Abstract: A mask pattern applied to a peripheral portion of a wafer has an open/close ratio substantially the same as that in a central portion thereof and prepared according to a looser design rule than that for forming the central portion. The looser design rule has a high latitude for out-of-focus exposure and provides high resistance to pattern removal. Since the open/close ratios in the central portion and the peripheral portion of the wafer are substantially the same, variance in process accuracy due to a micro-loading effect can be prevented.

Abstract: In order to reduce noise attendant with conventional equipment, an electric generator for a vehicle is attached to the vehicle engine by a stay arrangement that places the point of connection between the generator stator and the engine significantly radially outwardly from the stator. The stay apparatus, further, cooperatively mounts a lid plate for sealing the coupling chamber which houses the elastic coupling connected to the generator rotor shaft. A gap provided between the facing surfaces of the lid plate and the coupling chamber is filled by an elastic seal for improving the noise-damping efficiency of the apparatus. The elastic coupler of the generator and drive shafts has alternating radial fins whose interspaces are filled with resilient material.