Patents by Inventor Noboru Otsuka
Noboru Otsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250085629Abstract: A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1), a resin including a structural unit having an acid-dissociable group, and an alcohol-based solvent having a boiling point of 90° C. or higher. R1 is a substituted or unsubstituted monovalent hydrocarbon group or a group including a divalent hetero atom-containing group between two adjacent carbon atoms of the hydrocarbon group; R2 and R3 are each independently a hydrogen atom or a monovalent hydrocarbon group, one of Rf11 and Rf12 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group, m1 is an integer of 1 to 3; m2 is an integer of 0 to 8; and Z1+ represents a monovalent radiation-sensitive onium cation.Type: ApplicationFiled: November 20, 2024Publication date: March 13, 2025Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
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Publication number: 20250076760Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or a group including a divalent hetero atom-containing group between two adjacent carbon atoms of the hydrocarbon group; R2 and R3 are each independently a hydrogen atom, a fluorine atom, or the like; and one of Rf11 and Rf12 is a fluorine atom, and the other is a hydrogen atom, a fluorine atom, or a monovalent fluorinated hydrocarbon group. R4 is a monovalent organic group in which neither a fluorine atom nor a fluorinated hydrocarbon group is bonded to an atom adjacent to the sulfur atom.Type: ApplicationFiled: November 19, 2024Publication date: March 6, 2025Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
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Publication number: 20250076762Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or the like; R2 and R3 are each independently a hydrogen atom, a fluorine atom, or the like; and Z+ represents a monovalent radiation-sensitive onium cation. R4 is a monovalent organic group; one of Rf21 and Rf22 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group; Ar is a monovalent organic group including an aromatic ring; R5, R6, R7, and R8 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, or a monovalent organic group; and X is a single bond or a divalent hetero atom-containing group.Type: ApplicationFiled: November 19, 2024Publication date: March 6, 2025Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
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Publication number: 20250076761Abstract: A radiation-sensitive resin composition includes: a first onium salt compound represented by formula (1); a second onium salt compound represented by formula (2); a resin including a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent hydrocarbon group or the like; R2 and R3 are each independently a hydrogen atom or a monovalent hydrocarbon group; one of Rf11 and Rf12 is a fluorine atom, and the other is a fluorine atom or a monovalent fluorinated hydrocarbon group; and Z1+ represents a monovalent radiation-sensitive onium cation. R4 is a monovalent organic group including a cyclic structure; Rf21 and Rf22 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group; and Z2+ represents a monovalent radiation-sensitive onium cation.Type: ApplicationFiled: November 19, 2024Publication date: March 6, 2025Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Masayuki MIYAKE, Hajime INAMI, Tsuyoshi FURUKAWA, Noboru OTSUKA, Kensuke MIYAO
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Patent number: 8916333Abstract: A radiation-sensitive resin composition includes a polymer and a photoacid generator. The polymer includes a first structural unit shown by a formula (a1), a second structural unit shown by a formula (a2), and a third structural unit having a lactone structure. A content of the first structural unit in the polymer being 50 mol % or more based on total structural units included in the polymer. The first structural unit is preferably a structural unit shown by a formula (a1-1).Type: GrantFiled: September 28, 2012Date of Patent: December 23, 2014Assignee: JSR CorporationInventors: Hiroshi Tomioka, Noboru Otsuka, Akimasa Soyano
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Patent number: 8802348Abstract: A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.Type: GrantFiled: February 7, 2010Date of Patent: August 12, 2014Assignee: JSR CorporationInventors: Noboru Otsuka, Takanori Kawakami, Yukio Nishimura, Makoto Sugiura
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Patent number: 8507575Abstract: A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.Type: GrantFiled: October 13, 2011Date of Patent: August 13, 2013Assignee: JSR CorporationInventors: Nobuji Matsumura, Yukio Nishimura, Akimasa Soyano, Ryuichi Serizawa, Noboru Otsuka, Hiroshi Tomioka
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Publication number: 20120065291Abstract: A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.Type: ApplicationFiled: October 13, 2011Publication date: March 15, 2012Applicant: JSR CorporationInventors: Nobuji Matsumura, Yukio Nishimura, Akimasa Soyano, Ryuichi Serizawa, Noboru Otsuka, Hiroshi Tomioka
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Patent number: 8084188Abstract: A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin.Type: GrantFiled: September 11, 2009Date of Patent: December 27, 2011Assignee: JSR CorporationInventors: Noboru Otsuka, Takanori Kawakami
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Publication number: 20110143279Abstract: A radiation-sensitive resin composition includes a sulfonate or sulfonic acid group-containing photoacid generator and a resin. The sulfonate or sulfonic acid group-containing photoacid generator includes a partial structure shown by a following formula (1), wherein R1 represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted cyclic or partially cyclic monovalent hydrocarbon group having 3 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted cyclic monovalent organic group having 4 to 30 carbon atoms that include a hetero atom.Type: ApplicationFiled: January 13, 2011Publication date: June 16, 2011Applicant: JSR CorporationInventors: Tsutomu SHIMOKAWA, Takuma Ebata, Kaori Sakai, Yoshifumi Oizumi, Akimasa Soyano, Noboru Otsuka
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Publication number: 20100203447Abstract: A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.Type: ApplicationFiled: February 7, 2010Publication date: August 12, 2010Applicant: JSR CORPORATIONInventors: Noboru Otsuka, Takanori Kawakami, Yukio Nishimura, Makoto Sugiura
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Publication number: 20100068647Abstract: A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin.Type: ApplicationFiled: September 11, 2009Publication date: March 18, 2010Applicant: JSR CorporationInventors: Noboru Otsuka, Takanori Kawakami
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Patent number: 4656135Abstract: A process for producing L-isoleucine, which comprises culturing a microorganism belonging to the genus Brevibacterium or the genus Corynebacterium which has a methyllysine resistance or .alpha.-ketomalonic acid resistance and which is capable of producing L-isoleucine in a liquid medium, and obtaining the accumulated L-isoleucine from said medium.Type: GrantFiled: July 1, 1985Date of Patent: April 7, 1987Assignee: Ajinomoto Co., Inc.Inventors: Takayasu Tsuchida, Noboru Otsuka, Hiroshi Sonoda