Patents by Inventor Noboru Otsuka

Noboru Otsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250085629
    Abstract: A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1), a resin including a structural unit having an acid-dissociable group, and an alcohol-based solvent having a boiling point of 90° C. or higher. R1 is a substituted or unsubstituted monovalent hydrocarbon group or a group including a divalent hetero atom-containing group between two adjacent carbon atoms of the hydrocarbon group; R2 and R3 are each independently a hydrogen atom or a monovalent hydrocarbon group, one of Rf11 and Rf12 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group, m1 is an integer of 1 to 3; m2 is an integer of 0 to 8; and Z1+ represents a monovalent radiation-sensitive onium cation.
    Type: Application
    Filed: November 20, 2024
    Publication date: March 13, 2025
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
  • Publication number: 20250076760
    Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or a group including a divalent hetero atom-containing group between two adjacent carbon atoms of the hydrocarbon group; R2 and R3 are each independently a hydrogen atom, a fluorine atom, or the like; and one of Rf11 and Rf12 is a fluorine atom, and the other is a hydrogen atom, a fluorine atom, or a monovalent fluorinated hydrocarbon group. R4 is a monovalent organic group in which neither a fluorine atom nor a fluorinated hydrocarbon group is bonded to an atom adjacent to the sulfur atom.
    Type: Application
    Filed: November 19, 2024
    Publication date: March 6, 2025
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
  • Publication number: 20250076762
    Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or the like; R2 and R3 are each independently a hydrogen atom, a fluorine atom, or the like; and Z+ represents a monovalent radiation-sensitive onium cation. R4 is a monovalent organic group; one of Rf21 and Rf22 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group; Ar is a monovalent organic group including an aromatic ring; R5, R6, R7, and R8 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, or a monovalent organic group; and X is a single bond or a divalent hetero atom-containing group.
    Type: Application
    Filed: November 19, 2024
    Publication date: March 6, 2025
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
  • Publication number: 20250076761
    Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or the like; R2 and R3 are each independently a hydrogen atom or a monovalent hydrocarbon group; one of Rf11 and Rf12 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group; and Z1+ represents a monovalent radiation-sensitive onium cation. R4 is a monovalent organic group including a cyclic structure; Rf21 and Rf22 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group; and Z2+ represents a monovalent radiation-sensitive onium cation.
    Type: Application
    Filed: November 19, 2024
    Publication date: March 6, 2025
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
  • Patent number: 8916333
    Abstract: A radiation-sensitive resin composition includes a polymer and a photoacid generator. The polymer includes a first structural unit shown by a formula (a1), a second structural unit shown by a formula (a2), and a third structural unit having a lactone structure. A content of the first structural unit in the polymer being 50 mol % or more based on total structural units included in the polymer. The first structural unit is preferably a structural unit shown by a formula (a1-1).
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: December 23, 2014
    Assignee: JSR Corporation
    Inventors: Hiroshi Tomioka, Noboru Otsuka, Akimasa Soyano
  • Patent number: 8802348
    Abstract: A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
    Type: Grant
    Filed: February 7, 2010
    Date of Patent: August 12, 2014
    Assignee: JSR Corporation
    Inventors: Noboru Otsuka, Takanori Kawakami, Yukio Nishimura, Makoto Sugiura
  • Patent number: 8507575
    Abstract: A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.
    Type: Grant
    Filed: October 13, 2011
    Date of Patent: August 13, 2013
    Assignee: JSR Corporation
    Inventors: Nobuji Matsumura, Yukio Nishimura, Akimasa Soyano, Ryuichi Serizawa, Noboru Otsuka, Hiroshi Tomioka
  • Publication number: 20120065291
    Abstract: A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.
    Type: Application
    Filed: October 13, 2011
    Publication date: March 15, 2012
    Applicant: JSR Corporation
    Inventors: Nobuji Matsumura, Yukio Nishimura, Akimasa Soyano, Ryuichi Serizawa, Noboru Otsuka, Hiroshi Tomioka
  • Patent number: 8084188
    Abstract: A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin.
    Type: Grant
    Filed: September 11, 2009
    Date of Patent: December 27, 2011
    Assignee: JSR Corporation
    Inventors: Noboru Otsuka, Takanori Kawakami
  • Publication number: 20110143279
    Abstract: A radiation-sensitive resin composition includes a sulfonate or sulfonic acid group-containing photoacid generator and a resin. The sulfonate or sulfonic acid group-containing photoacid generator includes a partial structure shown by a following formula (1), wherein R1 represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted cyclic or partially cyclic monovalent hydrocarbon group having 3 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted cyclic monovalent organic group having 4 to 30 carbon atoms that include a hetero atom.
    Type: Application
    Filed: January 13, 2011
    Publication date: June 16, 2011
    Applicant: JSR Corporation
    Inventors: Tsutomu SHIMOKAWA, Takuma Ebata, Kaori Sakai, Yoshifumi Oizumi, Akimasa Soyano, Noboru Otsuka
  • Publication number: 20100203447
    Abstract: A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
    Type: Application
    Filed: February 7, 2010
    Publication date: August 12, 2010
    Applicant: JSR CORPORATION
    Inventors: Noboru Otsuka, Takanori Kawakami, Yukio Nishimura, Makoto Sugiura
  • Publication number: 20100068647
    Abstract: A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin.
    Type: Application
    Filed: September 11, 2009
    Publication date: March 18, 2010
    Applicant: JSR Corporation
    Inventors: Noboru Otsuka, Takanori Kawakami
  • Patent number: 4656135
    Abstract: A process for producing L-isoleucine, which comprises culturing a microorganism belonging to the genus Brevibacterium or the genus Corynebacterium which has a methyllysine resistance or .alpha.-ketomalonic acid resistance and which is capable of producing L-isoleucine in a liquid medium, and obtaining the accumulated L-isoleucine from said medium.
    Type: Grant
    Filed: July 1, 1985
    Date of Patent: April 7, 1987
    Assignee: Ajinomoto Co., Inc.
    Inventors: Takayasu Tsuchida, Noboru Otsuka, Hiroshi Sonoda