Patents by Inventor Ning Feng

Ning Feng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12376374
    Abstract: A method includes forming a first, second, third, fourth, fifth, and sixth fin structure. The second fin structure is separated from each of the first and third fin structures by a first distance, the fifth fin structure is separated from each of the fourth and sixth fin structures by the first distance, and the third fin structure is separated from the fourth fin structure by a second distance greater than the first distance. The method includes forming a first dummy gate structure overlaying the first through third fin structures, and a second dummy gate structure overlaying the fourth through sixth fin structures; forming a number of source/drain structures that are coupled to the first, second, third, fourth, fifth, and sixth fin structures, respectively; and replacing the third fin structure with a first dielectric structure, and replacing the fourth fin structure with a second dielectric structure.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: July 29, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shih-Yao Lin, Chen-Ping Chen, Chieh-Ning Feng, Hsiao Wen Lee, Chih-Han Lin
  • Patent number: 12363999
    Abstract: A method for making a semiconductor device includes: forming a first semiconductor fin structure and a second semiconductor fin structure over a substrate that both extend along a first lateral direction; forming a dummy gate structure that extends along a second lateral direction perpendicular to the first direction and straddles the first and second semiconductor fin structures; removing a portion of the dummy gate structure between the first and second semiconductor fin structures to form a trench, a width of the trench along the second direction decreasing with increasing depth toward the substrate; filling the trench with a dielectric material; and removing the second semiconductor fin structure and a portion of the dielectric material.
    Type: Grant
    Filed: June 20, 2024
    Date of Patent: July 15, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company Ltd.
    Inventors: Shu-Uei Jang, Shih-Yao Lin, Chieh-Ning Feng, Shu-Yuan Ku
  • Publication number: 20250223921
    Abstract: Disclosed are a gas turbine generator set and mobile power generation equipment. The gas turbine generator set includes a gas turbine, a generator, and an equipment cabin. The gas turbine is arranged inside the equipment cabin. The generator is connected to the gas turbine for generating electric power. The generator may be arranged outside the equipment cabin, so that a heat dissipation load of the equipment cabin is reduced. As such, difficulty in designing an efficient heat dissipation and cooling scheme for the gas turbine inside the equipment cabin is reduced. The solution also facilitates convenient maintenance of the generator without opening the equipment cabin or entering the equipment cabin.
    Type: Application
    Filed: March 26, 2025
    Publication date: July 10, 2025
    Applicant: YANTAI JEREH PETROLEUM EQUIPMENT & TECHNOLOGIES CO., LTD.
    Inventors: Ting ZHANG, Wanchun ZHA, Jianglei ZOU, Qiong WU, Ning FENG, Yichao MU
  • Patent number: 12286049
    Abstract: Embodiments herein provide a vehicle-mounted gas turbine generator set, including: a chassis vehicle, a main cabin body and at least one of an air intake filter system, a ventilation filter system and an exhaust system. The chassis vehicle includes a main beam and an operator cabin. The operator cabin is located at a first side of the main beam in a first direction. The main cabin body defines a main accommodation space. A gas turbine and a generator connected with each other, and an electrical system connected with the gas turbine and the generator, are arranged in the main accommodation space. In a second direction perpendicular to the first direction, the main accommodation space is located between the main beam and the at least of the air intake filter system, the ventilation filter system and the exhaust system.
    Type: Grant
    Filed: April 27, 2021
    Date of Patent: April 29, 2025
    Assignee: YANTAI JEREH PETROLEUM EQUIPMENT & TECHNOLOGIES CO., LTD.
    Inventors: Qili Cui, Wanchun Zha, Yichao Mou, Ting Zhang, Lining Xu, Qiong Wu, Jianglei Zou, Fulun Bi, Ning Feng, Honly Wang, Haibo Zhang
  • Patent number: 12234712
    Abstract: This disclosure generally relates to power generation methods and systems based on gas turbine engines, and particularly to mobile and adaptive power generation systems and methods based on gas turbine engine for supplying mechanical and/or electrical power for fracturing operations at an oil wellsite. Various systems, platforms, components, devices, and methods are provided for flexibly and adaptively configure one of more gas turbines, hydraulic pumps, and electric generators to support both fracturing and electric demands at a well site. The disclosed implementations enable and facilitate a mobile, adaptive, and reconfigurable power system to provide both mechanical and electric power for hydraulic fracturing operation.
    Type: Grant
    Filed: July 7, 2023
    Date of Patent: February 25, 2025
    Assignee: Yantai Jereh Petroleum Equipment & Technologies Co., Ltd.
    Inventors: Peng Zhang, Liang Lv, Rikui Zhang, Zhuqing Mao, Jianwei Wang, Chunqiang Lan, Yipeng Wu, Xincheng Li, Ning Feng, Ting Zhang, Jianglei Zou, Haibo Zhang, Ligong Wu, Cong Zhang, Wanchun Zha, Qiong Wu, Jifeng Zhong
  • Publication number: 20240387430
    Abstract: Semiconductor structures and methods are provided. An exemplary semiconductor structure includes a contact pad over a substrate, an under-bump metallization (UBM) layer over the contact pad, a metal pillar over first UBM layer and electrically coupled to the contact pad via the UBM layer, and a solder cap on the metal pillar. The metal pillar comprises copper, and a percentage of (111) crystal orientation of the copper is 90% or more.
    Type: Application
    Filed: August 4, 2023
    Publication date: November 21, 2024
    Inventors: Chang-Jung Hsueh, Chieh-Ning Feng, Yu-Lun Liu, Wen-Hsiung Lu, Ming-Da Cheng
  • Publication number: 20240387539
    Abstract: A method for making a semiconductor device includes forming a first fin structure including a first plurality of semiconductor layers vertically spaced from one another and over a substrate; forming a second fin structure including a second plurality of semiconductor layers vertically spaced from one another and over the substrate, the first and the second fin structures extend along a first lateral direction; forming a first dielectric structure extending into the substrate and parallel with the first and second fin structures, the second fin structure being separated from the first fin structure along a second lateral direction perpendicular to the first lateral direction, by a first distance; and forming a first gate structure that extends along the second lateral direction and wraps around each of the first plurality of semiconductor layers and each of the second plurality of semiconductor layers.
    Type: Application
    Filed: July 29, 2024
    Publication date: November 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shih-Yao Lin, Chen-Ping Chen, Chieh-Ning Feng, Hsiao Wen Lee, Chih-Han Lin
  • Patent number: 12147541
    Abstract: Techniques for secure boot up of unified extensible firmware interface (UEFI) compliant devices are described. In an example, execution of a driver associated with a hardware component of a computing device may be detected during booting of the computing device. Based on the detection, a first driver hash of a system table of the UEFI may be computed, where the system table is a data structure that stores configuration details of the computing device and UEFI services. Thereafter, a second driver hash of the system table may be computed based on detection of completion of the execution of the driver. The first driver hash and the second driver hash may then be compared to determine tampering with the system table of the UEFI.
    Type: Grant
    Filed: June 8, 2020
    Date of Patent: November 19, 2024
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Kang-Ning Feng, Tsue-Yi Huang, Chin-Hung Chao
  • Patent number: 12140072
    Abstract: The present invention discloses a system for providing mobile power, in which the required equipment for the power supply system at fracturing fields as well as connection cables and connection hoses are integrated properly, assigned onto three transport vehicles for movement and effectively connected. Intake components and a turbine generation system are combined on a first transport vehicle and installed together, then transported to customer sites directly, thus saving the installation time at the user sites. The two different designs on the locations of an exhaust stack and an exhaust silencer not only meet the requirements of road transportation, but also meet the requirements of exhaust gas emission during operations.
    Type: Grant
    Filed: July 13, 2022
    Date of Patent: November 12, 2024
    Assignee: YANTAI JEREH PETROLEUM EQUIPMENT & TECHNOLOGIES CO., LTD.
    Inventors: Ning Feng, Xin Li, Ting Zhang, Libin Zhou, Lili Wang, Wanchun Zha
  • Publication number: 20240371702
    Abstract: A method includes forming a dielectric fin over a substrate between a first semiconductor fin and a second semiconductor fin. The first and second semiconductor fins, and the dielectric fin all extend along a first lateral direction. The method includes forming a dummy gate structure that extends along a second lateral direction and includes a first portion and a second portion. The first and second portions overlay the first and second semiconductor fins, respectively, and separate from each other with the dielectric fin. The method includes removing upper sidewall portions of the dielectric fin. The method includes replacing the first and second portions of the dummy gate structure with a first and second active gate structures, respectively.
    Type: Application
    Filed: July 12, 2024
    Publication date: November 7, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shih-Yao Lin, Chieh-Ning Feng, Hsiao Wen Lee, Ming-Ching Chang
  • Publication number: 20240363431
    Abstract: A method of forming a semiconductor device includes forming a first fin and a second fin protruding above a substrate; forming isolation regions on opposing sides of the first fin and the second fin; forming a metal gate over the first fin and over the second fin, the metal gate being surrounded by a first dielectric layer; and forming a recess in the metal gate between the first fin and the second fin, where the recess extends from an upper surface of the metal gate distal the substrate into the metal gate, where the recess has an upper portion distal the substrate and a lower portion between the upper portion and the substrate, where the upper portion has a first width, and the lower portion has a second width larger than the first width, the first width and the second width measured along a longitudinal direction of the metal gate.
    Type: Application
    Filed: July 9, 2024
    Publication date: October 31, 2024
    Inventors: Chih-Chang Hung, Chieh-Ning Feng, Chun-Liang Lai, Yih-Ann Lin, Ryan Chia-Jen Chen
  • Publication number: 20240347534
    Abstract: A method for making a semiconductor device includes: forming a first semiconductor fin structure and a second semiconductor fin structure over a substrate that both extend along a first lateral direction; forming a dummy gate structure that extends along a second lateral direction perpendicular to the first direction and straddles the first and second semiconductor fin structures; removing a portion of the dummy gate structure between the first and second semiconductor fin structures to form a trench, a width of the trench along the second direction decreasing with increasing depth toward the substrate; filling the trench with a dielectric material; and removing the second semiconductor fin structure and a portion of the dielectric material.
    Type: Application
    Filed: June 20, 2024
    Publication date: October 17, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company Ltd.
    Inventors: Shu-Uei Jang, Shih-Yao Lin, Chieh-Ning Feng, Shu-Yuan Ku
  • Publication number: 20240321880
    Abstract: A semiconductor device includes a dielectric fin between a first semiconductor channel and a second semiconductor channel. The semiconductor device includes a first gate structure. The first gate structure includes a first portion and a second portion separated from each other by the dielectric fin. The semiconductor device includes a first gate spacer that extends along sidewalls of the first portion of the first gate structure. The semiconductor device includes a second gate spacer that extends along sidewalls of the second portion of the first gate structure, respectively. At least one of the first gate spacer or second gate spacer has a first portion with a first thickness and a second portion with a second thickness less than the first thickness, and wherein the first portion is closer to the dielectric fin than the second portion.
    Type: Application
    Filed: June 3, 2024
    Publication date: September 26, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shih-Yao Lin, Chieh-Ning Feng, Hsiao Wen Lee, Chao-Cheng Chen
  • Patent number: 12099612
    Abstract: In some examples, a computing device comprises a processing resource and a memory resource storing instructions to cause the processing resource to detect, by a basic input/output system (BIOS) of the computing device, firmware corruption in a firmware component of the computing device, generate a recovery agent based on the detected firmware corruption of the firmware component, determine a location of a back-up image of the firmware component based on the generated recovery agent, determine recovery sequence based on the determination of the location of the back-up image of the firmware component; and recover the firmware of the firmware component by executing the determined recovery sequence.
    Type: Grant
    Filed: January 27, 2020
    Date of Patent: September 24, 2024
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Kang-Ning Feng, Ming Chang Hung
  • Publication number: 20240309812
    Abstract: An air supply device, a gas turbine system and a using method thereof are disclosed. In the air supply device, an air intake compartment includes a connection end; a combustion air intake filter is located in the air intake compartment and connected with the combustion air intake filter; a combustion air intake interface is located on a tail plate and is connected with the combustion air silencer; and a sound insulation turnover mechanism includes a sound insulation flap and a turnover mechanism, the air intake compartment includes a first bottom plate and the tail plate that is located at the connection end, the sound insulation flap is located at the connection end, and the turnover mechanism is connected with the sound insulation flap, and is configured to drive the sound insulation flap to rotate relative to the tail plate.
    Type: Application
    Filed: May 28, 2024
    Publication date: September 19, 2024
    Applicant: YANTAI JEREH PETROLEUM EQUIPMENT & TECHNOLOGIES CO., LTD.
    Inventors: Ning FENG, Tao KOU, Ting ZHANG, Yichao MOU, Libin ZHOU, Xin LI, Xu LIU, Lili WANG, Jianglei ZOU, Qiong WU, Wanchun ZHA, Cong ZHANG
  • Patent number: 12094782
    Abstract: A method includes forming a dielectric fin over a substrate between a first semiconductor fin and a second semiconductor fin. The first and second semiconductor fins, and the dielectric fin all extend along a first lateral direction. The method includes forming a dummy gate structure that extends along a second lateral direction and includes a first portion and a second portion. The first and second portions overlay the first and second semiconductor fins, respectively, and separate from each other with the dielectric fin. The method includes removing upper sidewall portions of the dielectric fin. The method includes replacing the first and second portions of the dummy gate structure with a first and second active gate structures, respectively.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: September 17, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Shih-Yao Lin, Chieh-Ning Feng, Hsiao Wen Lee, Ming-Ching Chang
  • Publication number: 20240301777
    Abstract: This disclosure generally relates to power generation methods and systems based on gas turbine engines, and particularly to mobile and adaptive power generation systems and methods based on gas turbine engine for supplying mechanical and/or electrical power for fracturing operations at an oil wellsite. Various systems, platforms, components, devices, and methods are provided for flexibly and adaptively configure one of more gas turbines, hydraulic pumps, and electric generators to support both fracturing and electric demands at a well site. The disclosed implementations enable and facilitate a mobile, adaptive, and reconfigurable power system to provide both mechanical and electric power for hydraulic fracturing operation, which is convenient to set up for operation and for transport.
    Type: Application
    Filed: May 9, 2024
    Publication date: September 12, 2024
    Applicant: YANTAI JEREH PETROLEUM EQUIPMENT & TECHNOLOGIES CO., LTD.
    Inventors: Peng ZHANG, Liang LV, Rikui ZHANG, Zhuqing MAO, Jianwei WANG, Chunqiang LAN, Yipeng WU, Xincheng LI, Ning FENG, Ting ZHANG, Jianglei ZOU, Haibo ZHANG, Ligong WU, Cong ZHANG, Wanchun ZHA, Qiong WU, Jifeng ZHONG
  • Patent number: 12087639
    Abstract: A method of forming a semiconductor device includes forming a first fin and a second fin protruding above a substrate; forming isolation regions on opposing sides of the first fin and the second fin; forming a metal gate over the first fin and over the second fin, the metal gate being surrounded by a first dielectric layer; and forming a recess in the metal gate between the first fin and the second fin, where the recess extends from an upper surface of the metal gate distal the substrate into the metal gate, where the recess has an upper portion distal the substrate and a lower portion between the upper portion and the substrate, where the upper portion has a first width, and the lower portion has a second width larger than the first width, the first width and the second width measured along a longitudinal direction of the metal gate.
    Type: Grant
    Filed: August 9, 2022
    Date of Patent: September 10, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chih-Chang Hung, Chieh-Ning Feng, Chun-Liang Lai, Yih-Ann Lin, Ryan Chia-Jen Chen
  • Publication number: 20240289223
    Abstract: An example non-transitory machine-readable medium includes recovery instructions that, when executed by a processor, cause the processor to detect a corruption of first installed instructions of first component firmware at a computing device and second installed instructions of second component firmware at the computing device. In response to detection of the corruption during pre-boot, if the first installed instructions are detected as corrupt, the recovery instructions request and receive first replacement instructions from a first network address, and replace in the computing device the first installed instructions with the first replacement instructions. If the second installed instructions are detected as corrupt, the recovery instructions request and receive second replacement instructions from a second network address different from the first network address, and replace in the computing device the second installed instructions with the second replacement instructions.
    Type: Application
    Filed: June 18, 2021
    Publication date: August 29, 2024
    Inventors: Kang-Ning Feng, Ming-Chang Hung, Wei-Chih Huang
  • Patent number: 12046597
    Abstract: A semiconductor device includes a substrate; a semiconductor fin structure disposed over the substrate, wherein the semiconductor fin structure extend along a first lateral direction; a gate structure that straddles a semiconductor fin structure, wherein the gate structure extends along a second lateral direction, the first lateral direction perpendicular to the second lateral direction; a dielectric fin structure that extends along the first lateral direction and is disposed next to the semiconductor structure fin structure; and a gate isolation structure disposed above the dielectric fin structure. The gate isolation structure contacts an upper portion of the gate structure at a first tilted interface.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: July 23, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Shu-Uei Jang, Shih-Yao Lin, Chieh-Ning Feng, Shu-Yuan Ku