Patents by Inventor Ning Zhan

Ning Zhan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240133144
    Abstract: A method for reinforcing soft ground by post-grouting combined with pressurized vacuum preloading is proposed, by pre-burying prefabricated vertical drains and air-boosted pipes in granular material piles, and the air-boosted pipes are used as grouting pipes to reduce the number of times of piling, which not only improves the construction efficiency, but also reduces the structural disturbance of the soil and the influence of smear effect, thus reducing the impact on the radial permeability and the radial consolidation coefficients. The method does not use geotextile bags for granular materials, which can avoid the problem of forming a localized clogging area around the geotextile bags, and the method not only improves the efficiency of vacuum transfer in a pre-consolidation stage, but also improves the grouting effect in the later stage, effectively enhances the strength of soft soil and makes granular material piles and the surrounding soil form composite ground.
    Type: Application
    Filed: October 23, 2023
    Publication date: April 25, 2024
    Inventors: Binhua Xu, Ning He, Yanbin Jiang, Zhangchun Wang, Zhikun Yan, Yanzhang Zhou, Guirong Zhang, Yajun Qian, Xinjie Zhan, Zhongliu Zhang, Bin He, Denghua Li, Yang Kong, Yuting Xie, Xiang Yin
  • Patent number: 11628231
    Abstract: Microbial disinfection is performed using continuous or intermittent lighting using one or more narrow wavelength light sources. The light sources illuminate with narrow wavelength characteristics. The lighting provides a sufficiently high intensity for rapid microbial disinfection process, while reducing the average energy consumption for microbial disinfection during the microbial disinfection process by targeting multiple cellular sites along different inactivation pathways.
    Type: Grant
    Filed: April 8, 2020
    Date of Patent: April 18, 2023
    Assignee: THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: King Lun Yeung, Qing Chang, Nga Ki Wong, Ning Zhan, Wei Han, Joseph Kai Cho Kwan, Javier Lopez Navas
  • Publication number: 20230093881
    Abstract: The hand sanitizer may be a hand foam sanitizer or a hand gel sanitizer. Each of the hand sanitizers includes at least one stabilizing agent, at least one skin care agent, and a volume of disinfecting micelle capsules suspended therein. Each disinfecting capsule has a polymer shell which defines a hollow core. The polymer shell includes an antimicrobial material. The antimicrobial material may have a concentration of between 0.5 wt % and 95 wt % of the polymer shell. In order to make the hand foam sanitizer, at least one foaming agent is added to produce a foam by air foaming. The hollow core of each disinfecting capsule may be filled with a material, such as at least one disinfectant, at least one fragrance, at least one supplemental skin care agent, or combinations thereof.
    Type: Application
    Filed: November 25, 2022
    Publication date: March 30, 2023
    Inventors: King Lun YEUNG, Ying LI, Ning ZHAN
  • Patent number: 11517510
    Abstract: The hand sanitizer may be a hand foam sanitizer or a hand gel sanitizer. Each of the hand sanitizers includes at least one stabilizing agent, at least one skin care agent, and a volume of disinfecting micelle capsules suspended therein. Each disinfecting capsule has a polymer shell which defines a hollow core. The polymer shell includes an antimicrobial material. The antimicrobial material may have a concentration of between 0.5 wt % and 95 wt % of the polymer shell. In order to make the hand foam sanitizer, at least one foaming agent is added to produce a foam by air foaming. The hollow core of each disinfecting capsule may be filled with a material, such as at least one disinfectant, at least one fragrance, at least one supplemental skin care agent, or combinations thereof.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: December 6, 2022
    Assignee: GERMAGIC BIOCHEMICAL TECHNOLOGY (SHANGHAI) CO., LTD.
    Inventors: King Lun Yeung, Ying Li, Ning Zhan
  • Patent number: 10935272
    Abstract: Various embodiments include a control valve comprising a first valve assembly between an inlet and an outlet. The first valve assembly comprises: a valve seat fixed relative to the valve body with an opening in a sidewall; a slider rotating inside the valve seat to block the opening, but stationary in an axial direction; a regulating valve plug with an opening at one end, surrounding the valve seat and movable in the axial direction to block the opening in the sidewall of the valve seat; and a first valve stem connected to the slider and to the regulating valve plug, the first valve stem having one end extending out of the valve body. A first overlap between the slider and the opening and a second overlap of the plug and the opening are changed by movement of the first valve stem.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: March 2, 2021
    Assignee: SIEMENS SCHWEIZ AG
    Inventors: Lei Wang, Zuo Hui Ren, Jian Hui Wang, Fu Lai Zhong, Fang Zhao, Ping Zhang, Xiao Xiang Zhang, Ning Zhan
  • Publication number: 20210022969
    Abstract: The hand sanitizer may be a hand foam sanitizer or a hand gel sanitizer. Each of the hand sanitizers includes at least one stabilizing agent, at least one skin care agent, and a volume of disinfecting micelle capsules suspended therein. Each disinfecting capsule has a polymer shell which defines a hollow core. The polymer shell includes an antimicrobial material. The antimicrobial material may have a concentration of between 0.5 wt % and 95 wt % of the polymer shell. In order to make the hand foam sanitizer, at least one foaming agent is added to produce a foam by air foaming. The hollow core of each disinfecting capsule may be filled with a material, such as at least one disinfectant, at least one fragrance, at least one supplemental skin care agent, or combinations thereof.
    Type: Application
    Filed: July 22, 2019
    Publication date: January 28, 2021
    Inventors: King Lun YEUNG, Ying LI, Ning ZHAN
  • Publication number: 20200230274
    Abstract: Microbial disinfection is performed using continuous or intermittent lighting using one or more narrow wavelength light sources. The light sources illuminate with narrow wavelength characteristics. The lighting provides a sufficiently high intensity for rapid microbial disinfection process, while reducing the average energy consumption for microbial disinfection during the microbial disinfection process by targeting multiple cellular sites along different inactivation pathways.
    Type: Application
    Filed: April 8, 2020
    Publication date: July 23, 2020
    Inventors: King Lun YEUNG, Qing CHANG, Nga Ki WONG, Ning ZHAN, Wei HAN, Joseph Kai Cho KWAN, Javier Lopez NAVAS
  • Patent number: 10354875
    Abstract: A method may include forming a sacrificial mask on a device structure, the sacrificial mask comprising a carbon-based material. The method may further include etching memory structures in exposed regions of the sacrificial mask, implanting an etch-enhancing species into the sacrificial mask, and performing a wet etch to selectively remove the sacrificial mask at etch temperature, less than 350° C.
    Type: Grant
    Filed: April 6, 2018
    Date of Patent: July 16, 2019
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Rajesh Prasad, Ning Zhan, Tzu-Yu Liu, James Cournoyer, Kyu-Ha Shim, Kwangduk Lee, John Lee Klocke, Eric J. Bergman, Terrance Lee, Harry S. Whitesell
  • Publication number: 20190214255
    Abstract: A method may include forming a sacrificial mask on a device structure, the sacrificial mask comprising a carbon-based material. The method may further include etching memory structures in exposed regions of the sacrificial mask, implanting an etch-enhancing species into the sacrificial mask, and performing a wet etch to selectively remove the sacrificial mask at etch temperature, less than 350° C.
    Type: Application
    Filed: April 6, 2018
    Publication date: July 11, 2019
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Rajesh Prasad, Ning Zhan, Tzu-Yu Liu, James Cournoyer, Kyu-Ha Shim, Kwangduk Lee, John Lee Klocke, Eric J. Bergman, Terrance Lee, Harry S. Whitesell
  • Publication number: 20190186775
    Abstract: Various embodiments include a control valve comprising a first valve assembly between an inlet and an outlet. The first valve assembly comprises: a valve seat fixed relative to the valve body with an opening in a sidewall; a slider rotating inside the valve seat to block the opening, but stationary in an axial direction; a regulating valve plug with an opening at one end, surrounding the valve seat and movable in the axial direction to block the opening in the sidewall of the valve seat; and a first valve stem connected to the slider and to the regulating valve plug, the first valve stem having one end extending out of the valve body. A first overlap between the slider and the opening and a second overlap of the plug and the opening are changed by movement of the first valve stem.
    Type: Application
    Filed: December 18, 2018
    Publication date: June 20, 2019
    Applicant: Siemens Schweiz AG
    Inventors: Lei Wang, Zuo Hui Ren, Jian Hui Wang, Fu Lai Zhong, Fang Zhao, Ping Zhang, Xiao Xiang Zhang, Ning Zhan
  • Patent number: 9595518
    Abstract: Fabrication methods and structure include: providing a wafer with at least one fin extended above a substrate in a first region, and at least one fin extended above the substrate in a second region of the wafer; forming a gate structure extending at least partially over the at least one fin to define a semiconductor device region in the first region; implanting a dopant into the at least one fin in the first region and into the at least one fin in the second region of the wafer, where the implanting of the dopant into the at least one fin of the second region modulates a physical property of the at least one fin to define a resistor device region in the second region; and disposing a conductive material at least partially over the at least one fin in the first region and over the at least one fin in the second region of the wafer, in part, to form a source and drain contact in the first region, and a fin-type metal-semiconductor resistor in the second region.
    Type: Grant
    Filed: December 15, 2015
    Date of Patent: March 14, 2017
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Anthony I-Chih Chou, Chengwen Pei, Edward P. Maciejewski, Ning Zhan