Abstract: [Problem to be Solved] To provide: an antifog optical article wherein a suitable water-repellent layer is formed in the process of application of antifog coating having a water-absorbing layer consisting primarily of urethane or acrylic resin having a polyoxyethylene chain on a base material; and a manufacturing method of the antifog optical article. [Solution] A water-absorbing layer consisting primarily of urethane or acrylic resin having a polyoxyethylene chain represented as —(CH2CH2O)n- is formed on a surface of a glass or plastic base material, a water-repellent layer consisting primarily of at least one of amino-modified silicone and mercapto-modified silicone is formed on a surface of the water-absorbing layer, and a contact angle with respect to water on a surface of the water-repellent layer is set equal to or larger than 100 degrees.

Abstract: [Problem to be Solved] To provide: an antifog optical article wherein a suitable water-repellent layer is formed in the process of application of antifog coating having a water-absorbing layer consisting primarily of urethane or acrylic resin having a polyoxyethylene chain on a base material; and a manufacturing method of the antifog optical article. [Solution] A water-absorbing layer consisting primarily of urethane or acrylic resin having a polyoxyethylene chain represented as —(CH2CH2O)n- is formed on a surface of a glass or plastic base material, a water-repellent layer consisting primarily of at least one of amino-modified silicone and mercapto-modified silicone is formed on a surface of the water-absorbing layer, and a contact angle with respect to water on a surface of the water-repellent layer is set equal to or larger than 100 degrees.

Abstract: An antifouling film is introduced on a base of an optical product such that (1) an absolute value of a charged electrostatic potential is 2.00 kV or less, and (2) a surface peel strength is 0.10 N/19 mm or less. A hard coat film and an optical multilayer film are placed between the base of the optical product and the antifouling film. An antireflection film is provided as the optical multilayer film, and a base of a spectacle plastic lens is provided as the base of the optical product.

Abstract: An antifouling film is introduced on a base of an optical product such that (1) an absolute value of a charged electrostatic potential is 2.00 kV or less, and (2) a surface peel strength is 0.10 N/19 mm or less. A hard coat film and an optical multilayer film are placed between the base of the optical product and the antifouling film. An antireflection film is provided as the optical multilayer film, and a base of a spectacle plastic lens is provided as the base of the optical product.

Abstract: The problem of the present invention is to offer a wave absorber that has reflection attenuation capability sufficient to enable prevention of communication disturbances due to reflection and the like of EM waves, that enables greater thinness and lighter weight, and that has wide-band attenuation properties, as well as a manufacturing method of the wave absorber. The wave absorber of the present invention has a structure which sequentially laminates a grid-like conductor layer composed of an electric conductor, a first dielectric layer, a high-resistance conductor layer having a surface resistivity within a prescribed range, a second dielectric layer, and a pattern layer having multiple patterns composed of an electric conductor, wherein each pattern in said pattern layer differs in either or both of size and form relative to another adjacent pattern.

Abstract: A wave absorber of the present invention includes a sequentially laminated structure including an conductor layer (11) made of a conductive material; a first dielectric layer (polycarbonate substrate (12) and bismaleimide-triazine substrate (13)) made of one layer or a multilayer of a dielectric material; and a patterned layer (14) including a plurality of a pattern made of the conductive material, wherein the conductor layer, the first dielectric layer, and the patterned layer are laminated sequentially, and each pattern in the patterned layer (14) is different from other adjacent patterns with respect to at least one of size and shape. Therefore, the wave absorber has sufficient reflection-attenuating capability to prevent communication failure caused by a reflection of a radio wave and so on, can be thin-sized and reduced in weight, and has a wide-band attenuation property.

Abstract: The problem of the present invention is to offer a wave absorber that has reflection attenuation capability sufficient to enable prevention of communication disturbances due to reflection and the like of EM waves, that enables greater thinness and lighter weight, and that has wide-band attenuation properties, as well as a manufacturing method of the wave absorber. The wave absorber of the present invention has a structure which sequentially laminates a grid-like conductor layer composed of an electric conductor, a first dielectric layer, a high-resistance conductor layer having a surface resistivity within a prescribed range, a second dielectric layer, and a pattern layer having multiple patterns composed of an electric conductor, wherein each pattern in said pattern layer differs in either or both of size and form relative to another adjacent pattern.

Abstract: Applying liquid for hard coating that is made of organic silane compounds, the fine particles of composite mainly based on titanium-oxide, which also includes zirconium-oxide and silicon-oxide etc., dicyandiamide, itaconic acid, and Co(II) acetylacetonate compound on plastic lenses in order to form a hard coating layer after hardening.

Abstract: A wave absorber of the present invention includes a sequentially laminated structure including an conductor layer (11) made of a conductive material; a first dielectric layer (polycarbonate substrate (12) and bismaleimide-triazine substrate (13)) made of one layer or a multilayer of a dielectric material; and a patterned layer (14) including a plurality of a pattern made of the conductive material, wherein the conductor layer, the first dielectric layer, and the patterned layer are laminated sequentially, and each pattern in the patterned layer (14) is different from other adjacent patterns with respect to at least one of size and shape. Therefore, the wave absorber has sufficient reflection-attenuating capability to prevent communication failure caused by a reflection of a radio wave and so on, can be thin-sized and reduced in weight, and has a wide-band attenuation property.

Abstract: A process for producing a plastic lens is disclosed, which comprises the steps of: providing a primer layer comprising a polyurethane on the surface of a plastic lens substrate; subsequently providing a hard coat layer comprising a silicone resin on the surface of the primer layer; and then providing a single-layer or multi-layer anti-reflection coating on the surface of the hard coat layer by depositing an inorganic material, wherein the polyurethane used for providing the primer layer is a thermosetting polyurethane.

Abstract: A plastic lens formed by laminating, in the order as described below,(A) a plastic lens substrate having a refractive index in the range of 1.50 to 1.70,(B) a primer layer containing a metal compound of at least one metal selected from the group consisting of Al, Ti, Zr, Sn and Sb and a polyurethane, or(B') a primer layer formed from a polyurethane containing at least one element selected from the group consisting of Cl, Br, I and S,(C) a hard coating layer, and(D) a single-layered or multi-layered anti-reflection layer formed by vapor-depositing an inorganic substance.

Abstract: A process for producing a plastic lens, which comprises:(1) applying a primer coating composition composed mainly from a blocked polyisocyanate and a polyol onto a surface of a plastic lens substrate and heating the primer coating composition to form a primer layer of a thermoset polyurethane, the blocked polyisocyanate being a polyisocyanate blocked with a .beta.-diketone,(2) forming a hard coating layer on the primer layer, and(3) vapor-depositing an inorganic material or inorganic materials on the hard coating layer to form a single-layered or multi-layered anti-reflection coating.

Abstract: A pin diode having an incident layer which includes 1 to 10% of microcrystallized silicon is formed in a condition where a molar ratio of hydrogen to monosilane is 5:1 to 100:1 and applied power is 0.001 to 0.05 W/cm.sup.2. The pin diode as well as a contact image sensor comprising the same as excellent photoelectric transfer efficiency.