Abstract: A semiconductor device and method of manufacturing the semiconductor device is disclosed. A layer of metallic material is deposited onto a substrate, the layer having a top surface. At least an edge area of the layer is masked with a first lithography mask and metallic material is removed from the edge area according to the first mask, whereby a first portion of the edge area has a thickness intermediate to the substrate and the layer top surface. The first portion of the edge area is masked with a second lithography mask and metallic material is removed from the first portion according to the second mask, whereby second portions of the edge area are free of deposited metallic material.

Abstract: A method of manufacturing a semiconductor device, such as a power MOSFET, including: forming a metal layer, the metal layer including an edge where the metal layer ends; forming a passivation layer at a layer higher than the metal layer; and forming a passivation slot in the passivation layer, the passivation slot is at least partially positioned over the metal layer, and the passivation slot divides the passivation layer into multiple regions, each region experiences a reduced tensile stress ?SiNx as a result of the passivation slot.

Abstract: A method of manufacturing a semiconductor device, such as a power MOSFET, including: forming a metal layer, the metal layer including an edge where the metal layer ends; forming a passivation layer at a layer higher than the metal layer; and forming a passivation slot in the passivation layer, the passivation slot is at least partially positioned over the metal layer, and the passivation slot divides the passivation layer into multiple regions, each region experiences a reduced tensile stress ?SiNx as a result of the passivation slot.