Abstract: A method for fabricating an organic light emitting display panel includes: forming an anode-material layer on a base plate, forming a mask on one side of the anode-material layer away from the base plate, and performing patterning treatment to the anode-material layer by using the mask, to form multiple anodes; and forming a pixel definition layer covering the mask and the base plate, and performing patterning treatment to the pixel definition layer and the mask at the same time, to form a multiple pixel defining components, wherein the pixel defining components cover parts of the base plate located between two neighboring anodes, and cover part of surfaces of the anodes; and a material forming the mask and a material forming the pixel definition layer are the same, each of the pixel defining components includes a first part formed by the mask, and a second part formed by the pixel definition layer.

Abstract: Provided is a method for manufacturing an array substrate. The method includes: providing a base substrate with a conductive pattern layer, wherein the base substrate is provided with a display region and a peripheral region disposed around the display region, wherein the conductive pattern layer includes a plurality of conductive lines disposed in the peripheral region; forming an electrode material film layer on the conductive pattern layer; forming a mask layer on the electrode material film layer, wherein the mask layer includes a plurality of electrode layer patterns disposed in the display region and protection patterns disposed above the conductive lines; and etching the electrode material film layer and removing the mask layer.

Abstract: A method of repairing a display defect in a display panel includes: in a module process stage, inputting a first data voltage to each pixel in the display panel, enabling the display panel to display an image to be detected, and acquiring a brightness of each pixel; determining a reference pixel and a defect pixel according to the image to be detected; calculating a compensation data voltage for the defect pixel according to a brightness difference between the reference pixel and the defect pixel; and inputting the first data voltage to the reference pixel, and inputting a second data voltage to the defect pixel, according to the compensation data voltage, where the second data voltage is a sum of the first data voltage and the compensation data voltage.

Abstract: A method of repairing a display defect in a display panel includes: in a module process stage, inputting a first data voltage to each pixel in the display panel, enabling the display panel to display an image to be detected, and acquiring a brightness of each pixel; determining a reference pixel and a defect pixel according to the image to be detected; calculating a compensation data voltage for the defect pixel according to a brightness difference between the reference pixel and the defect pixel; and inputting the first data voltage to the reference pixel, and inputting a second data voltage to the defect pixel, according to the compensation data voltage, where the second data voltage is a sum of the first data voltage and the compensation data voltage.

Abstract: A display panel includes a substrate. The substrate includes a display area, an encapsulation area, and a peripheral area between the display area and the encapsulation area. The peripheral area comprises a signal transmission layer disposed on the substrate, a protruding structure disposed on the signal transmission layer, and a first electrode layer covering a surface of the protruding structure. The first electrode layer is electrically connected to the signal transmission layer.

Abstract: The present disclosure provides an organic light emitting display panel and a fabricating method thereof, and a displaying device.

Abstract: Provided is a method for manufacturing an array substrate. The method includes: providing a base substrate with a conductive pattern layer, wherein the base substrate is provided with a display region and a peripheral region disposed around the display region, wherein the conductive pattern layer includes a plurality of conductive lines disposed in the peripheral region; forming an electrode material film layer on the conductive pattern layer; forming a mask layer on the electrode material film layer, wherein the mask layer includes a plurality of electrode layer patterns disposed in the display region and protection patterns disposed above the conductive lines; and etching the electrode material film layer and removing the mask layer.

Abstract: A thin film transistor, a manufacturing method thereof, an array substrate and an electronic device are disclosed. The manufacturing method of the thin film transistor includes: forming an active layer pattern on a base substrate; forming a gate insulating layer on the active layer pattern; the gate insulating layer includes a first portion, a second portion and a third portion, the third portion is on both sides of the first portion, the second portion is between the first portion and the third portion on at least one side, and the thickness of the second portion is larger than that of the third portion.

Abstract: There is provided an array base plate, including: a substrate; a first patterned part disposed on the substrate and adjacent to an encapsulation region of the substrate; a second patterned part disposed on the substrate, in a same layer as the first patterned part and adjacent to the first patterned part; wherein the first patterned part includes a through part on its side close to the second patterned part. There is also provided a manufacturing method for manufacturing the array base plate, and a display panel including the array base plate.

Abstract: The present disclosure provides a display backplane, a method for preparing the same, and a display device. The display backplane includes a substrate, an electronic device and an alignment mark arranged on the substrate, and a filling layer, the filling layer being filled in at least a part of a recessed area located on a surface of the substrate away from the electronic device, and a minimum distance between an orthogonal projection of the at least part of the recessed area on the substrate and an orthogonal projection of the alignment mark on the substrate being less than 200 ?m.

Abstract: A display panel includes a substrate. The substrate includes a display area, an encapsulation area, and a peripheral area between the display area and the encapsulation area. The peripheral area comprises a signal transmission layer disposed on the substrate, a protruding structure disposed on the signal transmission layer, and a first electrode layer covering a surface of the protruding structure. The first electrode layer is electrically connected to the signal transmission layer.

Abstract: A thin film transistor, a manufacturing method thereof, an array substrate and an electronic device are disclosed. The manufacturing method of the thin film transistor includes: forming an active layer pattern on a base substrate; forming a gate insulating layer on the active layer pattern; the gate insulating layer includes a first portion, a second portion and a third portion, the third portion is on both sides of the first portion, the second portion is between the first portion and the third portion on at least one side, and the thickness of the second portion is larger than that of the third portion.

Abstract: The present disclosure relates to the field of display technologies, and provides a display substrate, a manufacturing method thereof, a corresponding display panel and an encapsulation method for the same. The display substrate includes a base plate comprising a display area and an encapsulation area surrounding the display area, and an insulating layer and a plurality of wires located on the base plate. The insulating layer comprises at least one groove in the encapsulation area. At least one of the plurality of wires comprises a first portion in the display area and a second portion within a corresponding groove of the encapsulation area. There is only one said second portion present in each groove.

Abstract: The present disclosure provides a display backplane, a method for preparing the same, and a display device. The display backplane includes a substrate, an electronic device and an alignment mark arranged on the substrate, and a filling layer, the filling layer being filled in at least a part of a recessed area located on a surface of the substrate away from the electronic device, and a minimum distance between an orthogonal projection of the at least part of the recessed area on the substrate and an orthogonal projection of the alignment mark on the substrate being less than 200 ?m.

Abstract: The present disclosure relates to the field of display technologies, and provides a display substrate, a manufacturing method thereof, a corresponding display panel and an encapsulation method for the same. The display substrate includes a base plate comprising a display area and an encapsulation area surrounding the display area, and an insulating layer and a plurality of wires located on the base plate. The insulating layer comprises at least one groove in the encapsulation area. At least one of the plurality of wires comprises a first portion in the display area and a second portion within a corresponding groove of the encapsulation area. There is only one said second portion present in each groove.

Abstract: There is provided an array base plate, including: a substrate; a first patterned part disposed on the substrate and adjacent to an encapsulation region of the substrate; a second patterned part disposed on the substrate, in a same layer as the first patterned part and adjacent to the first patterned part; wherein the first patterned part includes a through part on its side close to the second patterned part. There is also provided a manufacturing method for manufacturing the array base plate, and a display panel including the array base plate.

Abstract: The disclosure discloses a thin film transistor, a method for fabricating the same, and an OLED display panel. The method for fabricating a thin film transistor includes: forming a poly-silicon layer and a gate insulation layer on a base substrate in that order; forming a pattern of a gate above the base substrate with the gate insulation layer in a patterning process; doping the base substrate with the pattern of the gate for the first time; forming a pattern of first photoresist on the base substrate doped for the first time, using a mask for forming the pattern of the gate, wherein the pattern of the first photoresist covers the pattern of the gate and an area for forming a lightly doped drain area; and doping the base substrate with the pattern of the first photoresist for the second time to form a pattern of an active layer.

Abstract: A display module includes a display panel and a transmittance adjusting structure disposed on a light exit side of the display panel. A transmittance of the transmittance adjusting structure varies regionally in accordance with a regional distribution law of a display luminance of the display panel.

Abstract: The present invention provides a mask plate, relating to a field of exposure technology, which can solve the problem of an existing mask plate that a resolution is limited by an effect of diffraction. The mask plate of the invention includes: a pattern structure, including a light blocking region and a light transmitting region; and a total reflection structure provided at an light-exiting side of the pattern structure, the total reflection structure including a high refraction layer and a first low refraction layer sequentially provided in a direction away from the pattern structure and contacting each other, wherein a refractive index of the high refraction layer is greater than a refractive index of the first low refraction layer.

Abstract: The disclosure discloses a thin film transistor, a method for fabricating the same, and an OLED display panel. The method for fabricating a thin film transistor includes: forming a poly-silicon layer and a gate insulation layer on a base substrate in that order; forming a pattern of a gate above the base substrate with the gate insulation layer in a patterning process; doping the base substrate with the pattern of the gate for the first time; forming a pattern of first photoresist on the base substrate doped for the first time, using a mask for forming the pattern of the gate, wherein the pattern of the first photoresist covers the pattern of the gate and an area for forming a lightly doped drain area; and doping the base substrate with the pattern of the first photoresist for the second time to form a pattern of an active layer.