Abstract: A triazine ring-containing polymer having a high refractive index and a low birefringence, and being capable of being subjected to injection molding, wherein the polymer having a repeating unit of *-[A-B-]-*, including a structural unit A derived from a triazinedithiol compound, and a structural unit B including an aromatic hydrocarbon group; and a thermoplastic resin, a thermoplastic article, and an optical part including the polymer.

Abstract: A laminate includes a substrate, a self-healing layer on the substrate and having a thickness of greater than or equal to about 50 micrometers, a protective layer between the substrate and the self-healing layer, and a surface layer on the self-healing layer and having a thickness of about 20 nanometers to about 300 nanometers, wherein the self-healing layer has a first elastic modulus and the protective layer has a second elastic modulus, wherein the second elastic modulus is about 1.2 times to about 50 times greater than the first elastic modulus, and wherein the surface layer has a friction coefficient of less than or equal to about 1.

Abstract: An ionic salt includes a polyvalent ion (a) having a metal cluster structure or a metal oxide cluster structure and an organic ion (b), a radiation-sensitive resist composition including the ionic salt, and a pattern forming method, wherein the polyvalent ion (a) includes at least one metal atom selected from the group consisting of tin, indium, antimony, tellurium, and bismuth, and the organic ion (b) is at least one selected from the group consisting of: a carboxylate anion having 4 or more carbon atoms; a sulfonate anion having 4 or more carbon atoms; a phosphonate anion having 4 or more carbon atoms; a phenoxide anion having 6 or more carbon atoms; an iodonium cation having 4 or more carbon atoms; a sulfonium cation having 4 or more carbon atoms; an ammonium cation having 4 or more carbon atoms; and a pyridinium cation having 5 or more carbon atoms.

Abstract: A triazine ring-containing polymer having a high refractive index and a low birefringence, and being capable of being subjected to injection molding, wherein the polymer having a repeating unit of *-[A-B-]-*, including a structural unit A derived from a triazinedithiol compound, and a structural unit B including an aromatic hydrocarbon group; and a thermoplastic resin, a thermoplastic article, and an optical part including the polymer.

Abstract: A laminate includes a substrate, a self-healing layer on the substrate and having a thickness of greater than or equal to about 50 micrometers, a protective layer between the substrate and the self-healing layer, and a surface layer on the self-healing layer and having a thickness of about 20 nanometers to about 300 nanometers, wherein the self-healing layer has a first elastic modulus and the protective layer has a second elastic modulus, wherein the second elastic modulus is about 1.2 times to about 50 times greater than the first elastic modulus, and wherein the surface layer has a friction coefficient of less than or equal to about 1.

Abstract: A self-healing composition including, urethane (meth)acrylate having two (meth)acrylate groups, six or more urethane groups, and a substituted or unsubstituted polyhedral silsesquioxane.

Abstract: A laminate includes a substrate, a self-healing layer on the substrate and having a thickness of greater than or equal to about 50 micrometers, a protective layer between the substrate and the self-healing layer, and a surface layer on the self-healing layer and having a thickness of about 20 nanometers to about 300 nanometers, wherein the self-healing layer has a first elastic modulus and the protective layer has a second elastic modulus, wherein the second elastic modulus is about 1.2 times to about 50 times greater than the first elastic modulus, and wherein the surface layer has a friction coefficient of less than or equal to about 1.

Abstract: A laminate includes a substrate, a self-healing layer on the substrate and having a thickness of greater than or equal to about 50 micrometers, a protective layer between the substrate and the self-healing layer, and a surface layer on the self-healing layer and having a thickness of about 20 nanometers to about 300 nanometers, wherein the self-healing layer has a first elastic modulus and the protective layer has a second elastic modulus, wherein the second elastic modulus is about 1.2 times to about 50 times greater than the first elastic modulus, and wherein the surface layer has a friction coefficient of less than or equal to about 1.

Abstract: A method of accelerating self-healing includes contacting a scratched portion of a self-healing urethane(meth)acrylate-derived material with a plasticizing solvent, wherein the plasticizing solvent comprises water, an alcohol, a ketone, or a combination thereof.

Abstract: A self-healing composition including, urethane (meth)acrylate having two (meth)acrylate groups, six or more urethane groups, and a substituted or unsubstituted polyhedral silsesquioxane.

Abstract: A self-healing composition including, urethane (meth)acrylate having two (meth)acrylate groups, six or more urethane groups, and a substituted or unsubstituted polyhedral silsesquioxane.

Abstract: A method of accelerating self-healing includes contacting a scratched portion of a self-healing urethane(meth)acrylate-derived material with a plasticizing solvent, wherein the plasticizing solvent comprises water, an alcohol, a ketone, or a combination thereof.

Abstract: An anti-fingerprinting composition having a self-healing property includes a polyrotaxane, a polyhedral silsesquioxane, and a fluorinated (meth)acryl compound.

Abstract: A self-healing composition including, urethane (meth)acrylate having two (meth)acrylate groups, six or more urethane groups, and a substituted or unsubstituted polyhedral silsesquioxane.

Abstract: A self-healing polymer formulation includes a polyurethane (meth)acrylate, a siloxane (meth)acrylate, a nanoparticle, and a hardener, a polymer film includes a cured product of the polymer formulation, and an electronic device includes the same.

Abstract: A light guide panel includes: a light guide layer having a light incident surface; a polarization separation layer configured to select a desired polarization among light emitted from the light guide layer and to emit light having the polarization; and a light homogenization layer including a plurality of fibers and a supporting medium of the fibers, the light homogenization layer configured to diffuse and scatter light incident on the light guide layer into the light guide layer. The polarization separation layer includes: a plurality of first fibers having birefringence; and a first supporting medium that is isotropic and configured to support the first fibers. The refractive index of the first supporting medium corresponds to at least one of two different refractive indices of the first fibers. The light homogenization layer includes: a plurality of second fibers having birefringence; and a second supporting medium that is isotropic and configured to support the second fibers.

Abstract: A laminated structure including an inorganic support; a heat resistance polymer film; and an adhesive layer disposed between the inorganic support and the heat resistance polymer film, wherein the adhesive layer includes at least one silsesquioxane polymer.

Abstract: A light guide panel includes: a light guide layer having a light incident surface; a polarization separation layer configured to select a desired polarization among light emitted from the light guide layer and to emit light having the polarization; and a light homogenization layer including a plurality of fibers and a supporting medium of the fibers, the light homogenization layer configured to diffuse and scatter light incident on the light guide layer into the light guide layer. The polarization separation layer includes: a plurality of first fibers having birefringence; and a first supporting medium that is isotropic and configured to support the first fibers. The refractive index of the first supporting medium corresponds to at least one of two different refractive indices of the first fibers. The light homogenization layer includes: a plurality of second fibers having birefringence; and a second supporting medium that is isotropic and configured to support the second fibers.

Abstract: The radiation-sensitive negative-type resist composition for pattern formation containing an epoxy resin, a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the epoxy resin therein, characterized in that the resist composition, through drying, forms a resist film having a softening point falling within range of 30 to 120 C and that the epoxy resin is represented by formula (1): (wherein R1 represents a moiety derived from an organic compound having k active hydrogen atoms (k represents an integer of 1 to 100); each of n1, n2, through nk represents 0 or an integer of 1 to 100; the sum of n1, n2, through nK falls within a range of 1 to 100; and each of “A”s, which may be identical to or different from each other, represents an oxycyclohexane skeleton represented by formula (2): (wherein X represents any of groups represented by formulas (3) to (5): and at least two groups represented by formula (3) are contained in one molecule of the epoxy resin))

Abstract: The method for producing a pattern formation mold includes: a first step of applying to a substrate a radiation-sensitive negative-type resist composition containing an epoxy resin represented by formula (I): (wherein R1 represents a moiety derived from an organic compound having k active hydrogen atoms (k represents an integer of 1 to 100); each of n1, n2, through nk represents 0 or an integer of 1 to 100; the sum of n1, n2, through nk falls within a range of 1 to 100; and each of “A” s, which may be identical to or different from each other, represents an oxycyclohexane skeleton represented by formula (II): (wherein X represents any of groups represented by formulas (III) to (V): and at least two groups represented by formula (III) are contained in one molecule of the epoxy resin)), along with a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the epoxy resin therein; a second step of drying the substrate coated with the radiation-sensitive negative-type resist composition