Abstract: The present invention provides a volumetric solar structure comprising one or more solar cells. The solar structure comprises a semiconductor substrate of a first conductivity type having a patterned surface thereof, the pattern defining an array of spaced-apart grooves of a funnel-like shape, and a second opposite conductivity type material layer positioned on at least a part of the patterned surface of the substrate. The structure thereby defines junction regions, in which charge carriers are generated by incident radiation energy to which the structure is exposed. The junction regions are located at different heights upon the patterned surface of the substrate.

Abstract: The present invention provides a silicon wave-guide (3), with a silicon oxide cladding (2, 4) on a silicon substrate (1). At predetermined positions along the length of the wave-guide, are created metal oxide semiconductor (MOS) structures. A poly-silicon, or any other conductive layer (5), is deposited and patterned above the upper cladding (4) and electrical contacts are made to the substrate (1), the silicon wave-guide (3), and the poly-silicon layer (5). Upon the application of a potential difference between at least two of the layers from the group comprising the substrate (1), the silicon wave-guide (3), and the poly-silicon layer (5), the free carrier concentration at the top and/or bottom layer of the silicon wave-guide (3) is changed by the electric field. The change in the electric field results in a change in the index of refraction, and the change in the index of refraction causes a change in the optical mode propagating in the waveguide (3).

Abstract: The present invention provides a silicon wave-guide (3), with a silicon oxide cladding (2, 4) on a silicon substrate (1). At predetermined positions along the length of the wave-guide, are created metal oxide semiconductor (MOS) structures. A poly-silicon, or any other conductive layer (5), is deposited and patterned above the upper cladding (4) and electrical contacts are made to the substrate (1), the silicon wave-guide (3), and the poly-silicon layer (5). Upon the application of a potential difference between at least two of the layers from the group comprising the substrate (1), the silicon wave-guide (3), and the poly-silicon layer (5), the free carrier concentration at the top and/or bottom layer of the silicon wave-guide (3) is changed by the electric field. The change in the electric field results in a change in the index of refraction, and the change in the index of refraction causes a change in the optical mode propagating in the wave-guide (3).

Abstract: A method of spectral-morphometric analysis of biological samples, the biological samples including substantially constant components and suspected variable components, the method is effected by following the steps of (a) using a spectral data collection device for collecting spectral data of picture elements of the biological samples; (b) defining a spectral vector associated with picture elements representing a constant component of at least one of the biological samples; (c) using the spectral vector for defining a correcting function being selected such that when operated on spectral vectors associated with picture elements representing other constant components, spectral vectors of the other constant components are modified to substantially resemble the spectral vector; (d) operating the correcting function on spectral vectors associated with at least the variable components for obtaining corrected spectral vectors thereof; and (e) classifying the corrected spectral vectors into classification groups.

Abstract: According to the present invention there is provided a spectral bio-imaging methods which can be used for automatic and/or semiautomatic spectrally resolved morphometric classification of cells, the method comprising the steps of (a) preparing a sample to be spectrally imaged, the sample including at least a portion of at least one cell; (b) viewing the sample through an optical device, the optical device being optically connected to an imaging spectrometer, the optical device and the imaging spectrometer being for obtaining a spectrum of each pixel of the sample; (c) classifying each of the pixels into classification groups according to the pixels spectra; and (d) analyzing the classification groups and thereby classifying the at least one cell into a cell class.

Abstract: A method and hardware for chromosome classification by decorrelation statistical analysis to provide color (spectral) karyotypes and to detect chromosomal aberrations. The method and hardware employ a set of N decorrelation matched filters for chromosome classification. The N decorrelation matched filters are dedicated for extracting decorrelated spectral data from chromosome samples painted according to a specific experimental protocol. The N decorrelation matched filters being described by: ##EQU1## where V.sub.ik min equals minimum V.sub.ik over all i, and V.sub.ik max equals maximum V.sub.ik over all i, and wherein N is an integer greater than two.

Abstract: A method and hardware for chromosome classification by decorrelation statistical analysis to provide color (spectral) karyotypes and to detect chromosomal aberrations.