Patents by Inventor Nizan Kenane

Nizan Kenane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • TIN-BASED PHOTORESIST COMPOSITION AND METHOD OF MAKING
    Publication number: 20230112618
    Abstract: Compositions comprising RqSnOm(OH)x(HCO3)y(CO3)z are disclosed, where R is (i) C1—C10 hydrocarbyl or (ii) heteroaliphatic, heteroaryl, or heteroaryl-aliphatic including 1-10 carbon atoms and one or more heteroatoms; q = 0.1-1; x ? 4; y ? 4; z ? 2; m = 2 - q/2 - x/2 - y/2 - z; and (q/2 + x/2 + y/2 + z) ? 2 Methods of making a photoresist film comprising [(RSn)12O14(OH)6](OH)2 on a substrate also are disclosed. The photoresist film may be irradiated to form RqSnOm(OH)x(HCO3)y(CO3)z.
    Type: Application
    Filed: February 25, 2021
    Publication date: April 13, 2023
    Applicant: Oregon State University
    Inventors: Nizan Kenane, Douglas A. Keszler
  • POSITIVE TONE DEVELOPMENT OF CVD EUV RESIST FILMS
    Publication number: 20220299877
    Abstract: The present disclosure relates to post-application treatment of a radiation-sensitive film to provide a hardened resist film. In some instances, such films can be used to form a pattern by a positive tone wet development process.
    Type: Application
    Filed: October 8, 2020
    Publication date: September 22, 2022
    Applicant: Lam Research Corporation
    Inventors: Timothy William Weidman, Katie Lynn Nardi, Dries Dictus, Benjamin Kam, Chenghao Wu, Eric Calvin Hansen, Nizan Kenane, Kevin Li Gu