Patents by Inventor Niyaz Khusnatdinov

Niyaz Khusnatdinov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11327397
    Abstract: A pattern forming method using a photo-nanoimprint process on each of a plurality of shot areas: a step (1) of laying a layer of a curable composition (A1); a step (2) of dispensing liquid droplets of a curable composition (A2) dropwise discretely onto the layer of (A1); a step (3) of sandwiching a layer obtained by partially mixing (A1) and (A2), between a mold and the substrate; a step (4) of irradiating the layer with light to cure the layer; and a step (5) of releasing the mold from the layer of (A1) and (A2), in which when steps from the step (3) to the step (5) are collectively called an imprinting step [Im], in a time period from an end of the step (2) to a beginning of the step [Im] in one shot, the step (2) or the step [Im] is performed on another shot area.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: May 10, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tomonori Otani, Toshiki Ito, Niyaz Khusnatdinov
  • Patent number: 11294277
    Abstract: A process, system, and method of manufacturing an article on a substrate having a fluid control feature. The fluid control feature may include at least one depressed region formed along an edge of an imprint field. Formable material is deposited in the imprint field of the substrate. A template is moved such that the template comes into contact with the formable material in the imprint field. While the template comes into contact with the formable material, the formable material may flow into the fluid control feature.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: April 5, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Niyaz Khusnatdinov, Edward Brian Fletcher
  • Patent number: 11281097
    Abstract: A method for forming a pattern by using a photo-nanoimprint process includes performing, on each of a plurality of shot areas on a surface of a substrate: a step (1) of dispensing liquid droplets of a curable composition (A) dropwise discretely; a step (2) of bringing the curable composition (A) and a mold into contact with each other; a step (3) of irradiating the curable composition (A) with light; and a step (4) of releasing the mold from a cured product of the curable composition (A), in which when steps from the step (2) to the step (4) are collectively called an imprinting step (Im), before the imprinting step (Im) is performed on one shot area on which the step (1) has already been performed out of the plurality of shot areas, the step (1) is performed on another shot area selected from the plurality of shot areas.
    Type: Grant
    Filed: August 27, 2019
    Date of Patent: March 22, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Toshiki Ito, Tomonori Otani, Niyaz Khusnatdinov
  • Patent number: 11247459
    Abstract: An apparatus and method configured to eject an electrically charged liquid. The apparatus and method include a liquid-ejecting apparatus including a reservoir for storing a liquid, an electrically conductive faceplate for ejecting the liquid, a plurality of channels connecting the reservoir to the electrically conductive faceplate, and a voltage source to change and maintain an electric potential difference between the liquid and the electrically conductive faceplate during ejection from the electrically conductive faceplate.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: February 15, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Niyaz Khusnatdinov, Zhengmao Ye
  • Patent number: 11249397
    Abstract: A method of forming a cured layer on a substrate can include applying on the exterior surface of the substrate a first liquid film and subjecting the first liquid film to actinic radiation in at least one first region of the film. The actinic radiated region can modify the substrate surface such that the drop spreading of a region not subjected to actinic radiation is larger than the drop spreading in a region subjected to actinic radiation.
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: February 15, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Niyaz Khusnatdinov, Timothy Brian Stachowiak, Edward Brian Fletcher
  • Publication number: 20210402677
    Abstract: Systems and methods of shaping a patterned or planarized film layer. Which may include contacting formable material on a substrate with a template during a contacting period, Which may also include reducing, during the contacting period, a pressure in an environment beyond an edge of the substrate from a first pressure to a second pressure, while the template is contacting the formable material.
    Type: Application
    Filed: June 30, 2020
    Publication date: December 30, 2021
    Inventors: Niyaz Khusnatdinov, Mario Johannes Meissl, Seth J. Bamesberger
  • Patent number: 11209730
    Abstract: One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: December 28, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Logan L. Simpson, Steven Wayne Burns, Jason Battin, Niyaz Khusnatdinov, Christopher Ellis Jones, Craig William Cone, Wei Zhang, James W. Irving
  • Patent number: 11161280
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: November 2, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Patent number: 11126083
    Abstract: A superstrate can include a body having a surface; a buffer layer overlying the surface; and a protective layer overlying the buffer layer, wherein the protective layer has a surface roughness that is equal to or less than a surface roughness of the surface of the body. The protective layer can include a material that can be selectively removed with respect to the buffer layer, and the buffer layer can include a material that can be selectively removed with respect to the body of the superstrate. The superstrate can be used for more planarization or other processing sequences before the body needs to be replaced, as any defects that may form extend into the protective layer or buffer layer and not reach the body. The layers can be removed and replaced by corresponding new layers without significantly adversely affecting the body.
    Type: Grant
    Filed: January 24, 2018
    Date of Patent: September 21, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Douglas J. Resnick, Niyaz Khusnatdinov, Christopher Ellis Jones
  • Patent number: 11073758
    Abstract: An apparatus and method configured to brake and/or dampen an imprint head.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: July 27, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Niyaz Khusnatdinov, Mario Johannes Meissl
  • Patent number: 11054739
    Abstract: An apparatus and method configured to stabilize imprint head temperature. The apparatus and method includes an imprinting apparatus including, a mount attached to a fixed surface, a movable plate movable relative to the mount, at least one electromagnetic actuator mounted between the movable plate and the mount, wherein an electrical current is applied to the at least one electromagnetic actuator for controlling movement of the moveable plate, and wherein a root-mean-square of the electrical current applied to the at least one electromagnetic actuator in an idle state is equal to a root-mean-square of the electrical current applied to the at least one electromagnetic actuator during a continuous imprinting state.
    Type: Grant
    Filed: July 26, 2018
    Date of Patent: July 6, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventors: Niyaz Khusnatdinov, Mario Johannes Meissl
  • Patent number: 11020894
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Grant
    Filed: October 30, 2018
    Date of Patent: June 1, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung Jin Choi, Sidlgata V. Sreenivasan
  • Publication number: 20210157236
    Abstract: A method of forming a cured layer on a substrate can include applying on the exterior surface of the substrate a first liquid film and subjecting the first liquid film to actinic radiation in at least one first region of the film. The actinic radiated region can modify the substrate surface such that the drop spreading of a region not subjected to actinic radiation is larger than the drop spreading in a region subjected to actinic radiation.
    Type: Application
    Filed: November 22, 2019
    Publication date: May 27, 2021
    Inventors: Niyaz KHUSNATDINOV, Timothy Brian STACHOWIAK, Edward Brian FLETCHER
  • Publication number: 20210023840
    Abstract: An apparatus and method configured to eject an electrically charged liquid. The apparatus and method include a liquid-ejecting apparatus including a reservoir for storing a liquid, an electrically conductive faceplate for ejecting the liquid, a plurality of channels connecting the reservoir to the electrically conductive faceplate, and a voltage source to change and maintain an electric potential difference between the liquid and the electrically conductive faceplate during ejection from the electrically conductive faceplate.
    Type: Application
    Filed: July 22, 2019
    Publication date: January 28, 2021
    Inventors: Niyaz Khusnatdinov, Zhengmao Ye
  • Patent number: 10883006
    Abstract: A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a polymerizable compound (a1) on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing a polymerizable compound (a2) dropwise discretely onto the curable composition (A1) layer, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and releasing the mold from the mixture layer after the curing. The curable composition (A1) except a solvent has a viscosity at 25° C. of 40 mPa·s or more and less than 500 mPa·s. The curable composition (A2) except a solvent has a viscosity at 25° C. of 1 mPa·s or more and less than 40 mPa·s.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: January 5, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Keiko Chiba, Toshiki Ito, Timothy Brian Stachowiak, Niyaz Khusnatdinov, Weijun Liu
  • Publication number: 20200401040
    Abstract: A preliminary drop pattern is provided that defines a predetermined location on a substrate for a center of mass of each drop of a plurality of drops. The preliminary drop pattern is adjusted to generate an adjusted drop pattern by radially shifting each drop of a subset of drops of the plurality of drops from the predetermined location by a radial offset. The plurality of drops is dispensed according to the adjusted drop pattern. A template or a superstrate is contacted with the dispensed drops, after which the center of mass of each drop of the subset of drops is radially displaced to a displaced location on the substrate prior to the plurality of drops forming a continuous layer. The radial offset is selected such that the displaced location is within 50 ?m of the predetermined location of the corresponding drop of the preliminary drop pattern.
    Type: Application
    Filed: June 19, 2019
    Publication date: December 24, 2020
    Inventor: Niyaz Khusnatdinov
  • Patent number: 10859913
    Abstract: A body of a superstrate can be used to form an adaptive planarization layer over a substrate that has a non-uniform topography. A body of a superstrate can have bending characteristics that are well suited to achieve both conformal and planarization behavior. The body can have a surface and a thickness in a range of t1 to t2, t1=(Pd4/2Eh)1/3; t2=(5Pd4/2Eh)1/3; P is a pressure corresponding to a capillary force between the body and a planarization precursor material; d is a bending distance; E is Young's modulus for the body; and h is a step height difference between two adjacent regions of a substrate. In an embodiment, a thickness can be selected and used to determine the maximum out-of-plane displacement, wmax, for conformal behavior is sufficient and that wmax for planarization behavior is below a predetermined threshold.
    Type: Grant
    Filed: January 8, 2020
    Date of Patent: December 8, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Dwayne L. LaBrake, Niyaz Khusnatdinov
  • Patent number: 10845700
    Abstract: A pattern is formed on a substrate with forming a layer of a first curable composition (A1) containing a component (a1) as a polymerizable compound and a first component (c1) as a surfactant on a surface of the substrate, then dispensing droplets of a second curable composition (A2) containing a component (a2) as a polymerizable compound and a second component (c2) as a surfactant onto the layer formed of the first curable composition (A1), subsequently sandwiching a mixture layer of the first and second curable compositions (A1) and (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and releasing the mold from the mixture layer after curing. The first curable composition (A1) contains at least 0.5 wt % of the first component (c1), the second curable composition (A2) contains at least 0.5 wt % of the second component (c2).
    Type: Grant
    Filed: March 8, 2017
    Date of Patent: November 24, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Keiko Chiba, Toshiki Ito, Weijun Liu, Timothy Brian Stachowiak, Niyaz Khusnatdinov
  • Publication number: 20200292934
    Abstract: One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.
    Type: Application
    Filed: March 14, 2019
    Publication date: September 17, 2020
    Inventors: Logan L. Simpson, Steven Wayne Burns, Jason Battin, Niyaz Khusnatdinov, Christopher Ellis Jones, Craig William Cone, Wei Zhang, James W. Irving
  • Patent number: 10754244
    Abstract: A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing a component (a2) serving as a polymerizable compound (a2) and a component (b2) serving as a photopolymerization initiator dropwise discretely onto the layer of the curable composition (A1), subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and then releasing the mold from the mixture layer after the curing.
    Type: Grant
    Filed: March 8, 2017
    Date of Patent: August 25, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Toshiki Ito, Weijun Liu, Timothy Brian Stachowiak, Niyaz Khusnatdinov, Tomonori Otani, Masayuki Tanabe