Patents by Inventor Nobert Rosenkranz

Nobert Rosenkranz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Arrangement for inspecting objects, especially masks in microlithography
    Patent number: 7525115
    Abstract: Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.
    Type: Grant
    Filed: April 20, 2004
    Date of Patent: April 28, 2009
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Hans-Juergen Dobschal, Wolfgang Harnisch, Thomas Scheruebl, Nobert Rosenkranz, Ralph Semmler
  • Arrangement for inspecting objects, especially masks in microlithography
    Publication number: 20060262306
    Abstract: Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.
    Type: Application
    Filed: April 20, 2004
    Publication date: November 23, 2006
    Inventors: Hans-Juergen Dobschal, Wolfgang Harnisch, Thomas Scheruebl, Nobert Rosenkranz, Ralph Semmler