Patents by Inventor Noboru Kuriyama
Noboru Kuriyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240133858Abstract: The present invention proposes a process for extracting and determining nitrogenous and acidic compounds in various types of petroleums, derivatives or thermal degradation products, and in process waters before the production/refining phase. When the methodology is applied to petroleum and byproducts, the process comprises the extraction steps (1); separation (2); pre-concentration (3); and analysis (4). When the methodology is applied to thermal degradation products, there is a need for a previous step to simulate the heating of petroleum containing different chemicals (if necessary) with the purpose of promoting thermal degradation of the species present and of the petroleum, and generating nitrogen compounds with simpler composition.Type: ApplicationFiled: October 17, 2023Publication date: April 25, 2024Applicants: PETRÓLEO BRASILEIRO S.A. - PETROBRAS, SERVIÇO NACIONAL DE APRENDIZAGEM INDUSTRIAL SENAIInventors: ROGERIO MESQUITA DE CARVALHO, SERGIO NOBORU KURIYAMA, ANDRE LUIZ CASTRO BONFIM, ANTÔNIO AUGUSTO FIDALGO NETO, SAMUEL DE OLIVEIRA SILVA, GIOVANNI BRESSIANI PEDROSO
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Patent number: 8997815Abstract: According to one embodiment, an ultrasonic bonding apparatus includes an ultrasonic transducer, a distal-end tool, an ultrasonic horn and an ultrasonic oscillator. The ultrasonic oscillator includes an oscillation circuit and a control device. The ultrasonic oscillator applies the voltage oscillated by the oscillation circuit to the ultrasonic transducer. The control device is configured to detect a voltage reflection ratio from the voltage and current supplied from the oscillation circuit and to control the frequency of the voltage generated by the oscillation circuit, thereby to minimize the voltage reflection ratio.Type: GrantFiled: March 12, 2014Date of Patent: April 7, 2015Assignees: Kabushiki Kaisha Toshiba, Shibaura Mechatronics CorporationInventors: Takahiro Aizawa, Noboru Kuriyama, Miki Mori
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Publication number: 20140283996Abstract: According to one embodiment, an ultrasonic bonding apparatus includes an ultrasonic transducer, a distal-end tool, an ultrasonic horn and an ultrasonic oscillator. The ultrasonic oscillator includes an oscillation circuit and a control device. The ultrasonic oscillator applies the voltage oscillated by the oscillation circuit to the ultrasonic transducer. The control device is configured to detect a voltage reflection ratio from the voltage and current supplied from the oscillation circuit and to control the frequency of the voltage generated by the oscillation circuit, thereby to minimize the voltage reflection ratio.Type: ApplicationFiled: March 12, 2014Publication date: September 25, 2014Applicants: SHIBAURA MECHATRONICS CORPORATION, KABUSHIKI KAISHA TOSHIBAInventors: Takahiro AIZAWA, Noboru KURIYAMA, Miki MORI
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Patent number: 7880403Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt-dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively.Type: GrantFiled: November 17, 2009Date of Patent: February 1, 2011Assignee: Shibaura Mechatronics CorporationInventor: Noboru Kuriyama
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Publication number: 20100117540Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt-dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively.Type: ApplicationFiled: November 17, 2009Publication date: May 13, 2010Applicant: SHIBAURA MECHATRONICS CORPORATIONInventor: Noboru Kuriyama
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Patent number: 7695599Abstract: A discharging power supply including a direct current power supply unit, a control unit for controlling an output of the direct current power supply unit, and a vibrating current generation unit having a capacitance connected in parallel with a pair of outputs from the direct current power supply unit and an inductance connected to at least one of the pair of outputs, wherein the control unit controls the direct current power supply unit so that current outputted from the direct current power supply unit does not exceed a limit current value in at least a portion of a range of voltage that can be outputted from the direct current power supply unit. Thus, regardless of whether the discharge power is set to be high or low, discharge current exceeding the limit characteristic line can be prevented from flowing.Type: GrantFiled: May 30, 2003Date of Patent: April 13, 2010Assignee: Shibaura Mechatronics CorporationInventors: Noboru Kuriyama, Kazuhiko Imagawa
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Patent number: 7633242Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt?dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively. Arc discharge is determined to have developed in the glow-discharge apparatus, when Vr/Vf increases to a second level or a higher level within a preset time To after the supply of power to the glow-discharge apparatus is stopped.Type: GrantFiled: October 17, 2007Date of Patent: December 15, 2009Assignee: Shibaura Mechatronics CorporationInventor: Noboru Kuriyama
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Patent number: 7531070Abstract: A sputtering power-supply unit comprises a voltage generation section which generates a sputtering voltage between a negative electrode output terminal and a positive electrode output terminal, and a circuit section which reduces fluctuation in a sputtering current even if an arc discharge occurs between the negative electrode output terminal and the positive electrode output terminal. Thus, fluctuation in the sputtering current can be reduced even if the arc discharge occurs between the negative electrode output terminal and the positive electrode output terminal.Type: GrantFiled: March 15, 2004Date of Patent: May 12, 2009Assignee: Shibaura Mechatronics CorporationInventors: Noboru Kuriyama, Kazuhiko Imagawa
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Patent number: 7492105Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt?dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively. Arc discharge is determined to have developed in the glow-discharge apparatus, when Vr/Vf increases to a second level or a higher level within a preset time To after the supply of power to the glow-discharge apparatus is stopped.Type: GrantFiled: October 17, 2007Date of Patent: February 17, 2009Assignee: Shibaura Mechatronics CorporationInventor: Noboru Kuriyama
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Publication number: 20080036392Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt?dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively. Arc discharge is determined to have developed in the glow-discharge apparatus, when Vr/Vf increases to a second level or a higher level within a preset time To after the supply of power to the glow-discharge apparatus is stopped.Type: ApplicationFiled: October 17, 2007Publication date: February 14, 2008Applicant: SHIBAURA MECHATRONICS CORPORATIONInventor: Noboru Kuriyama
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Publication number: 20080036402Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt?dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively. Arc discharge is determined to have developed in the glow-discharge apparatus, when Vr/Vf increases to a second level or a higher level within a preset time To after the supply of power to the glow-discharge apparatus is stopped.Type: ApplicationFiled: October 17, 2007Publication date: February 14, 2008Applicant: SHIBAURA MECHATRONICS CORPORATIONInventor: Noboru Kuriyama
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Patent number: 7301286Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt?dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively. Arc discharge is determined to have developed in the glow-discharge apparatus, when Vr/Vf increases to a second level or a higher level within a preset time To after the supply of power to the glow-discharge apparatus is stopped.Type: GrantFiled: March 17, 2004Date of Patent: November 27, 2007Assignee: Shibaura Mechatronics CorporationInventor: Noboru Kuriyama
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Publication number: 20060011473Abstract: A discharging power supply according to the invention comprises: a direct current power supply unit; a control unit for controlling an output of the direct current power supply unit; and a vibrating current generation unit having a capacitance connected in parallel with a pair of outputs from the direct current power supply unit and an inductance connected to at least one of the pair of outputs, wherein the discharging power supply outputs discharging power via the vibrating current generation unit, the control unit controls the direct current power supply unit so that current outputted from the direct current power supply unit does not exceed a limit current value in at least a portion of a range of voltage that can be outputted from the direct current power supply unit, and the limit current value has a positive correlation with the absolute value of the voltage in the at least a portion of the range of voltage.Type: ApplicationFiled: May 30, 2003Publication date: January 19, 2006Applicant: SHIBAURA MECHATRONICS CORPORATIONInventors: Noboru Kuriyama, Kazuhiro Imagawa
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Publication number: 20040223284Abstract: There is disclosed an electrostatic attracting method in which a direct-current voltage is applied to an electrode disposed at a table formed of a dielectric material to attract/hold a substrate onto a holding surface of the table with an electrostatic force produced thereby, the method comprising a first step of applying a voltage having a predetermined polarity to the electrode to charge the holding surface with an electric charge having a polarity different from that applied to the electrode, a second step of holding the substrate in contact with the holding surface to prevent electric charges charged on the holding surface from disappearing, and a third step of applying a voltage having a polarity different from that applied in the first step to the electrode in a state in which the substrate contacts the holding surface to produce an electric charge having the same polarity as that charged at the holding surface in the first step on the holding surface of the table, and attracting/holding the substrate wType: ApplicationFiled: December 2, 2003Publication date: November 11, 2004Applicant: Shibaura Mechatronics CorporationInventors: Munenori Iwami, Noboru Kuriyama, Koji Takeishi, Ikuo Hayafuji, Hirokazu Masuda
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Publication number: 20040182696Abstract: A sputtering power-supply unit comprises a voltage generation section which generates a sputtering voltage between a negative electrode output terminal and a positive electrode output terminal, and a circuit section which reduces fluctuation in a sputtering current even if an arc discharge occurs between the negative electrode output terminal and the positive electrode output terminal. Thus, fluctuation in the sputtering current can be reduced even if the arc discharge occurs between the negative electrode output terminal and the positive electrode output terminal.Type: ApplicationFiled: March 15, 2004Publication date: September 23, 2004Applicant: Shibaura Mechantronics CorporationInventors: Noboru Kuriyama, Kazuhiko Imagawa
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Publication number: 20040177923Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt−dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively. Arc discharge is determined to have developed in the glow-discharge apparatus, when Vr/Vf increases to a second level or a higher level within a preset time To after the supply of power to the glow-discharge apparatus is stopped.Type: ApplicationFiled: March 17, 2004Publication date: September 16, 2004Applicant: Shibaura Mechantronics CorporationInventor: Noboru Kuriyama
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Patent number: 6416638Abstract: The present invention is such that, in a circuit for preventing an arc discharge through the application of a reverse voltage pulse, in the case where, after the application of the reverse voltage pulse has been ended, the generation of an arc discharge is detected by an arc discharge detecting means (23), a reverse voltage generated by a reverse voltage generating means (12) is applied within 1 to 10 &mgr;s to a sputtering source to lower the probability of generating a continuous arc discharge and, through a diode (D10) connected in series with the sputtering source (14) and a resistor (r10) connected in parallel with the diode (D10), a current at a time of applying the reverse voltage is restricted, thus lowering a continuous arc discharge resulting from the reverse arc discharge.Type: GrantFiled: July 28, 1999Date of Patent: July 9, 2002Assignee: Shibaura Mechatronics CorporationInventors: Noboru Kuriyama, Yutaka Yatsu, Yoshio Kawamata, Takashi Fujii
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Patent number: 6113760Abstract: The present invention provides a sputtering power supply apparatus which realizes stable sputtering at a pressure lower than the discharge start pressure, so that scattering of sputtering particles due to collision with sputtering inert gas can be reduced, thereby improving the step coverage and the denseness of the sputter film. According to the present invention, there is provided a sputtering power supply apparatus comprising a sputtering DC power source (A), a constant current circuit (B) connected to the DC power source, a sputtering source (21) connected to the constant current circuit (B), and a control unit (11) for controlling a current output from the constant current circuit (B) so as to be a constant current.Type: GrantFiled: July 28, 1999Date of Patent: September 5, 2000Assignee: Shibaura Mechatronics CorporationInventors: Noboru Kuriyama, Yutaka Yatsu, Nobuaki Utsunomiya, Yuji Yasumoto
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Patent number: 5721470Abstract: In a microwave generator apparatus including a magnetron having a filament and an anode and generating a microwave, a filament power source supplies a filament power to the filament of the magnetron, and an anode power source applies an anode voltage between the filament and the anode of the magnetron. Then a parasitic oscillation detecting circuit detects a parasitic oscillation voltage superimposed on the microwave generated by the magnetron, and a filament power controller, in response to the parasitic oscillation voltage detected by the parasitic oscillation detecting circuit, controls the filament power source to control the filament power so that the parasitic oscillation voltage is made smaller.Type: GrantFiled: May 6, 1997Date of Patent: February 24, 1998Assignees: Daihen Corporation, Shibaura Engineering Works Co., LtdInventors: Noboru Kuriyama, Hiroaki Oichi, Yoshiki Fukumoto
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Patent number: 4351714Abstract: A sputter-etching device has a hollow electrode with an internal space in which gas plasma is formed and an opening which is confronted with the inner wall of a vacuum chamber to provide an electric discharge gap therebetween. An object to be processed is placed on the side of the vacuum chamber instead of the side of the electrode. The sputter-etching device is combined with a sputtering device so that immediately after being cleaned by sputter-etching, the object is subjected to sputtering.Type: GrantFiled: April 21, 1981Date of Patent: September 28, 1982Assignee: Kabushiki Kaisha Tokuda SeisakushoInventor: Noboru Kuriyama