Patents by Inventor Nobuhiro Satou

Nobuhiro Satou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrode member used in a plasma treating apparatus
    Patent number: 7138034
    Abstract: In a plasma treating apparatus, a ceramic porous substance having a three-dimensional network structure in which a frame portion formed of ceramic containing alumina is provided continuously like a three-dimensional network is used for the material of an electrode member for the plasma treating apparatus to be attached to the front surface of a gas supplying port of an electrode for plasma generation, and a gas for plasma generation is caused to pass through a hole portion formed irregularly in the three-dimensional network structure. Consequently, the distribution of the gas to be supplied is made uniform to prevent an abnormal discharge so that uniform etching having no variation can be carried out.
    Type: Grant
    Filed: June 21, 2002
    Date of Patent: November 21, 2006
    Assignees: Matsushita Electric Industrial Co., Ltd., Krosaki Harima Corporation
    Inventors: Kiyoshi Arita, Tetsuhiro Iwai, Hiroshi Haji, Shoji Sakemi, Taiji Matano, Nobuhiro Satou
  • Electrode member for plasma treating apparatus, plasma treating apparatus and plasma treating method
    Publication number: 20020195202
    Abstract: In a plasma treating apparatus, a ceramic porous substance having a three-dimensional network structure in which a frame portion formed of ceramic containing alumina is provided continuously like a three-dimensional network is used for the material of an electrode member for the plasma treating apparatus to be attached to the front surface of a gas supplying port of an electrode for plasma generation, and a gas for plasma generation is caused to pass through a hole portion formed irregularly in the three-dimensional network structure. Consequently, the distribution of the gas to be supplied is made uniform to prevent an abnormal discharge so that uniform etching having no variation can be carried out.
    Type: Application
    Filed: June 21, 2002
    Publication date: December 26, 2002
    Applicant: Matsushita Electric Industrial Co., LTD
    Inventors: Kiyoshi Arita, Tetsuhiro Iwai, Hiroshi Haji, Shoji Sakemi, Taiji Matano, Nobuhiro Satou