Patents by Inventor Nils Brenning

Nils Brenning has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11351602
    Abstract: A process for producing magnetic nanowires of high quality and a good production yield is disclosed. The process comprises sputtering a target of a magnetic material using a plasma, growing nanoparticles from the sputtered matter to magnetic nanoparticles and collecting the magnetic nanoparticles on a substrate in the form of nanowires.
    Type: Grant
    Filed: December 8, 2017
    Date of Patent: June 7, 2022
    Inventors: Ulf Helmersson, Nils Brenning, Sebastian Ekeroth
  • Patent number: 9447493
    Abstract: A high production rate plasma sputtering process for producing particles having a size of 10 ?m or less is disclosed. The process causes ionization of at least a part of the sputtered target atoms and is performed at such parameters that the pick-up probability of ionized sputtered target atoms on the surface of grains is high.
    Type: Grant
    Filed: February 22, 2011
    Date of Patent: September 20, 2016
    Assignee: Plasmadvance AB
    Inventors: Ulf Helmersson, Nils Brenning, Daniel Soderstrom
  • Publication number: 20140027269
    Abstract: The sputtering process according to the present disclosure comprises providing a target consisting of carbon in a sputtering apparatus, introducing a process gas essentially consisting of a neon or a gas mixture comprising at least 60% neon into said apparatus, applying a pulsed power discharge to said target in order to create a plasma of said process gas, sputtering said target by means of said plasma. The process is able to ionize a significant amount of sputtered carbon atoms.
    Type: Application
    Filed: March 26, 2012
    Publication date: January 30, 2014
    Applicant: Ionautics AB
    Inventors: Ulf Helmersson, Nils Brenning, Asim Aijaz
  • Publication number: 20120305385
    Abstract: A high production rate plasma sputtering process for producing particles having a size of 10 ?m or less is disclosed. The process causes ionization of at least a part of the sputtered target atoms and is performed at such parameters that the pick-up probability of ionized sputtered target atoms on the surface of grains is high.
    Type: Application
    Filed: February 22, 2011
    Publication date: December 6, 2012
    Applicant: TIÃ… AB
    Inventors: Ulf Helmersson, Nils Brenning, Daniel Soderstrom