Patents by Inventor Nishimura Akinori

Nishimura Akinori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pellicle
    Patent number: 10429730
    Abstract: There is provided a pellicle for lithography which has a unique frame in that it has externally protruding (projecting) portions; to the lower end faces of these protruding portions the photomask-bonding agglutinant layer is applied so as to allow a reduction in the area of the lower end face of the pellicle frame to which conventionally the agglutinant layer was endlessly applied, whereby the pellicle induced deformation to the photomask is mitigated.
    Type: Grant
    Filed: May 16, 2017
    Date of Patent: October 1, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Nishimura Akinori
  • PELLICLE
    Publication number: 20170343895
    Abstract: There is provided a pellicle for lithography which has a unique frame in that it has externally protruding (projecting) portions; to the lower end faces of these protruding portions the photomask-bonding agglutinant layer is applied so as to allow a reduction in the area of the lower end face of the pellicle frame to which conventionally the agglutinant layer was endlessly applied, whereby the pellicle induced deformation to the photomask is mitigated.
    Type: Application
    Filed: May 16, 2017
    Publication date: November 30, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Nishimura Akinori
  • PELLICLE FOR EUV EXPOSURE
    Publication number: 20170184955
    Abstract: There is provided a pellicle for EUV lithography, which has a filter attached to a vent hole made through a pellicle frame bar for air pressure adjustment, and this filter is designed to be heat-resistant by being made of either a metal or a ceramic material, and is adhered to the pellicle frame by weldering or soldering, and also the filter has a filtration accuracy of 0.1 through 0.3 ?m.
    Type: Application
    Filed: December 15, 2016
    Publication date: June 29, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Nishimura Akinori, Shirasaki Toru