Abstract: A ceramic heater includes a ceramic plate having a surface that serves as a wafer placement surface, resistance heating elements that are embedded in the ceramic plate, a tubular shaft that supports the ceramic plate from a rear surface of the ceramic plate, a recess that is formed in a within-shaft region of the rear surface of the ceramic plate, the within-shaft region being surrounded by the tubular shaft, and terminals that are disposed to be exposed at a side surface of the recess and that supply electric power to the resistance heating element.

Abstract: A ceramic heater includes a ceramic plate having a surface that serves as a wafer placement surface, resistance heating elements that are embedded in the ceramic plate, a tubular shaft that supports the ceramic plate from a rear surface of the ceramic plate, a recess that is formed in a within-shaft region of the rear surface of the ceramic plate, the within-shaft region being surrounded by the tubular shaft, and terminals that are disposed to be exposed at a side surface of the recess and that supply electric power to the resistance heating element.

Abstract: A ceramic heater includes a ceramic plate having a surface that serves as a wafer placement surface, resistance heating elements and that are embedded in the ceramic plate, a tubular shaft that supports the ceramic plate from a rear surface of the ceramic plate, a recess that is formed in a within-shaft region of the rear surface of the ceramic plate, the within-shaft region being surrounded by the tubular shaft, and that has a size equal to a size of the within-shaft region, an elongate hole that extends from an opening formed in a side surface of the recess up to a predetermined terminal end position in an outer peripheral portion of the ceramic plate, and associated parts (such as terminals) that are disposed in the within-shaft region of the rear surface of the ceramic plate.

Abstract: A ceramic heater includes a ceramic plate incorporating an outer peripheral resistance heating element, and an outer peripheral thermocouple that measures the temperature of an outer peripheral zone by a temperature measurement portion provided at the tip of the outer peripheral thermocouple. The outer peripheral resistance heating element extends out from one of a pair of terminals provided at a center portion of the ceramic plate to the annular outer peripheral zone and reaches the other of the pair of terminals after disposed in the outer peripheral zone while turning back at a plurality of turn-back portions. The temperature measurement portion is disposed at a location in the outer peripheral zone excluding parts where the turn-back portions of the outer peripheral resistance heating element face each other.

Abstract: A susceptor includes a ceramic substrate having a wafer-placing surface; a first circular RF electrode buried in the ceramic substrate; and a second circular RF electrode buried in the ceramic substrate at a depth different from the depth of the first RF electrode. The second RF electrode has a larger diameter than the first RF electrode. The second RF electrode has a plurality of holes with an opening area of 9.42 to 25.13 mm2 distributed in a portion overlapping the first RF electrode in a plan view of the ceramic substrate. The electrode width between the holes is 3 to 7 mm.

Abstract: A susceptor 10 includes a ceramic substrate 20 having a wafer-placing surface 20a; a first circular RF electrode 31 buried in the ceramic substrate 20; and a second circular RF electrode 32 buried in the ceramic substrate 20 at a depth different from the depth of the first RF electrode 31. The second RF electrode 32 has a larger diameter than the first RF electrode 31. The second RF electrode 32 has a plurality of holes with an opening area of 9.42 to 25.13 mm2 distributed in a portion overlapping the first RF electrode 31 in a plan view of the ceramic substrate 20. The electrode width between the holes is 3 to 7 mm.