Patents by Inventor Nobuhisa Yamane

Nobuhisa Yamane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6524719
    Abstract: The present invention relates to a laminate film where on at least one face of a substrate layer selected from polyester film and aliphatic polyamide film, there is provided a polyamide layer in which the chief component is an aromatic polyamide of glass transition temperature at least 60° C., as a layer to undergo vapour deposition, and (1) the centre-line average roughness (Ra) of the face which is to undergo vapour deposition is in the range 0.005 to 0.03 &mgr;m, or (2) between the substrate layer and the polyamide layer, a layer comprising a single polymer or a plurality of polymers of SP value 10 to 15 is interposed between the substrate A layer and the polyamide C layer; and the invention offers film for vapour-deposition which is outstanding in its processability in vapour-deposition, and in its gas barrier properties.
    Type: Grant
    Filed: April 26, 2001
    Date of Patent: February 25, 2003
    Assignee: Toray Industries, Inc.
    Inventors: Nobuhisa Yamane, Kokichi Hashimoto, Masahiro Kimura
  • Publication number: 20010036551
    Abstract: The present invention relates to a laminate film where on at least one face of a substrate layer selected from polyester film and aliphatic polyamide film, there is provided a polyamide layer in which the chief component is an aromatic polyamide of glass transition temperature at least 60° C., as a layer to undergo vapor deposition, and (1) the center-line average roughness (Ra) of the face which is to undergo vapor deposition is in the range 0.005 to 0.03 &mgr;m, or (2) between the substrate layer and the polyamide layer, a layer comprising a single polymer or a plurality of polymers of SP value 10 to 15 is interposed between the substrate A layer and the polyamide C layer; and the invention offers film for vapor-deposition which is outstanding in its processability in vapour-deposition, and in its gas barrier properties.
    Type: Application
    Filed: April 26, 2001
    Publication date: November 1, 2001
    Inventors: Nobuhisa Yamane, Kokichi Hashimoto, Masahiro Kimura