Patents by Inventor Nirmal K. Jain
Nirmal K. Jain has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10032530Abstract: A remote heat removal system that pumps a secondary fluid from a remote reservoir through a secondary side of a heat exchanger in heat exchange relationship with a primary fluid to be cooled. The secondary fluid drives a motive device that drives the primary fluid through the primary side of the heat exchanger.Type: GrantFiled: February 26, 2016Date of Patent: July 24, 2018Assignee: Westinghouse Electric Company LLCInventors: Francis P. Ferraraccio, Nirmal K. Jain, Martin L. Van Haltern, Daniel C. Flahive
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Publication number: 20160336083Abstract: A remote heat removal system that pumps a secondary fluid from a remote reservoir through a secondary side of a heat exchanger in heat exchange relationship with a primary fluid to be cooled. The secondary fluid drives a motive device that drives the primary fluid through the primary side of the heat exchanger.Type: ApplicationFiled: February 26, 2016Publication date: November 17, 2016Applicant: Westinghouse Electric Company LLCInventors: Francis P. Ferraraccio, Nirmal K. Jain, Martin L. Van Haltern, Daniel C. Flahive
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Patent number: 7971370Abstract: An apparatus and method for treating a moving substrate of indefinite length. The apparatus has a control surface positioned in close proximity to a surface of the substrate to define a control gap between the substrate and the control surface. A first chamber is positioned near the control surface, with the first chamber having a gas introduction device. A second chamber is positioned near the control surface, the second chamber having a gas withdrawal device. The control surface and the chambers together define a region wherein the adjacent gas phases possess an amount of mass. Upon inducement of at least a portion of the mass within the region, the mass flow is controlled to significantly reduce dilution of the gas phase component in the adjacent gas phase. This is accomplished through the introduction of a controlled gas stream thereby reducing the flow of an uncontrolled ambient gas stream due to pressure gradients in the system.Type: GrantFiled: April 11, 2006Date of Patent: July 5, 2011Assignee: 3M Innovative Properties CompanyInventors: Craig A. Miller, Nirmal K. Jain, William Blake Kolb
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Patent number: 7918038Abstract: An apparatus and method for treating a moving substrate of indefinite length. The apparatus has a control surface positioned in close proximity to a surface of the substrate to define a control gap between the substrate and the control surface. A first chamber is positioned near the control surface, with the first chamber having a gas introduction device. A second chamber is positioned near the control surface, the second chamber having a gas withdrawal device. The control surface and the chambers together define a region wherein the adjacent gas phases possess an amount of mass. Upon inducement of at least a portion of the mass within the region, the mass flow is controlled to significantly reduce dilution of the gas phase component in the adjacent gas phase. This is accomplished through the introduction of a controlled gas stream thereby reducing the flow of an uncontrolled ambient gas stream due to pressure gradients in the system.Type: GrantFiled: March 2, 2006Date of Patent: April 5, 2011Assignee: 3M Innovative Properties CompanyInventors: Craig A. Miller, Nirmal K. Jain, William Blake Kolb
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Patent number: 6808739Abstract: Method of selectively removing volatile components from a composition, comprising coating the composition onto a first substrate surface of a substrate, wherein the composition comprises a nonresident volatile component and a resident volatile component. The method further includes positioning at least a portion of the coated substrate between a condensing surface having a condensing surface temperature and a heating surface having a heating surface temperature that is greater than the condensing surface temperature, wherein the condensing surface is in a spaced apart, confronting relationship to the coated surface of the substrate and wherein the heated surface is in thermal contact with a second substrate surface opposite the first substrate surface. In the method, the heated surface temperature and the condensing surface temperature are such that the positioning step causes the nonresident volatile component to be selectively removed from the portion of the coated substrate.Type: GrantFiled: September 21, 2001Date of Patent: October 26, 2004Assignee: 3M Innovative Properties CompanyInventors: Richard G. Sitz, Peter T. Benson, Kathleen M. Cooklock, Gary L. Huelsman, Nirmal K. Jain, William Blake Kolb, John M. Sever
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Publication number: 20030230003Abstract: An apparatus and method for treating a moving substrate of indefinite length. The apparatus has a control surface positioned in close proximity to a surface of the substrate to define a control gap between the substrate and the control surface. A first chamber is positioned near the control surface, with the first chamber having a gas introduction device. A second chamber is positioned near the control surface, the second chamber having a gas withdrawal device. The control surface and the chambers together define a region wherein the adjacent gas phases possess an amount of mass. Upon inducement of at least a portion of the mass within the region, the mass flow is controlled to significantly reduce dilution of the gas phase component in the adjacent gas phase. This is accomplished through the introduction of a controlled gas stream thereby reducing the flow of an uncontrolled ambient gas stream due to pressure gradients in the system.Type: ApplicationFiled: April 23, 2003Publication date: December 18, 2003Applicant: 3M Innovative Properties CompanyInventors: Craig A. Miller, Nirmal K. Jain, William Blake Kolb
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Patent number: 6553689Abstract: A vapor collection method and apparatus capable of capturing vapor compositions without substantial dilution. The method and apparatus utilize a material that has a surface with an adjacent gas phase. A chamber is positioned in close proximity to a surface of the material. The position of the chamber creates a relatively small gap between the surface of the material and the chamber. The adjacent gas phase between the chamber and the surface define a region possessing an amount of mass. At least a portion of the mass is drawn through the region by induced flow. The utilization of a small gap limits the flow of mass that is external to the chamber from being swept through the chamber by induced flow.Type: GrantFiled: September 21, 2001Date of Patent: April 29, 2003Assignee: 3M Innovative Properties CompanyInventors: Nirmal K. Jain, Peter T. Benson, James L. Capps, William Blake Kolb, Eldon E. Lightner, Norman L. Rogers, Jr., Robert A. Yapel
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Publication number: 20020100185Abstract: Method of selectively removing volatile components from a composition, comprising coating the composition onto a first substrate surface of a substrate, wherein the composition comprises a nonresident volatile component and a resident volatile component. The method further includes positioning at least a portion of the coated substrate between a condensing surface having a condensing surface temperature and a heating surface having a heating surface temperature that is greater than the condensing surface temperature, wherein the condensing surface is in a spaced apart, confronting relationship to the coated surface of the substrate and wherein the heated surface is in thermal contact with a second substrate surface opposite the first substrate surface. In the method, the heated surface temperature and the condensing surface temperature are such that the positioning step causes the nonresident volatile component to be selectively removed from the portion of the coated substrate.Type: ApplicationFiled: September 21, 2001Publication date: August 1, 2002Inventors: Richard G. Sitz, Peter T. Benson, Kathleen M. Cooklock, Gary L. Huelsman, Nirmal K. Jain, William Blake Kolb, John M. Sever
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Publication number: 20020095818Abstract: A vapor collection method and apparatus capable of capturing vapor compositions without substantial dilution. The method and apparatus utilize a material that has a surface with an adjacent gas phase. A chamber is positioned in close proximity to a surface of the material. The position of the chamber creates a relatively small gap between the surface of the material and the chamber. The adjacent gas phase between the chamber and the surface define a region possessing an amount of mass. At least a portion of the mass is drawn through the region by induced flow. The utilization of a small gap limits the flow of mass that is external to the chamber from being swept through the chamber by induced flow.Type: ApplicationFiled: September 21, 2001Publication date: July 25, 2002Inventors: Nirmal K. Jain, Peter T. Benson, James L. Capps, William Blake Kolb, Eldon E. Lightner, Norman L. Rogers, Robert A. Yapel