Patents by Inventor Nobuhiro Okai

Nobuhiro Okai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8064681
    Abstract: The present invention provides a reticle inspection technology that enables a relative position between patterns to be evaluated for a pattern that may become a defect at the time of exposure to a sample, such as a wafer, in the double patterning technology on the same layer.
    Type: Grant
    Filed: November 24, 2008
    Date of Patent: November 22, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Nobuhiro Okai, Shinji Okazaki, Yasunari Sohda, Yoshinori Nakayama
  • Publication number: 20110249110
    Abstract: Provided is a scanning electron microscope including: an image recording unit (112) which stores a plurality of acquired frame images; a correction analyzing handling unit (113) which calculates a drift amount between frame images and a drift amount between a plurality of field images constituting a frame image; and a data handling unit (111) which corrects positions of respective field images constituting the plurality of fields images according to the drift amount between the field images and superimposes the field images on one another so as to create a new frame image. This provides a scanning electron microscope which can obtain a clear frame image even if an image drift is caused during observation of a pattern on a semiconductor substrate or an insulating object.
    Type: Application
    Filed: November 24, 2009
    Publication date: October 13, 2011
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Nobuhiro Okai, Yasunari Sohda
  • Publication number: 20110139981
    Abstract: An object of the present invention is to provide a scanning electron microscope aiming at making it possible to control the quantity of electrons generated by collision of electrons emitted from a sample with other members, and a sample charging control method using the control of electron quantity. To achieve the object, a scanning electron microscope including a plurality of apertures through which an electron beam can pass and a mechanism for switching the apertures for the electron beam, and a method for controlling sample charging by switching the apertures are proposed. The plurality of apertures are at least two apertures. Portions respectively having different secondary electron emission efficiencies are provided on peripheral portions of the at least two apertures on a side opposed to the sample. The quantity of electrons generated by collision of electrons emitted from the sample can be controlled by switching the apertures.
    Type: Application
    Filed: August 8, 2009
    Publication date: June 16, 2011
    Inventors: Ritsuo Fukaya, Nobuhiro Okai, Koki Miyahara, Zhigang Wang
  • Publication number: 20090136116
    Abstract: The present invention provides a reticle inspection technology that enables a relative position between patterns to be evaluated for a pattern that may become a defect at the time of exposure to a sample, such as a wafer, in the double patterning technology on the same layer.
    Type: Application
    Filed: November 24, 2008
    Publication date: May 28, 2009
    Inventors: Nobuhiro Okai, Shinji Okazaki, Yasunari Sohda, Yoshinori Nakayama