Patents by Inventor Noa Armon

Noa Armon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for metrology optimization based on metrology landscapes
    Patent number: 11725934
    Abstract: A method for quantifying sensitivity of metrology to process variation including performing metrology, by a metrology tool, on at least one metrology target located at at least one site on a semiconductor wafer, thereby generating a metrology landscape, and calculating a sensitivity metric directly based on the metrology landscape, the sensitivity metric quantifying a sensitivity of the metrology landscape to process variation involved in manufacture of the semiconductor wafer.
    Type: Grant
    Filed: June 25, 2020
    Date of Patent: August 15, 2023
    Inventors: Dana Klein, Tal Marciano, Noa Armon
  • Systems and Methods for Metrology Optimization Based on Metrology Landscapes
    Publication number: 20220364855
    Abstract: A method for quantifying sensitivity of metrology to process variation including performing metrology, by a metrology tool, on at least one metrology target located at at least one site on a semiconductor wafer, thereby generating a metrology landscape, and calculating a sensitivity metric directly based on the metrology landscape, the sensitivity metric quantifying a sensitivity of the metrology landscape to process variation involved in manufacture of the semiconductor wafer.
    Type: Application
    Filed: June 25, 2020
    Publication date: November 17, 2022
    Inventors: Dana Klein, Tal Marciano, Noa Armon
  • Scaling metric for quantifying metrology sensitivity to process variation
    Patent number: 11333982
    Abstract: An overlay metrology system includes a controller to receive, from an overlay metrology tool, overlay measurements on multiple sets of overlay targets on a sample with a range of values of a measurement parameter, where a particular set of overlay targets includes overlay targets having one of two or more overlay target designs. The controller may further determine scaling metric values for at least some of the overlay targets, where the scaling metric for a particular overlay target is based on a standard deviation of the overlay measurements of the corresponding set of overlay targets. The controller may further determine a variability of the scaling metric values for each of the two or more sets of overlay targets. The controller may further select, as an output overlay target design, one of the two or more overlay target designs having a smallest scaling metric variability.
    Type: Grant
    Filed: January 13, 2020
    Date of Patent: May 17, 2022
    Assignee: KLA Corporation
    Inventors: Tal Marciano, Noa Armon, Dana Klein
  • Scaling Metric for Quantifying Metrology Sensitivity to Process Variation
    Publication number: 20200241428
    Abstract: An overlay metrology system includes a controller to receive, from an overlay metrology tool, overlay measurements on multiple sets of overlay targets on a sample with a range of values of a measurement parameter, where a particular set of overlay targets includes overlay targets having one of two or more overlay target designs. The controller may further determine scaling metric values for at least some of the overlay targets, where the scaling metric for a particular overlay target is based on a standard deviation of the overlay measurements of the corresponding set of overlay targets. The controller may further determine a variability of the scaling metric values for each of the two or more sets of overlay targets. The controller may further select, as an output overlay target design, one of the two or more overlay target designs having a smallest scaling metric variability.
    Type: Application
    Filed: January 13, 2020
    Publication date: July 30, 2020
    Inventors: Tal Marciano, Noa Armon, Dana Klein