Patents by Inventor Nitin Pathak

Nitin Pathak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220199373
    Abstract: Exemplary semiconductor processing chambers include a chamber body defining a processing region. The chambers may include a substrate support disposed within the processing region. The substrate support may have an upper surface that defines a recessed substrate seat. The chambers may include a shadow ring disposed above the substrate seat and the upper surface. The shadow ring may extend about a peripheral edge of the substrate seat. The chambers may include bevel purge openings defined within the substrate support proximate the peripheral edge. A bottom surface of the shadow ring may be spaced apart from a top surface of the upper surface to form a purge gas flow path that extends from the bevel purge openings along the shadow ring. A space formed between the shadow ring and the substrate seat may define a process gas flow path. The gas flow paths may be in fluid communication with one another.
    Type: Application
    Filed: December 18, 2020
    Publication date: June 23, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Venkata Sharat Chandra Parimi, Zubin Huang, Manjunath Veerappa Chobari Patil, Nitin Pathak, Yi Yang, Badri N. Ramamurthi, Truong Van Nguyen, Rui Cheng, Diwakar Kedlaya
  • Publication number: 20220028710
    Abstract: Exemplary substrate processing systems may include a chamber body defining a transfer region. The systems may include a first lid plate seated on the chamber body along a first surface of the first lid plate. The first lid plate may define a plurality of apertures through the first lid plate. The systems may include a plurality of lid stacks equal to a number of apertures of the plurality of apertures defined through the first lid plate. The systems may include a plurality of isolators. An isolator of the plurality of isolators may be positioned between each lid stack of the plurality of lid stacks and a corresponding aperture of the plurality of apertures defined through the first lid plate. The systems may include a plurality of dielectric plates. A dielectric plate of the plurality of dielectric plates may be seated on each isolator of the plurality of isolators.
    Type: Application
    Filed: July 21, 2020
    Publication date: January 27, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Anantha K. Subramani, Yang Guo, Seyyed Abdolreza Fazeli, Nitin Pathak, Badri N. Ramamurthi, Kallol Bera, Xiaopu Li, Philip A. Kraus, Swaminathan T. Srinivasan
  • Publication number: 20220020615
    Abstract: Exemplary substrate processing systems may include a plurality of processing regions. The systems may include a transfer region housing defining a transfer region fluidly coupled with the plurality of processing regions. The systems may include a plurality of substrate supports. Each substrate support of the plurality of substrate supports may be vertically translatable between the transfer region and an associated processing region of the plurality of processing regions. The systems may include a transfer apparatus including a rotatable shaft extending through the transfer region housing. The transfer apparatus may also include an end effector coupled with the rotatable shaft. The systems may include an exhaust foreline including a plurality of foreline tails. Each foreline tail of the plurality of foreline tails may be fluidly coupled with a separate processing region of the plurality of processing regions. The systems may include a plurality of throttle valves.
    Type: Application
    Filed: July 19, 2020
    Publication date: January 20, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Nitin Pathak, Vinay K. Prabhakar, Badri N. Ramamurthi, Viren Kalsekar, Juan Carlos Rocha-Alvarez
  • Publication number: 20210320017
    Abstract: Exemplary substrate processing systems may include a plurality of processing regions. The systems may include a transfer region housing defining a transfer region fluidly coupled with the plurality of processing regions. The systems may include a plurality of substrate supports, and each substrate support of the plurality of substrate supports may be vertically translatable between the transfer region and an associated processing region of the plurality of processing regions. The systems may include a transfer apparatus including a rotatable shaft extending through the transfer region housing. The transfer apparatus may include an end effector coupled with the rotatable shaft. The end effector may include a central hub defining a central aperture fluidly coupled with a purge source. The end effector may also include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports.
    Type: Application
    Filed: April 9, 2020
    Publication date: October 14, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Nitin Pathak, Vinay Prabhakar, Badri N. Ramamurthi, Viren Kalsekar, Tuan A. Nguyen, Juan Carlos Rocha-Alvarez
  • Patent number: 11049699
    Abstract: Embodiments of the present disclosure relate to apparatus for improving quality of films deposited on a substrate by a CVD process. More specifically, a branched gas feed assembly uniformly distributes a process gas entering an annular plenum. Each conduit of a first plurality of conduits having substantially equal flow conductance is in fluid communication with one or more conduits of a second plurality of conduits having substantially equal flow conductance. Each conduit of the second plurality of conduits terminates at one of a plurality of outlets. Each outlet of the plurality of outlets is in fluid communication with one or more inlet ports of a plurality of inlet ports formed in the annular plenum. Each inlet port of the plurality of inlet ports is spaced equidistant about a central axis of the annular plenum.
    Type: Grant
    Filed: July 19, 2019
    Date of Patent: June 29, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Tejas Ulavi, Amit Kumar Bansal, Nitin Pathak, Ajit Balakrishna
  • Publication number: 20210032747
    Abstract: A processing chamber may include a gas distribution member, a substrate support, and a pumping liner. The gas distribution member and the substrate support may at least in part define a processing volume. The pumping liner may define an internal volume in fluid communication with the processing volume via a plurality of apertures of the pumping liner circumferentially disposed about the processing volume. The processing chamber may further include a flow control mechanism operable to direct fluid flow from the internal volume of the pumping liner into the processing volume via a subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.
    Type: Application
    Filed: July 22, 2020
    Publication date: February 4, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Nitin Pathak, Yuxing Zhang, Tuan A. Nguyen, Kalyanjit Ghosh, Amit Bansal, Juan C. Rocha
  • Publication number: 20210002763
    Abstract: Aspects of the present disclosure relate generally to isolator devices, components thereof, and methods associated therewith for substrate processing chambers. In one implementation, a substrate processing chamber includes an isolator ring disposed between a pedestal and a pumping liner. The isolator ring includes a first surface that faces the pedestal, the first surface being disposed at a gap from an outer circumferential surface of the pedestal. The isolator ring also includes a second surface that faces the pumping liner and a protrusion that protrudes from the first surface of the isolator ring and towards the outer circumferential surface of the pedestal. The protrusion defines a necked portion of the gap between the pedestal and the isolator ring.
    Type: Application
    Filed: June 9, 2020
    Publication date: January 7, 2021
    Inventors: Nitin PATHAK, Amit Kumar BANSAL, Tuan Anh NGUYEN, Thomas RUBIO, Badri N. RAMAMURTHI, Juan Carlos ROCHA-ALVAREZ
  • Publication number: 20200388470
    Abstract: The present disclosure generally relates to an apparatus for improving azimuthal uniformity of a pressure profile of a processing gas. In one example, a processing chamber includes a lid, sidewalls, and a substrate support defining a processing volume. A bottom bowl, a chamber base, and a wall define a purge volume. The purge volume is disposed beneath the processing volume. The bottom bowl includes a first surface having a first equalizer hole. A passage couples the processing volume to the purge volume via the first equalizer hole and an inlet. The passage is positioned above the first equalizer hole. The chamber base has a purge port coupleable to a purge gas line for supplying a purge gas to the purge volume. A baffle is disposed in the purge volume at a height above the purge port, and is configured to deflect a trajectory of the purge gas.
    Type: Application
    Filed: June 3, 2020
    Publication date: December 10, 2020
    Inventors: Nitin PATHAK, Kartik SHAH, Amit Kumar BANSAL, Tuan Anh NGUYEN, Juan Carlos ROCHA, David BLAHNIK
  • Publication number: 20200043704
    Abstract: Embodiments of the present disclosure relate to apparatus for improving quality of films deposited on a substrate by a CVD process. More specifically, a branched gas feed assembly uniformly distributes a process gas entering an annular plenum. Each conduit of a first plurality of conduits having substantially equal flow conductance is in fluid communication with one or more conduits of a second plurality of conduits having substantially equal flow conductance. Each conduit of the second plurality of conduits terminates at one of a plurality of outlets. Each outlet of the plurality of outlets is in fluid communication with one or more inlet ports of a plurality of inlet ports formed in the annular plenum. Each inlet port of the plurality of inlet ports is spaced equidistant about a central axis of the annular plenum.
    Type: Application
    Filed: July 19, 2019
    Publication date: February 6, 2020
    Inventors: Tejas ULAVI, Amit Kumar BANSAL, Nitin PATHAK, Ajit BALAKRISHNA
  • Patent number: 10269614
    Abstract: Implementations of the present disclosure generally relate to a susceptor for thermal processing of semiconductor substrates. In one implementation, the susceptor includes a first rim surrounding and coupled to an inner region, and a second rim disposed between the inner rim and the first rim. The second rim includes an angled support surface having a plurality of cut-outs formed therein, and the angled support surface is inclined with respect to a top surface of the inner region.
    Type: Grant
    Filed: October 16, 2015
    Date of Patent: April 23, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Schubert S. Chu, Kartik Shah, Anhthu Ngo, Karthik Ramanathan, Nitin Pathak, Nyi O. Myo, Paul Brillhart, Richard O. Collins, Kevin Joseph Bautista, Edric Tong, Zhepeng Cong, Anzhong Chang, Kin Pong Lo, Manish Hemkar
  • Publication number: 20170175265
    Abstract: In one embodiment, a susceptor is provided and includes a first major surface opposing a second major surface, and a plurality of contact structures disposed on the first major surface, each of the contact structures being at least partially surrounded by one or more of a plurality of radially oriented grooves and an annular groove, wherein each of the plurality of contact structures includes a substrate contact surface, each of the substrate contact surfaces is between two parallel planes separated by a distance of 0.1 millimeters, and the substrate contact surfaces define a substrate receiving surface.
    Type: Application
    Filed: December 18, 2015
    Publication date: June 22, 2017
    Inventors: Kartik SHAH, Schubert S. CHU, Nyi O. MYO, Karthik RAMANATHAN, Richard O. COLLINS, Zhepeng CONG, Nitin PATHAK
  • Publication number: 20160133504
    Abstract: Implementations of the present disclosure generally relate to a susceptor for thermal processing of semiconductor substrates. In one implementation, the susceptor includes a first rim surrounding and coupled to an inner region, and a second rim disposed between the inner rim and the first rim. The second rim includes an angled support surface having a plurality of cut-outs formed therein, and the angled support surface is inclined with respect to a top surface of the inner region.
    Type: Application
    Filed: October 16, 2015
    Publication date: May 12, 2016
    Inventors: Schubert S. CHU, Kartik SHAH, Anhthu NGO, Karthik RAMANATHAN, Nitin PATHAK, Nyi O. MYO, Paul BRILLHART, Richard O. COLLINS, Kevin Joseph BAUTISTA, Edric TONG, Zhepeng CONG, Anzhong CHANG, Kin Pong LO, Manish HEMKAR
  • Publication number: 20030090039
    Abstract: A single pass, continuous, automated system for producing a pharmaceutical granulation includes multiple feeders to feed powders and liquids, a twin screw processor to granulate, a radio frequency or microwave based drying apparatus to dry the granulation, and at least one mill to process the dried granulation to desired particle sizes. The system incorporates means for monitoring key process parameters on-line, all of which are controlled by a controller provided with feedback at each component of the system. The granulation produced can be compressed into a tablet or incorporated into a capsule, both having a uniform distribution of the active ingredient. The system produces product having consistent properties even when production is scaled up for manufacture of the tablet in commercial volume.
    Type: Application
    Filed: November 8, 2002
    Publication date: May 15, 2003
    Inventors: Isaac Ghebre-Sellassie, Matthew J. Mollan, Nitin Pathak, Mayur Lodaya, Mebrahtu Fessehaie
  • Patent number: 6499984
    Abstract: A single pass, continuous, automated system for producing a pharmaceutical granulation includes multiple feeders to feed powders and liquids, a twin screw processor to granulate, a radio frequency or microwave based drying apparatus to dry the granulation, and at least one mill to process the dried granulation to desired particle sizes. The system incorporates means for monitoring key process parameters on-line, all of which are controlled by a controller provided with feedback at each component of the system. The granulation produced can be compressed into a tablet or incorporated into a capsule, both having a uniform distribution of the active ingredient. The system produces product having consistent properties even when production is scaled up for manufacture of the tablet in commercial volume.
    Type: Grant
    Filed: May 22, 2000
    Date of Patent: December 31, 2002
    Assignee: Warner-Lambert Company
    Inventors: Isaac Ghebre-Sellassie, Matthew J. Mollan, Jr., Nitin Pathak, Mayur Lodaya, Mebrahtu Fessehaie
  • Patent number: 5698562
    Abstract: This invention is directed to an aqueous pharmaceutical composition with 1.25 mg to about 10 mg trimethoprim per mL (wt/vol) of solution and a compound of suitable acid strength to permit the dissolving of trimethoprim at the appropriate concentration, with the composition having a pH of less than 6.0. This composition is particularly useful for pediatric oral use.
    Type: Grant
    Filed: October 8, 1991
    Date of Patent: December 16, 1997
    Assignee: Ascent Pediatrics, Inc.
    Inventors: Robert W. Mendes, Nitin Pathak, Emmett Clemente