Patents by Inventor Nobuhiko Kakuda

Nobuhiko Kakuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5198377
    Abstract: An active matrix cell includes a first conductor group formed on a transparent substrate, two-layered regions consisting of a semiconductor film and a first insulating film, a second insulating film and a second conductor group. The first conductor group forms the source and drain of a thin film transistor, pixel electrode, data line. One of the two-layered regions serves as an active region of the thin film transistor and the other of the two-layered regions serves as the intersection between the data and scanning lines. The second insulating film is buried in the gap between the two-layered regions and the first conductor group, and has substantially a same thickness as the two-layered regions. The second conductor group forms the scanning line and the part of the data line. A method of manufacturing the active matrix cell is also disclosed.
    Type: Grant
    Filed: July 9, 1991
    Date of Patent: March 30, 1993
    Inventors: Kinya Kato, Nobuhiko Kakuda, Noboru Naito, Tsutomu Wada
  • Patent number: 5162933
    Abstract: In an active matrix structure for liquid crystal display elements which includes pixel electrodes arranged in a matrix form on a glass base plate, thin film transistors having their drains connected to the pixel electrodes, respectively, data lines each connected to sources of the thin film transistors of one column and gate lines connected to gates of the thin film transistors of one row, there are provided in the same plane a light blocking layer disposed opposite each of the thin film transistors across an insulating layer, a storage capacitance electrode disposed partly opposite each of the pixel electrodes across the insulating layer and storage capacitance lines for interconnecting the capacitance electrodes. The light blocking layers, the storage capacitance electrodes and the storage capacitance lines are formed of the same material and at the same time.
    Type: Grant
    Filed: May 10, 1991
    Date of Patent: November 10, 1992
    Assignees: Nippon Telegraph and Telephone Corporation, Hosiden Corporation
    Inventors: Nobuhiko Kakuda, Tsutomu Wada, Kinya Kato, Tadamichi Kawada, Masamichi Okamura, Shigeo Aoki, Yasuhiro Ukai, Kiyoshi Taruta, Tomihisa Sunata, Hiroshi Saito, Takanobu Nakagawa
  • Patent number: 4918504
    Abstract: An active matrix cell includes a first conductor group formed on a transparent substrate, two-layered regions consisting of a semiconductor film and a first insulating film, a second insulating film and a second conductor group. The first conductor group forms the source and drain of a thin film transistor, pixel electrode, data line. One of the two-layered regions serves as an active region of the thin film transistor and the other of the two-layered regions serves as the intersection between the data and scanning lines. The second insulating film is buried in the gap between the two-layered regions and the first conductor group, and has substantially a same thickness as the two-layered regions. The second conductor group forms the scanning line and the part of the data line. A method of manufacturing the active matrix cell is also disclosed.
    Type: Grant
    Filed: July 22, 1988
    Date of Patent: April 17, 1990
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Kinya Kato, Nobuhiko Kakuda, Noboru Naito, Tsutomu Wada