Patents by Inventor Nobuhiro Saitoh

Nobuhiro Saitoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6136766
    Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: October 24, 2000
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 5985810
    Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 16, 1999
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 5977040
    Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and 1 is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 2, 1999
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 5888312
    Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: March 30, 1999
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
  • Patent number: 5833761
    Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 10, 1998
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
  • Patent number: 5789359
    Abstract: The detergent of this invention, directed to the cleaning of an object having a gap portion at least in part thereof, contains at least one of components of the detergent having a solubility parameter difference of not more than 3 from and a contact angle within 15.degree. with at least one of components of a smear on the object. The detergent provides an ideal cleaning for the object because it easily permeates into and dissolves the machining oil filling the gaps between closely cohering thin metallic strips. The method of cleaning according to the invention has first cleaning the object with a polar detergent and then rinsing and drying the cleaned object with a detergent having low polarity or no polarity. In the precision cleaning of such objects as electronic parts, therefore, it manifests satisfactory cleaning and drying properties.
    Type: Grant
    Filed: April 2, 1996
    Date of Patent: August 4, 1998
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Silicone Co., Ltd.
    Inventors: Hiroshi Shimozawa, Masaru Kumagai, Fumihiko Tsuchitani, Mayumi Koga, Tadayuki Nakamura, Nobuhiro Saitoh, Shigeo Yamafuji
  • Patent number: 5782983
    Abstract: A part still wet with water or an aqueous type detergent adhering to the surface thereof is drain washed in a washing tank using a hydrophobic dewatering cleaning agent. In this operation of dewatering cleaning, the hydrophobic dewatering cleaning agent stored in the washing tank is circulated between the washing tank and a reserve tank to deprive the hydrophobic dewatering cleaning agent of water entrained thereby by means of a concentration type filter inserted in a path laid for the circulation. A hydrophobic filter is mainly used as the concentration type filter. The dewatering cleaning is continued and meanwhile the consequently isolated hydrophobic dewatering cleaning agent is exclusively returned to the washing tank. As a result, the water concentration in the hydrophobic dewatering cleaning agent stored in the washing tank can be constantly kept below a prescribed level.
    Type: Grant
    Filed: April 19, 1994
    Date of Patent: July 21, 1998
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Silicone Co., Ltd.
    Inventors: Minoru Inada, Yasutaka Imajo, Kimiaki Kabuki, Nobuhiro Saitoh
  • Patent number: 5772781
    Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: June 30, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
  • Patent number: 5769962
    Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: June 23, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
  • Patent number: 5741367
    Abstract: A method for drying parts that includes contacting the part with a liquid removing composition that contains a straight chain or cyclic polyorganosiloxane.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: April 21, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 5741365
    Abstract: A continuous method for cleaning and/or removing liquid from industrial parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.
    Type: Grant
    Filed: May 5, 1995
    Date of Patent: April 21, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 5728228
    Abstract: A method for removing liquid from parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.
    Type: Grant
    Filed: May 5, 1995
    Date of Patent: March 17, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 5716456
    Abstract: A method for cleaning an industrial object by use of an aqueous agent that includes a polyorganosiloxane. The method uses a plurality of vessels and the agent is recovered and resupplied to the method.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: February 10, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 5538024
    Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: July 23, 1996
    Assignees: Kabushiki Kaisha Toshiba, Japan Field Company, Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
  • Patent number: 5503681
    Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
    Type: Grant
    Filed: January 4, 1994
    Date of Patent: April 2, 1996
    Assignees: Kabushiki Kaisha Toshiba, Japan Field Company, Ltd.
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh
  • Patent number: 5443747
    Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and 1 is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.
    Type: Grant
    Filed: February 28, 1991
    Date of Patent: August 22, 1995
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa
  • Patent number: 4985286
    Abstract: An abrasion-concealing agent for glass containers, which comprises (A) a polyorganosiloxane and (B) a volatile polydimethylsiloxane, a glass container in which abrasions on the surface thereof have been concealed by the abrasion-concealing agent, and a method for concealing abrasions on a glass container by using the abrasion-concealing agent. The abrasion-concealing agent has excellent abrasion-concealing properites, film strength, water resistance, safety, workability and resistance to an aqueous alkaline solution washing, and does not cause any damage to labels on glass containers in the coating process.
    Type: Grant
    Filed: April 27, 1990
    Date of Patent: January 15, 1991
    Assignees: Toshiba Silicone Co. Ltd., Asahi Breweries, Ltd.
    Inventors: Akitsugu Kurita, Yoshiaki Takezawa, Nobuhiro Saitoh, Takehisa Shimada, Hideaki Takemoto
  • Patent number: 4957989
    Abstract: A vehicle for slow dissolving a coating material, comprising a triorganosilyl (meth) acrylate copolymer consisting essentially of repeating units represented by the formula ##STR1## The vehicle contains no harmful substances and is nontoxic, and therefore can be advantageously used as a vehicle for safe and effective coatings or treating agents.
    Type: Grant
    Filed: January 26, 1990
    Date of Patent: September 18, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventor: Nobuhiro Saitoh