Patents by Inventor Nobuhiro Mukai

Nobuhiro Mukai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4777190
    Abstract: A photopolymerizable composition comprising a vinylic compound, a sulfur-containing compound and an .alpha.-diketone is disclosed. The sulfur-containing compound may be a mercaptobenzoic acid or a polysulfide.
    Type: Grant
    Filed: August 15, 1985
    Date of Patent: October 11, 1988
    Assignee: Mitsubishi Rayon Company Limited
    Inventors: Isao Sasaki, Nobuhiro Mukai
  • Patent number: 4762863
    Abstract: Disclosed is a photopolymerizable dental composition consisting essentially of (A) a composite filler obtained by non-catalytically polymerizing a carboxylic acid monomer with a vinyl monomer in a polymerization system having an inorganic compound dispersed therein; (B) a monomer mixture composed of 2,2-bis[4-(methacryloxyethoxy)phenyl]propane, at least one hexafunctional urethane methacrylate having an isocyanuric acid skeleton, and an ethylenic vinyl monomer diluent; and (C) a photopolymerization initiator. The composite resin obtained by curing this dental composition has high mechanical strength and good water resistance.
    Type: Grant
    Filed: August 11, 1987
    Date of Patent: August 9, 1988
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Isao Sasaki, Nobuhiro Mukai, Hitoshi Ige
  • Patent number: 4678819
    Abstract: A composition for artificial marble which comprises a polymer composition in which an inorganic substance and an organic polymer are firmly bound in one body and a vinyl compound, said polymer composition being obtained by polymerizing a polymerizable vinyl monomer, in the presence of at least one monomer selected from the group consisting of carboxylic acid monomer, sulfonic acid monomer, and sulfonate monomer, in an aqueous polymerization system containing an inorganic substance dispersed therein; and a processs for producing artificial marble from said composition by cast polymerization with the addition of a polymerization initiator.
    Type: Grant
    Filed: August 20, 1985
    Date of Patent: July 7, 1987
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Isao Sasaki, Nobuhiro Mukai
  • Patent number: 4546145
    Abstract: A polymer composition wherein an inorganic substance and an organic polymer are firmly consolidated, which is characterized by being produced by polymerizing a vinyl monomer susceptible to radical polymerization in a polymerization system containing a dispersed inorganic substance in the presence of at least one monomer selected from sulfonic acid monomers, sulfonate monomers, or carboxylic acid monomers represented by the general formula [I] ##STR1## wherein R.sub.1 is a hydrogen atom, alkyl group having 1 to 20 carbon atoms, phenyl group, derivative of phenyl group, or halogen atom, X is CONH, ##STR2## COO(CH.sub.2).sub.m or (CH.sub.2).sub.n (wherein R.sub.2 and R.sub.3 are each a hydrogen atom or alkyl group having 1 to 15 carbon atoms, R.sub.4 is an alkylene group having 1 to 15 carbon atoms, m is an integer of 1 to 20, and n is an integer of 0 to 20), and Y is a hydrogen atom, ammonium radical, or an alkali metal atom, or by the general formula [II] ##STR3## wherein R.sub.
    Type: Grant
    Filed: August 14, 1984
    Date of Patent: October 8, 1985
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Kazuo Kishida, Isao Sasaki, Nobuhiro Mukai
  • Patent number: 4510024
    Abstract: A polymer composition in which an organic polymer and carbon fiber are strongly combined and a process for producing the polymer composition by the electrolytic polymerization of a reactive monomer using the carbon fiber as an electrode, which process is characterized in that the polymerization is carried out by adding an aliphatic epoxy compound, alicyclic epoxy compound, organic titanate compound, or vinylsilane compound, as part or all of the reactive monomer.
    Type: Grant
    Filed: October 18, 1983
    Date of Patent: April 9, 1985
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Kazuo Kishida, Isao Sasaki, Nobuhiro Mukai, Hajime Asai
  • Patent number: 4435540
    Abstract: A polymer composition wherein an inorganic substance and an organic polymer are firmly consolidated, which is characterized by being produced by polymerizing a vinyl monomer susceptible to radical polymerization in a polymerization system containing a dispersed inorganic substance in the presence of at least one monomer selected from sulfonic acid monomers, sulfonate monomers, or carboxylic acid monomers represented by the general formula [I] ##STR1## wherein R.sub.1 is a hydrogen atom, alkyl group having 1 to 20 carbon atoms, phenyl group, derivative of phenyl group, or halogen atom, X is CONH, ##STR2## COO(CH.sub.2).sub.m or (CH.sub.2).sub.n (wherein R.sub.2 and R.sub.3 are each a hydrogen atom or alkyl group having 1 to 15 carbon atoms, R.sub.4 is an alkylene group having 1 to 15 carbon atoms, m is an integer of 1 to 20, and n is an integer of 0 to 20), and Y is a hydrogen atom, ammonium radical, or an alkali metal atom, or by the general formula [II] ##STR3## wherein R.sub.
    Type: Grant
    Filed: December 31, 1981
    Date of Patent: March 6, 1984
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Kazuo Kishida, Isao Sasaki, Nobuhiro Mukai