Patents by Inventor Nobukazu Hayashi

Nobukazu Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10643760
    Abstract: The method of producing this diffraction grating includes a step of generating a moire by a periodic pattern projected onto a plurality of unit diffraction gratings and a plurality of unit diffraction gratings, and a step of adjusting so that the extending directions of the gratings are aligned by relatively rotating at least one of a plurality of unit diffractions with respect to at least one of the others of the plurality of unit diffractions.
    Type: Grant
    Filed: February 7, 2018
    Date of Patent: May 5, 2020
    Assignee: Shimadzu Corporation
    Inventors: Takahiro Doki, Yukihisa Wada, Satoshi Tokuda, Nobukazu Hayashi, Toshinori Yoshimuta
  • Publication number: 20180226167
    Abstract: The method of producing this diffraction grating includes a step of generating a moire by a periodic pattern projected onto a plurality of unit diffraction gratings and a plurality of unit diffraction gratings, and a step of adjusting so that the extending directions of the gratings are aligned by relatively rotating at least one of a plurality of unit diffractions with respect to at least one of the others of the plurality of unit diffractions.
    Type: Application
    Filed: February 7, 2018
    Publication date: August 9, 2018
    Inventors: Takahiro DOKI, Yukihisa WADA, Satoshi TOKUDA, Nobukazu HAYASHI, Toshinori YOSHIMUTA
  • Publication number: 20090308740
    Abstract: An object of the present invention is to provide a CoCrPt base sputtering target in which high chromium-containing particles containing a chromium atom at a high concentration unevenly distributed in the above sputtering target are reduced in a size and a production amount to thereby enhance a uniformity of the target and inhibit nodules or acing from being caused and which has the targeted composition ratio. The CoCrPt base sputtering target of the present invention is a sputtering target containing cobalt, chromium, ceramics and platinum, and it is characterized by that high chromium-containing particles containing a chromium atom at a high concentration which are unevenly distributed in the above sputtering target have a maximum full diameter of 40 ?m or less.
    Type: Application
    Filed: December 26, 2007
    Publication date: December 17, 2009
    Applicant: MITSUI MINING & SMELTING CO., LTD.
    Inventors: Kazuteru Kato, Nobukazu Hayashi
  • Patent number: 7400143
    Abstract: A magnetic bias film 9 includes a magnetic bias magnet 11 that has magnetic layers and generates a magnetic field within a plane perpendicular to a lamination direction of the magnetic layers, which is manufactured in the shape of substantially a rectangular prism having a long side, a short side, and a thickness (in the lamination direction) in order of decreasing lengths. A ratio of the long side with respect to the short side of the magnetic bias magnet 11 in length is in a range of 5 to 200.
    Type: Grant
    Filed: September 6, 2004
    Date of Patent: July 15, 2008
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Nobukazu Hayashi, Kazuhiro Onaka, Yukio Nakao, Masataka Tagawa, Kouji Nabetani, Masako Yamaguchi
  • Publication number: 20070018641
    Abstract: A magnetic bias film 9 includes a magnetic bias magnet 11 that has magnetic layers and generates a magnetic field within a plane perpendicular to a lamination direction of the magnetic layers, which is manufactured in the shape of substantially a rectangular prism having a long side, a short side, and a thickness (in the lamination direction) in order of decreasing lengths. A ratio of the long side with respect to the short side of the magnetic bias magnet 11 in length is in a range of 5 to 200.
    Type: Application
    Filed: September 6, 2004
    Publication date: January 25, 2007
    Inventors: Nobukazu Hayashi, Kazuhiro Onaka, Yukio Nakao, Masataka Tagawa, Masako Yamaguchi
  • Publication number: 20060164204
    Abstract: A magneto-resistive element includes: a metal artificial lattice film (4) in which a magnetic thin film and a non-magnetic metal thin film are alternately laminated in at least two layers on a part of a substrate (1) and formed into a predetermined pattern; a first protective layer (5) covering the metal artificial lattice film (4); and a second protective layer (6) formed on the first protective layer (5). The residual stress of the first protective layer (5) is substantially zero. The second protective layer (6) is made of a material rejecting water. This structure can achieve a magneto-resistive element that has no hysteresis and small deterioration of the characteristics even at high temperatures, and has excellent heat resistance and corrosion resistance. Thus, this element can be used in sever environments, such as in an automobile.
    Type: Application
    Filed: September 12, 2003
    Publication date: July 27, 2006
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Hideaki Nishiwaki, Kazuhiro Onaka, Nobukazu Hayashi