Abstract: The invention is directed to an autofocusing device, preferably for microscopes for wafer inspection, in which a point-shaped illumination diaphragm (1) which is illuminated by laser light is imaged in an observed object (5). An image of the point illuminated on the observed object (5) is formed in a measurement diaphragm arrangement conjugate to the illumination diaphragm (1), the position of maximum intensity of this image is determined by a position-sensitive detector (11) and this position is compared to a position corresponding to the focus position, and an actuating signal for autofocusing is obtained from the deviation between the two positions.