Abstract: In an RF power LDMOS transistor comprising multiple pairs of parallel gate fingers (11) located on opposite side of an associated p+ sinker (23), and metal clamps (14) for short-circuiting the p+ sinkers (23), each gate finger (11) of a pair is associated with separate metal clamps (14) that short-circuit the n+ source region (20) and the p+ sinker (23) associated with particular gate finger (11). The separate metal clamps (14) associated with each gate finger pairs are separated by a slot (15) that extends between the parallel gate fingers (11), and a metal runner (13) extends in the slot (15) between the separate metal clamps (14) associated with each finger pair from a gate pad. Both gate fingers (11) of a gate finger pair are connected to the associated metal runner (13) at both ends and at predetermined positions along their lengths.

Abstract: Linearity and/or efficiency of a power MOS transistor comprising a plurality of transistor segments connected in parallel, is improved in that at least one group of said transistor segments has a different threshold voltage than the rest of the transistor segments.

Abstract: In an RF power LDMOS transistor comprising multiple pairs of parallel gate fingers (11) located on opposite side of an associated p+ sinker (23), and metal clamps (14) for short-circuiting the p+ sinkers (23), each gate finger (11) of a pair is associated with separate metal clamps (14) that short-circuit the n+ source region (20) and the p+ sinker (23) associated with particular gate finger (11). The separate metal clamps (14) associated with each gate finger pairs are separated by a slot (15) that extends between the parallel gate fingers (11), and a metal runner (13) extends in the slot (15) between the separate metal clamps (14) associated with each finger pair from a gate pad. Both gate fingers (11) of a gate finger pair are connected to the associated metal runner (13) at both ends and at predetermined positions along their lengths.

Abstract: Linearity and/or efficiency of a power MOS transistor comprising a plurality of transistor segments connected in parallel, is improved in that at least one group of said transistor segments has a different threshold voltage than the rest of the transistor segments.

Abstract: To reduce parasitic capacitances between drain and source electrodes, respectively, and gate electrodes in a power MOS transistor, the drain and the source electrodes (D′, S′) are located below the gate electrodes (G) in the transistor.

Abstract: To eliminate the temperature dependency of the quiescent current of a power transistor (1), the gate bias voltage of the power transistor (1) is controlled by means of the output voltage of a biasing transistor (3) residing on the same silicon chip as the power transistor (1), and by interconnecting the gate (G3) and drain (D3) of the biasing transistor (3) and feeding it with a constant current (IB) from external circuitry.

Abstract: A plurality of transistor cells (36) formed on a semiconductor substrate (32) are connected to form a radio frequency power transistor device (30), whereby individual conductive paths (38) are formed on one side of the substrate (32) to connect respective common gate terminals (34) of adjacent transistor cells (36) in series. A further conductive path (40) is formed on an opposite side of the substrate connecting respective drain terminals (35) of the transistor cells (36) in parallel. A resistive element (42) is interposed in the conductive path (38) connecting each adjacent pair of gate terminals (34). The conductivity of the respective resistive elements (42) is selected so as to adequately provide a conductive pathway for connecting the respective gate terminal outputs, while being sufficiently resistive such that each gate terminal 34 "sees" an electrical circuit termination.