Patents by Inventor Niraj Rana
Niraj Rana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230369091Abstract: A substrate support configured to support a substrate having a diameter D comprises a first inner electrode and a second inner electrode that are each D-shaped, define a first outer diameter that is less than D, and are configured to be connected to an electrostatic chuck voltage to clamp the substrate to the substrate support. An outer electrode comprises a ring-shaped outer portion that surrounds the first inner electrode and the second inner electrode and a center portion that pass between the first inner electrode and the second inner electrode to connect to opposite sides of an inner diameter of the ring-shaped outer portion. The inner diameter of the ring-shaped outer portion is greater than the diameter D such that the inner diameter of the ring-shaped outer portion and intersections between the center portion and the ring-shaped outer portion are located radially outside of the diameter D of the substrate.Type: ApplicationFiled: September 28, 2021Publication date: November 16, 2023Inventors: Feng BI, Yukinori SAKIYAMA, Niraj RANA, Pengyi ZHANG, Simran SHAH, Timothy Scott THOMAS, David FRENCH, Vincent BURKHART
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Publication number: 20220406578Abstract: An apparatus to determine occurrence of an anomalous plasma event occurring at or near a process station of a multi-station integrated circuit fabrication chamber is disclosed. In particular embodiments, optical emissions generated responsive to the anomalous plasma event may be detected by at least one photosensor of a plurality of photosensors. A processor may cooperate with the plurality of photosensors to determine that the anomalous plasma event has occurred at or near by a particular process station of the multi-station integrated circuit fabrication chamber.Type: ApplicationFiled: November 18, 2020Publication date: December 22, 2022Inventors: Yukinori Sakiyama, Niraj Rana, Noah Elliot Baker
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Patent number: 10903070Abstract: Methods for reducing warpage of bowed semiconductor substrates, particularly saddle-shaped bowed semiconductor substrates, are provided herein. Methods involve depositing a bow compensation layer by plasma enhanced chemical vapor deposition on the backside of the bowed semiconductor substrate by region, such as by quadrants, to form a compressive film on a tensile substrate and a tensile film on a compressive substrate. Methods involve flowing different gases from different nozzles on a surface of a showerhead to deliver various gases by region in a one-step operation or flowing gases in a multi-step process by shielding regions of the showerhead during delivery of gases to deliver specific gases from non-shielded regions onto regions of the bowed semiconductor substrate by alternating between rotating the semiconductor substrate and flowing gases to the backside of the bowed semiconductor substrate.Type: GrantFiled: September 28, 2018Date of Patent: January 26, 2021Assignee: Lam Research CorporationInventors: Chanyuan Liu, Fayaz A. Shaikh, Niraj Rana, Nick Ray Linebarger, Jr.
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Publication number: 20200105523Abstract: Methods for reducing warpage of bowed semiconductor substrates, particularly saddle-shaped bowed semiconductor substrates, are provided herein. Methods involve depositing a bow compensation layer by plasma enhanced chemical vapor deposition on the backside of the bowed semiconductor substrate by region, such as by quadrants, to form a compressive film on a tensile substrate and a tensile film on a compressive substrate. Methods involve flowing different gases from different nozzles on a surface of a showerhead to deliver various gases by region in a one-step operation or flowing gases in a multi-step process by shielding regions of the showerhead during delivery of gases to deliver specific gases from non-shielded regions onto regions of the bowed semiconductor substrate by alternating between rotating the semiconductor substrate and flowing gases to the backside of the bowed semiconductor substrate.Type: ApplicationFiled: September 28, 2018Publication date: April 2, 2020Inventors: Chanyuan Liu, Fayaz A. Shaikh, Niraj Rana, Nick Ray Linebarger, JR.
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Patent number: 8709846Abstract: Solid state lighting devices and associated methods of manufacturing are disclosed herein. In one embodiment, a solid state light device includes a light emitting diode with an N-type gallium nitride (GaN) material, a P-type GaN material spaced apart from the N-type GaN material, and an indium gallium nitride (InGaN) material directly between the N-type GaN material and the P-type GaN material. At least one of the N-type GaN, InGaN, and P-type GaN materials has a non-planar surface.Type: GrantFiled: June 26, 2013Date of Patent: April 29, 2014Assignee: Micron Technology, Inc.Inventors: Niraj Rana, Zaiyuan Ren
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Publication number: 20130288416Abstract: Solid state lighting devices and associated methods of manufacturing are disclosed herein. In one embodiment, a solid state light device includes a light emitting diode with an N-type gallium nitride (GaN) material, a P-type GaN material spaced apart from the N-type GaN material, and an indium gallium nitride (InGaN) material directly between the N-type GaN material and the P-type GaN material. At least one of the N-type GaN, InGaN, and P-type GaN materials has a non-planar surface.Type: ApplicationFiled: June 26, 2013Publication date: October 31, 2013Inventors: Niraj Rana, Zaiyuan Ren
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Patent number: 8546016Abstract: A method for cleaning a semiconductor structure includes subjecting a semiconductor structure to an aqueous solution including at least one fluorine compound, and at least one strong acid, the aqueous solution having a pH of less than 1. In one embodiment, the aqueous solution includes water, hydrochloric acid, and hydrofluoric acid at a volumetric ratio of water to hydrochloric acid to hydrofluoric acid of 1000:32.5:1. The aqueous solution may be used to form a contact plug that has better contact resistance and improved critical dimension bias than conventional cleaning solutions.Type: GrantFiled: January 7, 2011Date of Patent: October 1, 2013Assignee: Micron Technology, Inc.Inventors: Sanjeev Sapra, Niraj Rana
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Patent number: 8513086Abstract: Methods for selectively etching doped oxides in the manufacture of microfeature devices are disclosed herein. An embodiment of one such method for etching material on a microfeature workpiece includes providing a microfeature workpiece including a doped oxide layer and a nitride layer adjacent to the doped oxide layer. The method include selectively etching the doped oxide layer with an etchant comprising DI:HF and an acid to provide a pH of the etchant such that the etchant includes (a) a selectivity of phosphosilicate glass (PSG) to nitride of greater than 250:1, and (b) an etch rate through PSG of greater than 9,000 ?/minute.Type: GrantFiled: July 2, 2012Date of Patent: August 20, 2013Assignee: Micron Technology, Inc.Inventor: Niraj Rana
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Patent number: 8512587Abstract: Etch solutions for selectively etching doped oxide materials in the presence of silicon nitride, titanium nitride, and silicon materials, and methods utilizing the etch solutions, for example, in construction of container capacitor constructions are provided. The etch solutions are formulated as a mixture of hydrofluoric acid and an organic acid having a dielectric constant less than water, optionally, with an inorganic acid, and a pH of 1 or less.Type: GrantFiled: July 30, 2007Date of Patent: August 20, 2013Assignee: Micron Technology, Inc.Inventors: Niraj Rana, Prashant Raghu, Kevin Torek
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Patent number: 8476640Abstract: Solid state lighting devices and associated methods of manufacturing are disclosed herein. In one embodiment, a solid state light device includes a light emitting diode with an N-type gallium nitride (GaN) material, a P-type GaN material spaced apart from the N-type GaN material, and an indium gallium nitride (InGaN) material directly between the N-type GaN material and the P-type GaN material. At least one of the N-type GaN, InGaN, and P-type GaN materials has a non-planar surface.Type: GrantFiled: March 5, 2012Date of Patent: July 2, 2013Assignee: Micron Technology, Inc.Inventors: Niraj Rana, Zaiyuan Ren
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Publication number: 20120276748Abstract: Methods for selectively etching doped oxides in the manufacture of microfeature devices are disclosed herein. An embodiment of one such method for etching material on a microfeature workpiece includes providing a microfeature workpiece including a doped oxide layer and a nitride layer adjacent to the doped oxide layer. The method include selectively etching the doped oxide layer with an etchant comprising DI:HF and an acid to provide a pH of the etchant such that the etchant includes (a) a selectivity of phosphosilicate glass (PSG) to nitride of greater than 250:1, and (b) an etch rate through PSG of greater than 9,000 ?/minute.Type: ApplicationFiled: July 2, 2012Publication date: November 1, 2012Applicant: MICRON TECHNOLOGY, INC.Inventor: Niraj Rana
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Publication number: 20120178257Abstract: A method for cleaning a semiconductor structure includes subjecting a semiconductor structure to an aqueous solution including at least one fluorine compound, and at least one strong acid, the aqueous solution having a pH of less than 1. In one embodiment, the aqueous solution includes water, hydrochloric acid, and hydrofluoric acid at a volumetric ratio of water to hydrochloric acid to hydrofluoric acid of 1000:32.5:1. The aqueous solution may be used to form a contact plug that has better contact resistance and improved critical dimension bias than conventional cleaning solutions.Type: ApplicationFiled: January 7, 2011Publication date: July 12, 2012Applicant: MICRON TECHNOLOGY, INC.Inventors: Sanjeev Sapra, Niraj Rana
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Patent number: 8216911Abstract: Methods for selectively etching doped oxides in the manufacture of microfeature devices are disclosed herein. An embodiment of one such method for etching material on a microfeature workpiece includes providing a microfeature workpiece including a doped oxide layer and a nitride layer adjacent to the doped oxide layer. The method include selectively etching the doped oxide layer with an etchant comprising DI:HF and an acid to provide a pH of the etchant such that the etchant includes (a) a selectivity of phosphosilicate glass (PSG) to nitride of greater than 250:1, and (b) an etch rate through PSG of greater than 9,000 ?/minute.Type: GrantFiled: September 2, 2010Date of Patent: July 10, 2012Assignee: Micron Technology, Inc.Inventor: Niraj Rana
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Publication number: 20120161151Abstract: Solid state lighting devices and associated methods of manufacturing are disclosed herein. In one embodiment, a solid state light device includes a light emitting diode with an N-type gallium nitride (GaN) material, a P-type GaN material spaced apart from the N-type GaN material, and an indium gallium nitride (InGaN) material directly between the N-type GaN material and the P-type GaN material. At least one of the N-type GaN, InGaN, and P-type GaN materials has a non-planar surface.Type: ApplicationFiled: March 5, 2012Publication date: June 28, 2012Applicant: MICRON TECHNOLOGY, INC.Inventors: Niraj Rana, Zaiyuan Ren
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Patent number: 8129205Abstract: Solid state lighting devices and associated methods of manufacturing are disclosed herein. In one embodiment, a solid state light device includes a light emitting diode with an N-type gallium nitride (GaN) material, a P-type GaN material spaced apart from the N-type GaN material, and an indium gallium nitride (InGaN) material directly between the N-type GaN material and the P-type GaN material. At least one of the N-type GaN, InGaN, and P-type GaN materials has a non-planar surface.Type: GrantFiled: January 25, 2010Date of Patent: March 6, 2012Assignee: Micron Technology, Inc.Inventors: Niraj Rana, Zaiyuan Ren
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Publication number: 20110180828Abstract: Solid state lighting devices and associated methods of manufacturing are disclosed herein. In one embodiment, a solid state light device includes a light emitting diode with an N-type gallium nitride (GaN) material, a P-type GaN material spaced apart from the N-type GaN material, and an indium gallium nitride (InGaN) material directly between the N-type GaN material and the P-type GaN material. At least one of the N-type GaN, InGaN, and P-type GaN materials has a non-planar surface.Type: ApplicationFiled: January 25, 2010Publication date: July 28, 2011Applicant: MICRON TECHNOLOGY, INC.Inventors: Niraj Rana, Zaiyuan Ren
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Method of Forming Capacitors, and Methods of Utilizing Silicon Dioxide-Containing Masking Structures
Publication number: 20110143543Abstract: Some embodiments include methods of forming capacitors. Storage nodes are formed within a material. The storage nodes have sidewalls along the material. Some of the material is removed to expose portions of the sidewalls. The exposed portions of the sidewalls are coated with a substance that isn't wetted by water. Additional material is removed to expose uncoated regions of the sidewalls. The substance is removed, and then capacitor dielectric material is formed along the sidewalls of the storage nodes. Capacitor electrode material is then formed over the capacitor dielectric material. Some embodiments include methods of utilizing a silicon dioxide-containing masking structure in which the silicon dioxide of the masking structure is coated with a substance that isn't wetted by water.Type: ApplicationFiled: February 22, 2011Publication date: June 16, 2011Applicant: Micro Technology Inc.Inventors: NIRAJ RANA, Nishant Sinha, Prashant Raghu, Jim Hofmann, Neil Greeley -
Publication number: 20110111597Abstract: Some embodiments include methods of forming capacitors. Storage nodes are formed within a material. The storage nodes have sidewalls along the material. Some of the material is removed to expose portions of the sidewalls. The exposed portions of the sidewalls are coated with a substance that isn't wetted by water. Additional material is removed to expose uncoated regions of the sidewalls. The substance is removed, and then capacitor dielectric material is formed along the sidewalls of the storage nodes. Capacitor electrode material is then formed over the capacitor dielectric material. Some embodiments include methods of utilizing a silicon dioxide-containing masking structure in which the silicon dioxide of the masking structure is coated with a substance that isn't wetted by water.Type: ApplicationFiled: January 12, 2011Publication date: May 12, 2011Applicant: MICRON TECHNOLOGY, INC.Inventors: Niraj Rana, Nishant Sinha, Prashant Raghu, Jim Hofmann, Neil Greeley
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Patent number: 7902081Abstract: A method of etching polysilicon includes exposing a substrate comprising polysilicon to a solution comprising water, HF, and at least one of a conductive metal nitride, Pt, and Au under conditions effective to etch polysilicon from the substrate. In one embodiment, a substrate first region comprising polysilicon and a substrate second region comprising at least one of a conductive metal nitride, Pt, and Au is exposed to a solution comprising water and HF. The solution is devoid of any detectable conductive metal nitride, Pt, and Au prior to the exposing. At least some of the at least one are etched into the solution upon the exposing. Then, polysilicon is etched from the first region at a faster rate than any etch rate of the first region polysilicon prior to the etching of the at least some of the conductive metal nitride, Pt, and Au.Type: GrantFiled: October 11, 2006Date of Patent: March 8, 2011Assignee: Micron Technology, Inc.Inventors: Prashant Raghu, Vishwanath Bhat, Niraj Rana
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Patent number: 7892937Abstract: Some embodiments include methods of forming capacitors. Storage nodes are formed within a material. The storage nodes have sidewalls along the material. Some of the material is removed to expose portions of the sidewalls. The exposed portions of the sidewalls are coated with a substance that isn't wetted by water. Additional material is removed to expose uncoated regions of the sidewalls. The substance is removed, and then capacitor dielectric material is formed along the sidewalls of the storage nodes. Capacitor electrode material is then formed over the capacitor dielectric material. Some embodiments include methods of utilizing a silicon dioxide-containing masking structure in which the silicon dioxide of the masking structure is coated with a substance that isn't wetted by water.Type: GrantFiled: October 16, 2008Date of Patent: February 22, 2011Assignee: Micron Technology, Inc.Inventors: Niraj Rana, Nishant Sinha, Prashant Raghu, Jim Hofmann, Neil Greeley