Abstract: A coil component includes a body having a first surface, and a first end surface and a second end surface connected to the first surface and opposing each other in a length direction; a support substrate disposed inside the body; a coil portion comprising a first coil pattern and first and second lead-out patterns, each disposed on a first surface of the support substrate; first and second slit portions, respectively defined on edge portions of the first surface of the body to expose the first and second lead-out patterns; and first and second external electrodes disposed on the first and second slit portions to be connected to the first and second lead-out patterns. At least one of the first and second lead-out patterns has a thickness greater than a thickness of each of the first coil pattern and the first dummy lead-out pattern.

Abstract: A coil component is provided. The coil component includes a body having fifth and sixth surfaces opposing each other, first and second surfaces respectively connecting the fifth and sixth surfaces of the body and opposing each other, and third and fourth surfaces respectively connecting the first and second surfaces of the body and opposing each other in one direction, a recess disposed in an edge between one of the first and second surfaces of the body and the sixth surface of the body, a coil portion disposed inside the body and exposed through the recess, and an external electrode including a connection portion disposed in the recess and connected to the coil portion, and a pad portion disposed on one surface of the body. A length of the pad portion in the one direction is greater than a length of the connection portion in the one direction.

Abstract: Provided is an inductively coupled plasma etching apparatus comprising: a reaction chamber having an inner space to which a gas source is provided; an upper coil part for inducing an electric field into the inner space of the reaction chamber and configured to form an inductively coupled plasma from the gas source by the electric field; a mounting part which faces the upper coil part and on which an object to be etched by the inductively coupled plasma is disposed; and a lower electrode part provided on the lower side of the mounting part to induce at least any one of ions and neutral active species constituting the inductively coupled plasma and involved in etching toward the object to be etched disposed on the mounting part, wherein the frequency of the lower electrode part is lower than the frequency of the upper coil part.