Patents by Inventor Nobuaki Doi

Nobuaki Doi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Washing apparatus and washing method
    Patent number: 6048409
    Abstract: The present invention is directed to providing an apparatus which is improved so as to remove a contamination on a substrate efficiently. This apparatus includes a jet nozzle jetting out droplets toward a substrate. A liquid supply device and a gas supply device are connected to the jet nozzle. A mixing device mixing a liquid and a gas supplied to the jet nozzle and changing the liquid into the droplets is provided in the jet nozzle.
    Type: Grant
    Filed: August 25, 1997
    Date of Patent: April 11, 2000
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Ryoden Semiconductor System Engineering Corporation
    Inventors: Itaru Kanno, Toshiaki Ohmori, Hiroshi Tanaka, Nobuaki Doi
  • Washing apparatus and washing method
    Patent number: 5934566
    Abstract: The present invention is directed to providing an apparatus which is improved so as to remove a contamination on a substrate efficiently. This apparatus includes a jet nozzle jetting out droplets toward a substrate. A liquid supply device and a gas supply device are connected to the jet nozzle. A mixing device mixing a liquid and a gas supplied to the jet nozzle and changing the liquid into the droplets is provided in the jet nozzle.
    Type: Grant
    Filed: August 11, 1997
    Date of Patent: August 10, 1999
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Ryoden Semiconductor System Engineering Corporation
    Inventors: Itaru Kanno, Toshiaki Ohmori, Hiroshi Tanaka, Nobuaki Doi
  • Stream drying process
    Patent number: 5709037
    Abstract: A material to be dried, such as a semiconductor substrate during manufacturing a semiconductor device, is loaded into a process chamber fitted at a loading opening with a lid which is closed from above. The inner side wall surface of the process chamber has a first surface formed in the lower part thereof and is substantially in parallel with the inner wall surface of the lid, and a second surface extending from the upper end part of the first surface and bent outwards to face the inner wall surface of the lid. A processing solution vapor is fed through a steam supply port in the second surface into the process chamber and flowed downwardly over the material to be dried. The processing solution vapor is condensed and recovered below the material to be dried.
    Type: Grant
    Filed: October 7, 1996
    Date of Patent: January 20, 1998
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Ryoden Semiconductor System Engineering Corporation
    Inventors: Hiroshi Tanaka, Nobuaki Doi, Masashi Omori, Hiroaki Ishikawa
  • Steam drying apparatus, cleaning apparatus incorporating the same, and steam drying process
    Patent number: 5608974
    Abstract: A steam drying apparatus in which a process chamber is fitted at a loading opening with a lid which is closed from above. The inner side wall surface of the process chamber has a first surface formed in the lower part thereof and is substantially in parallel with the inner wall surface of the lid, and a second surface extending from the upper end part of the first surface and bent outwards to face the inner wall surface of the lid. The second surface is provided with a steam supply port for supplying the processing solution vapor into the process chamber. To the steam supply port is connected a steam supply means for supplying the processing solution vapor into the process chamber.
    Type: Grant
    Filed: September 11, 1995
    Date of Patent: March 11, 1997
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Ryoden Semiconductor System Engineering Corporation
    Inventors: Hiroshi Tanaka, Nobuaki Doi, Masashi Omori, Hiroaki Ishikawa