Nilesh Chimanrao Bagul, Bahubali S. Upadhye
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Publication number: 20220396732Abstract: Methods for etching alkali metal compounds are disclosed. Some embodiments of the disclosure expose an alkali metal compound to an alcohol to form a volatile metal alkoxide. Some embodiments of the disclosure expose an alkali metal compound to a ?-diketone to form a volatile alkali metal ?-diketonate compound. Some embodiments of the disclosure are performed in-situ after a deposition process. Some embodiments of the disclosure provide methods which selectively etch alkali metal compounds.Type: ApplicationFiled: June 9, 2022Publication date: December 15, 2022Applicant: Applied Materials, Inc.Inventors: Nitin Deepak, Tapash Chakraborty, Prerna Sonthalia Goradia, Visweswaren Sivaramakrishnan, Nilesh Chimanrao Bagul, Bahubali S. Upadhye
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Publication number: 20220362995Abstract: An additive manufacturing apparatus includes an environmentally sealed first chamber, a second chamber separated from the first chamber by a first valve, a platform positionable in the first chamber, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform in the first chamber, at least one energy source to selectively fuse feed material in a layer on the platform in the first chamber, and an air knife assembly to direct a laminar flow of air across a layer of feed material on the platform in the first chamber. The air knife assembly includes an inlet module and an exhaust module that are movable through the first valve between the first chamber and the second chamber.Type: ApplicationFiled: July 20, 2022Publication date: November 17, 2022Inventors: Dakshalkumar Patel, Girish Kumar Chaturvedi, Bahubali S. Upadhye, Sumedh Acharya, Mahendran Chidambaram, Nilesh Chimanrao Bagul
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Publication number: 20220333231Abstract: A method, system, and evaporation source for reactive deposition is provided. The system includes a deposition surface operable for depositing a material onto a substrate provided on the deposition surface. The system further includes an evaporation source positioned for depositing the material onto the substrate. The evaporation source includes a crucible. The crucible includes a base and at least one sidewall extending upward from the base and defining an interior region of the crucible. The evaporation source further includes a cooling mechanism. The cooling mechanism includes a cylindrical cooling jacket surrounding an outer surface of the at least one sidewall while leaving a bottom surface of the base exposed, wherein a cooling gap is defined between the outer surface of the at least one sidewall of the crucible and an inner surface of a sidewall of the cylindrical cooling jacket.Type: ApplicationFiled: March 28, 2022Publication date: October 20, 2022Inventors: Sambhu KUNDU, PrasannaKalleshwara Buddappa RAMACHANDRAPPA, Sumedh Dattatraya ACHARYA, Subramanya P. HERLE, Nilesh Chimanrao BAGUL, Visweswaren SIVARAMAKRISHNAN
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Publication number: 20220281168Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform, at least one energy source to selectively fuse feed material in a layer on the platform, and an air knife assembly. The air knife assembly includes an inlet unit to deliver gas over the platform and an exhaust unit to receive gas from over the platform. The exhaust unit includes a plenum having a port connected to a gas return conduit, and a gas collector that is open at a front end to receive gas from over the platform and has a concave plate at a back end of the gas collector. An aperture is formed at a back of the concave plate between the gas collector and the plenum to provide a constricted flow path for gas from the collector to the plenum.Type: ApplicationFiled: May 23, 2022Publication date: September 8, 2022Inventors: Dakshalkumar Patel, Girish Kumar Chaturvedi, Bahubali S. Upadhye, Sumedh Acharya, Mahendran Chidambaram, Nilesh Chimanrao Bagul
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Patent number: 11413817Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform, at least one energy source to selectively fuse feed material in a layer on the platform, and an air knife assembly. The air knife assembly includes an inlet unit to deliver gas over the platform and an exhaust unit to receive gas from over the platform. The inlet unit includes a multi-chamber plenum, a gas inlet, and a gas distribution module. The multi-chamber plenum has a plurality of vertically stacked chambers that are fluidically connected, with a first chamber of the plurality of vertically stacked chambers positioned at a higher elevation than a collection chamber of the plurality of vertically stacked chambers.Type: GrantFiled: November 14, 2019Date of Patent: August 16, 2022Assignee: Applied Materials, Inc.Inventors: Dakshalkumar Patel, Girish Kumar Chaturvedi, Bahubali S. Upadhye, Sumedh Acharya, Mahendran Chidambaram, Nilesh Chimanrao Bagul
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Patent number: 11400649Abstract: An additive manufacturing apparatus includes an environmentally sealed first chamber, a second chamber separated from the first chamber by a first valve, a platform positionable in the first chamber, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform in the first chamber, at least one energy source to selectively fuse feed material in a layer on the platform in the first chamber, and an air knife assembly to direct a laminar flow of air across a layer of feed material on the platform in the first chamber. The air knife assembly includes an inlet module and an exhaust module that are movable through the first valve between the first chamber and the second chamber.Type: GrantFiled: November 14, 2019Date of Patent: August 2, 2022Assignee: Applied Materials, Inc.Inventors: Dakshalkumar Patel, Girish Kumar Chaturvedi, Bahubali S. Upadhye, Sumedh Acharya, Mahendran Chidambaram, Nilesh Chimanrao Bagul
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Publication number: 20220162747Abstract: Exemplary methods of removing lithium-containing deposits may include heating a surface of a lithium-containing deposit. The surface may include oxygen or nitrogen, and the lithium-containing deposit may be disposed on a surface of a processing chamber. The methods may include contacting the surface of the lithium-containing deposit with a hydrogen-containing precursor. The contacting may hydrogenate the surface of the lithium-containing deposit. The methods may include contacting the lithium-containing deposit with a nitrogen-containing precursor to form volatile byproducts. The methods may include exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.Type: ApplicationFiled: November 18, 2021Publication date: May 26, 2022Applicant: Applied Materials, Inc.Inventors: Tapash Chakraborty, Nitin Deepak, Prerna Sonthalia Goradia, Bahubali S. Upadhye, Nilesh Chimanrao Bagul, Subramanya P. Herle, Visweswaren Sivaramakrishnan
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Patent number: 11192153Abstract: Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.Type: GrantFiled: July 30, 2018Date of Patent: December 7, 2021Assignee: Applied Materials, Inc.Inventors: Sankesha Bhoyar, Mahesh Arcot, Nilesh Chimanrao Bagul, Hemantha Raju, Ravindra Patil
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Patent number: 11180849Abstract: An apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The apparatus includes a vaporizer assembly having an injection valve for receiving a liquid reactant, vaporizing the liquid reactant, and delivering the vaporized liquid reactant. The injection valve includes a valve body encompassing an interior region therein, a gas inlet port, a liquid inlet port, and a vapor outlet port all in fluid communication with the interior region. The vaporizer assembly further includes a first inlet line having a first end fluidly coupled with the liquid inlet port and a second end to be connected to a liquid source. The vaporizer assembly further includes a second inlet line with a first end fluidly coupled with the gas inlet port, a second end fluidly coupled with a carrier gas source, and a heater positioned between the first end and the second end.Type: GrantFiled: August 20, 2019Date of Patent: November 23, 2021Assignee: Applied Materials, Inc.Inventors: Subramanya P. Herle, Vicente M. Lim, Basavaraj Pattanshetty, Ajay More, Marco Mohr, Bjoern Sticksel-Weis, Nilesh Chimanrao Bagul, Visweswaren Sivaramakrishnan
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Publication number: 20210094229Abstract: An additive manufacturing apparatus includes an environmentally sealed first chamber, a second chamber separated from the first chamber by a first valve, a platform positionable in the first chamber, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform in the first chamber, at least one energy source to selectively fuse feed material in a layer on the platform in the first chamber, and an air knife assembly to direct a laminar flow of air across a layer of feed material on the platform in the first chamber. The air knife assembly includes an inlet module and an exhaust module that are movable through the first valve between the first chamber and the second chamber.Type: ApplicationFiled: November 14, 2019Publication date: April 1, 2021Inventors: Dakshalkumar Patel, Girish Kumar Chaturvedi, Bahubali S. Upadhye, Sumedh Acharya, Mahendran Chidambaram, Nilesh Chimanrao Bagul
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Publication number: 20210094234Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform, at least one energy source to selectively fuse feed material in a layer on the platform, and an air knife assembly. The air knife assembly includes an inlet unit to deliver gas over the platform and an exhaust unit to receive gas from over the platform. The inlet unit includes a multi-chamber plenum, a gas inlet, and a gas distribution module. The multi-chamber plenum has a plurality of vertically stacked chambers that are fluidically connected, with a first chamber of the plurality of vertically stacked chambers positioned at a higher elevation than a collection chamber of the plurality of vertically stacked chambers.Type: ApplicationFiled: November 14, 2019Publication date: April 1, 2021Inventors: Dakshalkumar Patel, Girish Kumar Chaturvedi, Bahubali S. Upadhye, Sumedh Acharya, Mahendran Chidambaram, Nilesh Chimanrao Bagul
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Publication number: 20200071820Abstract: A method and apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The DLI system includes a liquid precursor source vaporization system, which vaporizes liquid stably and efficiently. In one implementation, the DLI system is a closed loop integrated system which combines, an injection valve (IV) along with a Liquid Flow Meter (LFM), an ampoule assembly as a source of pressurized precursor, an inert push gas to pressurize the precursor in the ampoule assembly, a temperature controller to maintain a targeted temperature regime, leak detection and controlled carrier gas flow to gas heater.Type: ApplicationFiled: August 20, 2019Publication date: March 5, 2020Inventors: Subramanya P. HERLE, Vicente M. LIM, Basavaraj PATTANSHETTY, Ajay MORE, Marco MOHR, Bjoern STICKSEL-WEIS, Nilesh Chimanrao BAGUL, Visweswaren SIVARAMAKRISHNAN
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Patent number: 10280507Abstract: Systems and methods for forming films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a liquid solution made from a solvent and a deposition precursor. A carrier gas may be flowed through the liquid solution and push the droplets toward a substrate placed in a substrate processing region. The droplets pass into the substrate processing region and chemically react with the substrate to form films. The temperature of the substrate may be maintained below the boiling temperature of the solvent during film formation. The solvent imparts a flowability to the forming film and enable the depositing film to flow along the surface of a patterned substrate during formation prior to solidifying. The flowable film results in bottom-up gapfill inside narrow high-aspect ratio gaps in the patterned substrate.Type: GrantFiled: May 14, 2018Date of Patent: May 7, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Ranga Rao Arnepalli, Darshan Thakare, Abhijit Basu Mallick, Pramit Manna, Robert Jan Visser, Prerna Sonthalia Goradia, Nilesh Chimanrao Bagul
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Patent number: 10273577Abstract: Systems and methods for processing films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a condensed matter (liquid or solid) of one or more precursors. A carrier gas is flowed through the condensed matter and push the droplets toward a substrate placed in a substrate processing region. An inline pump connected with the aerosol generator can also be used to push the droplets towards the substrate. A direct current (DC) electric field is applied between two conducting plates configured to pass the droplets in-between. The size of the droplets is desirably reduced by application of the DC electric field. After passing through the DC electric field, the droplets pass into the substrate processing region and chemically react with the substrate to deposit or etch films.Type: GrantFiled: October 5, 2016Date of Patent: April 30, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Ranga Rao Arnepalli, Nilesh Chimanrao Bagul, Prerna Sonthalia Goradia, Robert Jan Visser
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Patent number: 10163629Abstract: Systems and methods for processing films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a condensed matter (liquid or solid) of one or more precursors. A carrier gas is flowed through the condensed matter and push the droplets toward a substrate placed in a substrate processing region. An inline pump connected with the aerosol generator can also be used to push the droplets towards the substrate. A direct current (DC) electric field is applied between two conducting plates configured to pass the droplets in-between. The size of the droplets is desirably reduced by application of the DC electric field. After passing through the DC electric field, the droplets pass into the substrate processing region and chemically react with the substrate to deposit or etch films.Type: GrantFiled: February 16, 2016Date of Patent: December 25, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Ranga Rao Arnepalli, Nilesh Chimanrao Bagul, Prerna Sonthalia Goradia, Robert Jan Visser
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Publication number: 20180339314Abstract: Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.Type: ApplicationFiled: July 30, 2018Publication date: November 29, 2018Applicant: APPLIED MATERIALS, INC.Inventors: Sankesha Bhoyar, Mahesh Arcot, Nilesh Chimanrao Bagul, Hemantha Raju, Ravindra Patil
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Publication number: 20180298492Abstract: Systems and methods for forming films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a liquid solution made from a solvent and a deposition precursor. A carrier gas may be flowed through the liquid solution and push the droplets toward a substrate placed in a substrate processing region. The droplets pass into the substrate processing region and chemically react with the substrate to form films. The temperature of the substrate may be maintained below the boiling temperature of the solvent during film formation. The solvent imparts a flowability to the forming film and enable the depositing film to flow along the surface of a patterned substrate during formation prior to solidifying. The flowable film results in bottom-up gapfill inside narrow high-aspect ratio gaps in the patterned substrate.Type: ApplicationFiled: May 14, 2018Publication date: October 18, 2018Applicant: APPLIED MATERIALS, INC.Inventors: Ranga Rao Arnepalli, Darshan Thakare, Abhijit Basu Mallick, Pramit Manna, Robert Jan Visser, Prerna Sonthalia Goradia, Nilesh Chimanrao Bagul
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Patent number: 10081036Abstract: Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.Type: GrantFiled: September 19, 2016Date of Patent: September 25, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Sankesha Bhoyar, Mahesh Arcot, Nilesh Chimanrao Bagul, Hemantha Raju, Ravindra Patil
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Patent number: 10017856Abstract: Systems and methods for forming films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a liquid solution made from a solvent and a deposition precursor. A carrier gas may be flowed through the liquid solution and push the droplets toward a substrate placed in a substrate processing region. The droplets pass into the substrate processing region and chemically react with the substrate to form films. The temperature of the substrate may be maintained below the boiling temperature of the solvent during film formation. The solvent imparts a flowability to the forming film and enable the depositing film to flow along the surface of a patterned substrate during formation prior to solidifying. The flowable film results in bottom-up gapfill inside narrow high-aspect ratio gaps in the patterned substrate.Type: GrantFiled: April 17, 2017Date of Patent: July 10, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Ranga Rao Arnepalli, Darshan Thakare, Abhijit Basu Mallick, Pramit Manna, Robert Jan Visser, Prerna Sonthalia Goradia, Nilesh Chimanrao Bagul