Patents by Inventor Noboru Moriya

Noboru Moriya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11972768
    Abstract: An autocorrelation calculation unit 21 calculates an autocorrelation RO(i) from an input signal. A prediction coefficient calculation unit 23 performs linear prediction analysis by using a modified autocorrelation R?O(i) obtained by multiplying a coefficient wO(i) by the autocorrelation RO(i). It is assumed here, for each order i of some orders i at least, that the coefficient wO(i) corresponding to the order i is in a monotonically increasing relationship with an increase in a value that is negatively correlated with a fundamental frequency of the input signal of the current frame or a past frame.
    Type: Grant
    Filed: October 21, 2022
    Date of Patent: April 30, 2024
    Assignee: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
    Inventors: Yutaka Kamamoto, Takehiro Moriya, Noboru Harada
  • Patent number: 9343260
    Abstract: In order to realize a multiple assembled easily with high accuracy, a multipole having assembly accuracy within 10 micrometer and within several seconds of angle is achieved by fixing multipole elements by being guided by grooves provided on an inner side of a cylindrical housing to form the multipole.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: May 17, 2016
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kotoko Urano, Takeshi Kawasaki, Noboru Moriya, Tomonori Nakano
  • Patent number: 8653472
    Abstract: The present invention is based on the property that the electric and magnetic fields are independent of each other and normal to each other and the property that the deflection of a charged particle beam by the electromagnetic field follows the rule of linear combination. The present invention employs a system that creates a region in which there exist both electromagnetic field and controls the deflection of a charged particle beam in each of the electric and magnetic fields.
    Type: Grant
    Filed: August 11, 2010
    Date of Patent: February 18, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Ken Harada, Akira Sugawara, Noboru Moriya
  • Publication number: 20130320227
    Abstract: In order to realize a multiple assembled easily with high accuracy, a multipole having assembly accuracy within 10 micrometer and within several seconds of angle is achieved by fixing multipole elements by being guided by grooves provided on an inner side of a cylindrical housing to form the multipole.
    Type: Application
    Filed: February 29, 2012
    Publication date: December 5, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kotoko Urano, Takeshi Kawasaki, Noboru Moriya, Tomonori Nakano
  • Publication number: 20130115690
    Abstract: Disclosed is a cell culture vessel that can prevent liquid leakage from the cell culture space and entry of particles containing microorganisms from outside the cell culture space, and that can prepare regenerated tissue in a manner that is safe and results in peace of mind. The cell culture vessel is mounted to a cell culture device, holds/cultures cells, and is characterized by being provided with: a culture solution holding section that holds a culture solution, a protruding structure section that is for supplying and discharging the aforementioned culture solution; and a culture solution duct that passes from the aforementioned protruding structure section to the aforementioned culture solution holding section.
    Type: Application
    Filed: July 7, 2011
    Publication date: May 9, 2013
    Applicant: Hitachi, Ltd.
    Inventors: Ryota Nakajima, Noboru Moriya, Toyoshige Kobayashi, Shizu Matsuoka, Takayuki Nozaki, Keisuke Mori
  • Publication number: 20120241612
    Abstract: Disclosed are an electron beam biprism device and an electron beam device, in which, in order to implement a fringe scan method in an electron beam interferometer, a deflection function in one direction is added to the function of an electron beam biprism, and electron beams passing the left and right sides of a filament electrode can be respectively deflected at different angles.
    Type: Application
    Filed: December 6, 2010
    Publication date: September 27, 2012
    Applicant: Hitachi Ltd
    Inventors: Ken Harada, Akira Sugawara, Noboru Moriya
  • Publication number: 20110073759
    Abstract: The present invention is based on the property that the electric and magnetic fields are independent of each other and normal to each other and the property that the deflection of a charged particle beam by the electromagnetic field follows the rule of linear combination. The present invention employs a system that creates a region in which there exist both electromagnetic field and controls the deflection of a charged particle beam in each of the electric and magnetic fields.
    Type: Application
    Filed: August 11, 2010
    Publication date: March 31, 2011
    Inventors: Ken HARADA, Akira Sugawara, Noboru Moriya
  • Patent number: 7872755
    Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area.
    Type: Grant
    Filed: January 27, 2006
    Date of Patent: January 18, 2011
    Assignee: Riken
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Patent number: 7834326
    Abstract: The present invention provides an aberration corrector giving excellent assembly accuracy but having fewer parts and fewer adjustment locations in number. In order to achieve it, a multistage multipole is formed by arranging plural combinations of electrodes around an optical axis using alignment blocks, each combination of electrodes being made by brazing-integrating plural electrodes with a ceramic material interposed therebetween.
    Type: Grant
    Filed: August 7, 2008
    Date of Patent: November 16, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takeshi Kawasaki, Noboru Moriya, Tomonori Nakano, Kotoko Hirose
  • Patent number: 7750298
    Abstract: An interferometer is disclosed which has upper-stage, intermediate-stage, and lower-stage electron biprisms. The disclosed interferometer operates with an azimuth angle ? among filament electrodes of the three electron biprisms to arbitrarily control an interference area and an azimuth ? of the interference fringes formed therein, eliminates Fresnel fringes generation, and allows independent control of an interference fringe spacing s and the azimuth ? of the interference fringes.
    Type: Grant
    Filed: January 27, 2006
    Date of Patent: July 6, 2010
    Assignee: Riken
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Patent number: 7655905
    Abstract: Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: February 2, 2010
    Assignee: Riken
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Publication number: 20090273789
    Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area.
    Type: Application
    Filed: January 27, 2006
    Publication date: November 5, 2009
    Applicant: RIKEN
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Patent number: 7538323
    Abstract: The present invention provides a technique enabling to control fringe spacing s and an interference width W independently of each other, which are important parameters for an interferometer using an electron biprism. In the present invention, two electron biprisms 9u, 9b are used in two stages along the optical axis, and fringe spacing s and an interference width W are controlled independently of each other by controlling a voltage applied to an electrode of each of the electron biprisms. Also Fresnel diffraction can be suppressed.
    Type: Grant
    Filed: January 7, 2005
    Date of Patent: May 26, 2009
    Assignee: Riken
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Publication number: 20090045339
    Abstract: Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.
    Type: Application
    Filed: May 11, 2006
    Publication date: February 19, 2009
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Publication number: 20090039281
    Abstract: The present invention provides an aberration corrector giving excellent assembly accuracy but having fewer parts and fewer adjustment locations in number. In order to achieve it, a multistage multipole is formed by arranging plural combinations of electrodes around an optical axis using alignment blocks, each combination of electrodes being made by brazing-integrating plural electrodes with a ceramic material interposed therebetween.
    Type: Application
    Filed: August 7, 2008
    Publication date: February 12, 2009
    Inventors: Takeshi KAWASAKI, Noboru Moriya, Tomonori Nakano, Kotoko Hirose
  • Publication number: 20080258058
    Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double-biprism electron interferometer, however, is the same as the optical system of the single electron biprism interferometer in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area.
    Type: Application
    Filed: January 27, 2006
    Publication date: October 23, 2008
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Publication number: 20040180428
    Abstract: An apparatus for microinjection of samples into amphibian oocytes, comprising a tray for holding a plurality of the amphibian oocytes, an injection needle for injecting a sample into the said amphibian oocytes, a driving means for moving a relative position between the said tray and the said injection needle and a controlling means for controlling the said movement by imputing a depth of the said injection needle for the said tray or the said amphibian oocytes in the injection of the sample, and injecting the sample into the said amphibian oocytes at the said depth.
    Type: Application
    Filed: March 31, 2004
    Publication date: September 16, 2004
    Applicant: Hitachi, Ltd
    Inventors: Tomoko Takeshita, Jun Otomo, Sayuri Nomura, Shokichi Matsunami, Noboru Moriya, Sakae Saito
  • Patent number: 6593129
    Abstract: An apparatus for microinjection of samples into amphibian oocytes, comprising a tray for holding a plurality of the amphibian oocytes, an injection needle for injecting a sample into the said amphibian oocytes, a driving means for moving a relative position between the said tray and the said injection needle and a controlling means for controlling the said movement by imputing a depth of the said injection needle for the said tray or the said amphibian oocytes in the injection of the sample, and injecting the sample into the said amphibian oocytes at the said depth. According to the present invention, the sample can be injected into the amphibian oocyte with constant depth.precisely and quality of oocyte or a positional site of needle injection can be recorded as the information.
    Type: Grant
    Filed: September 20, 2000
    Date of Patent: July 15, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Tomoko Takeshita, Jun Otomo, Sayuri Nomura, Shokichi Matsunami, Noboru Moriya, Sakae Saito
  • Patent number: 6539244
    Abstract: An automatic electrophysiological measuring apparatus to automatically penetrate a glass electrode(s) into the membrane of a Xenopus Oocyte to hold the membrane potential and to automatically measure reactions to the administration of a medicine is to be provided. A glass electrode 103 in the air is moved toward a Xenopus Oocyte 601 held in a cell. Changes in the potential states of the glass electrodes are picked up by a control computer to distinguish the relative positions of the glass electrode 102 and the Xenopus Oocyte 601, and the sequence of electrophysiological measurement so as to penetrate the glass electrode 102 into the Xenopus Oocyte 601, hold the membrane potential and automatically administer the medicine.
    Type: Grant
    Filed: December 21, 2000
    Date of Patent: March 25, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Hirokazu Kato, Jun Otomo, Sayuri Nomura, Tomoko Takeshita, Sakae Saito, Shokichi Matsunami, Noboru Moriya
  • Publication number: 20030028908
    Abstract: An apparatus for microinjection of samples into amphibian oocytes incorporates a tray for holding a plurality of the amphibian oocytes, an injection needle for injecting a sample into the amphibian oocytes, a driving means for moving a relative position between the tray and the injection needle and a controlling device for controlling the movement by inputting a depth of the injection needle for the tray or the amphibian oocytes in the injection of the sample, and injecting the sample into the amphibian oocytes at the given depth. According to the present invention, the sample can be injected into the amphibian oocyte with constant depth precisely , and quality of the oocytes and the positional site of needle injection can be recorded as information.
    Type: Application
    Filed: October 7, 2002
    Publication date: February 6, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Tomoko Takeshita, Jun Otomo, Sayuri Nomura, Shokichi Matsunami, Noboru Moriya, Sakae Saito