Abstract: A novel polysiloxane suitable as a resin component of a chemically-amplified resist exhibiting particularly excellent I-D bias, depth of focus (DOF), and the like, a novel silane compound useful as a raw material for synthesizing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane are provided. The silane compound is shown by the following formula (I), and the polysiloxane has a structural unit shown by the following formula (1), wherein R is an alkyl group, R1 and R2 individually represent a fluorine atom, lower alkyl group, or lower fluoroalkyl group, n is 0 or 1, k is 1 or 2, and i is an integer of 0 to 10. The radiation-sensitive resin composition comprises the polysiloxane and a photoacid generator.

Abstract: A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.

Abstract: A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed.

Abstract: A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.

Abstract: The present invention provides a radiation sensitive resin composition which comprises (A) a resin represented by a copolymer comprising recurring units represented by the general formulae (1) or (2) as shown below, and (B) a radiation sensitive acid-generator. The radiation sensitive resin composition has an excellent storage stability and the resist produced from the composition is a chemically amplifiable type sensitive to radiations represented by fartificial ultraviolet rays.

Abstract: A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed.

Abstract: A transparent resin material consisting of a hydrogenation product of a (co)polymer obtained by subjecting at least one compound represented by general formula (I) or a combination of at least 5% by weight of said compound and 95% by weight or less of other copolymerizable cyclic olefin monomer to metathesis polymerization: ##STR1## wherein A and B are independently hydrogen atoms or C.sub.1-10 hydrocarbon groups; and X and Y are independently hydrogen atoms, C.sub.1-10 hydrocarbon groups, --C(CH.sub.2).sub.n COOR.sup.1 groups or --(CH.sub.2).sub.n OCOR.sup.1 groups [R.sup.1 is a C.sub.1-20 hydrocarbon group and n is 0 or an integer of 1-10] with the proviso that at least one of X and Y is selected from the above --(CH.sub.2).sub.n COOR.sup.1 and --(CH.sub.2).sub.n OCOR.sup.1 groups. Said transparent resin material is moldable and has sufficient optical properties, low hygroscopicity, good heat resistance and excellent adhesion to recording layer.

Abstract: A transparent resin material consisting of a (co)polymer obtained by subjecting at least one compound represented by the general formula (I) or a combination of said compound and other copolymerizable monomer to metathesis polymerization, or a hydrogenation product of the (co)polymer: ##STR1## wherein A and B are independently hydrogen atoms or C.sub.1-10 hydrocarbon groups; X and Y are independently hydrogen atoms, C.sub.1-10 hydrocarbon groups, halogen atoms, halogen-substituted C.sub.1-10 hydrocarbon groups, --(CH.sub.2).sub.n COOR.sup.1, --(CH.sub.2).sub.n OCOR.sup.1, --(CH.sub.2).sub.n OR.sup.1, --(CH.sub.2).sub.n CN, --(CH.sub.2).sub.n CONR.sup.2 R.sup.3, --(CH.sub.2).sub.n COOZ, --(CH.sub.2).sub.n OCOZ, --(CH.sub.2).sub.n OZ or --(CH.sub.2).sub.n W [R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are independently C.sub.1-20 hydrocarbon groups, Z is a halogen-substituted hydrocarbon group, W is SiR.sub.p.sup.5 D.sub.3-p (R.sup.5 is a C.sub.1-10 hydrocarbon group, D is a halogen atom, --OCOR.sup.5 or --OR.sup.

Abstract: Compounds having a cyclopentadiene skeleton and at least one sulfonic acid group are novel, and produced by subjecting cyclopentadiene, dicyclopentadiene and/or hydroxydicyclopentadiene to sulfonation, and subjecting the same, before or after the sulfonation, to reaction with alkylbenzene, polymerization and/or condensation through an aldehyde. The aforesaid compounds are useful as dispersants for cement.By incorporating a polymer emulsion into a slurry composition comprising a powder and a dispersant having at least one sulfonic acid group the proportion of said polymer emulsion being 0.05 to 50 parts by weight per 100 parts by weight of said dispersant, the dispersing effect of said dispersant is improved, the fluidizing effect of the dispersant is further enhanced, the slump loss is made very small, and the workability becomes good.

Abstract: A novel cyclopentadiene derivative of the general formula: ##STR1## wherein R.sup.1 is hydrogen, a mono- to tetra-hydric alcohol moiety having 1 to 12 carbon atoms, a metal of Groups Ia, IIa and IIb of the Periodic Table, an ammonium group or an organic amine residue; R.sup.2, R.sup.3, and R.sup.4 are independently hydrogen or alkyl groups having 1 to 6 carbon atoms; R.sup.a, R.sup.b, and R.sup.c are independently hydrogen or alkyl groups having 1 to 3 carbon atoms; m is 0 or 1; and n is an integer of 1 to 4. This cyclopentadiene derivative is comparable or even superior to natural rosin in effectiveness as an emulsifier for use in the production of SBR and ABS resins or as a sizing agent in paper making.

Abstract: A novel compound represented by the formula, ##STR1## WHEREIN R is a hydrogen or an alkyl group having 1 to 3 carbon atoms, said four R's being the same or different; R.sup.1 is hydrogen, an alkali metal, an ammonium group, a mono-to tetra-hydric aliphatic alcohol moiety having 1 to 12 carbon atoms, or an organic amine residue; n is an integer of 1 to 4; and R.sup.2, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are independently hydrogen or alkyl groups having 1 to 6 carbon atoms or R.sup.2 and R.sup.3 may form a ring when taken together. Said novel compound has properties similar to those of natural rosin or a disproportionated rosin, and is useful as a vehicle for coating compositions and printing inks, as an emulsifier for emulsion polymerization, and as a sizing agent.